Vacuum Deposition Recipes: Difference between revisions

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! colspan="18" width="1675" height="45" | <div style="font-size: 150%;">Vacuum Deposition Recipes</div>
! width="1675" height="45" colspan="18" | <div style="font-size: 150%;">Vacuum Deposition Recipes</div>
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| <!-- INTENTIONALLY LEFT BLANK --> <br>
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! colspan="4" align="center" bgcolor="#d0e7ff" | '''[[E-Beam Evaporation Recipes|E-Beam Evaporation]]'''
! align="center" bgcolor="#d0e7ff" colspan="4" | '''[[E-Beam Evaporation Recipes|E-Beam Evaporation]]'''
! colspan="6" align="center" bgcolor="#d0e7ff" | '''[[Sputtering Recipes|Sputtering]]'''
! align="center" bgcolor="#d0e7ff" colspan="6" | '''[[Sputtering Recipes|Sputtering]]'''
! colspan="2" align="center" bgcolor="#d0e7ff" | '''[[Thermal Evaporation Recipes|Thermal Evaporation]]'''
! align="center" bgcolor="#d0e7ff" colspan="2" | '''[[Thermal Evaporation Recipes|Thermal Evaporation]]'''
! colspan="3" align="center" bgcolor="#d0e7ff" | '''[[PECVD Recipes|Plasma Enhanced Chemical<br>Vapor Deposition (PECVD)]]'''
! align="center" bgcolor="#d0e7ff" colspan="3" | '''[[PECVD Recipes|Plasma Enhanced Chemical<br>Vapor Deposition (PECVD)]]'''
! width="90" align="center" bgcolor="#d0e7ff" | '''[[Atomic Layer Deposition Recipes|Atomic Layer Deposition]]'''
! width="90" align="center" bgcolor="#d0e7ff" | '''[[Atomic Layer Deposition Recipes|Atomic Layer Deposition]]'''
! width="80" align="center" bgcolor="#d0e7ff" | '''[[Molecular Vapor Deposition Recipes|Molecular Vapor Deposition]]'''
! width="80" align="center" bgcolor="#d0e7ff" | '''[[Molecular Vapor Deposition Recipes|Molecular Vapor Deposition]]'''
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| bgcolor="#eeffff" | {{rl|Sputtering Recipes|Al2O3 Deposition (Sputter 4)}}
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| bgcolor="#eeffff" | [[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]
| bgcolor="#eeffff" | [https://www.nanotech.ucsb.edu/wiki/index.php/Sputtering_Recipes#Al2O3_deposition_.28IBD.29 R]
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Revision as of 21:06, 16 March 2018

  • R = Recipe is available. Clicking this link will take you to the recipe.
  • A = Material is available for use, but no recipes are provided.
Vacuum Deposition Recipes

E-Beam Evaporation Sputtering Thermal Evaporation Plasma Enhanced Chemical
Vapor Deposition (PECVD)
Atomic Layer Deposition Molecular Vapor Deposition
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2
(SFI Endeavor)
Sputter 3
(ATC 2000-F)
Sputter 4
(ATC 2200-V)
Sputter 5 (Lesker AXXIS) Ion Beam
Deposition (Veeco Nexus)
Thermal
Evap 1
Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790)
PECVD 2
(Advanced Vacuum)
Unaxis VLR ICP-PECVD Atomic Layer Deposition (Oxford FlexAL) Molecular Vapor Deposition (Tool)
Ag A
A A

A A








Al A
A A
R1 A R1

A
A A




Al2O3 A A



A R1
R




R1
AlN




R1 A A
A




R1
Au A
A A
R1 A R1

A A




B
















C R1
CeO2
CeO2 deposition (E-Beam 2)














Co A

A

R









Cr A

A

R


A A




Cu A




R1 A








Fe A

A

R









Ge A
A A

A A








GeO2 A
Gd A

A












Hf A















HfO2





A A






R1
In










A




Ir A















ITO
ITO deposition (E-Beam 2)



A A
A






MgF2 A A
MgO A
Mo A




R A








Nb A





R








Nd





A








Ni A
A A

R1


A A




NiCr A A
NiFe A A A
Pd A
A A





A A




Pt A
A A

A R1






R1
Ru A

A












Si
A



R A

A



Amorphous-Si deposition (PECVD#2 R

SiN





R1 A
R

R1 R1 R1

SiO2 A A



R1 A A R

R1 R1 R1 R1
SiOxNy








A

R



Sn










A




SrF2
A














Ta A




R1 A

A







Ta2O5


A




R






Ti A
A A

R1 R1

A







TiN




A
R
A




R1
TiW A




A R1








TiO2
A


R1 A R1
R




R1
V





A A








W A




A R1








Zn









A A




ZnO














R1
Zr A

A

A A








ZrO2














R1
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2
(SFI Endeavor)
Sputter 3
(ATC 2000-F)
Sputter 4
(ATC 2200-V)
Sputter 5 (Lesker AXXIS) Ion Beam
Deposition (Veeco Nexus)
Thermal
Evap 1
Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790)
PECVD 2
(Advanced Vacuum)
Unaxis VLR ICP-PECVD Atomic Layer Deposition (Oxford FlexAl) Molecular Vapor Deposition (Tool)