Vacuum Deposition Recipes: Difference between revisions

Revision as of 01:00, 2 July 2020

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Vacuum Deposition Recipes
	E-Beam Evaporation				Sputtering				Thermal Evaporation		Plasma Enhanced Chemical Vapor Deposition (PECVD)			Atomic Layer Deposition	Molecular Vapor Deposition
Material	E-Beam 1 (Sharon)	E-Beam 2 (Custom)	E-Beam 3 (Temescal)	E-Beam 4 (CHA)	Sputter 3 (AJA ATC 2000-F)	Sputter 4 (AJA ATC 2200-V)	Sputter 5 (AJA ATC 2200-V)	Ion Beam Deposition (Veeco Nexus)	Thermal Evap 1	Thermal Evap 2 (Solder)	PECVD 1 (PlasmaTherm 790)	PECVD 2 (Advanced Vacuum)	Unaxis VLR ICP-PECVD	Atomic Layer Deposition (Oxford FlexAL)	Molecular Vapor Deposition (Tool)
Ag	A		A	A	A	A
Al	A		A	A	A	R1		A	A	A
Al₂O₃	A	A			A	R1		R						R1
AlN					A	A		A						R1
Au	A		A	A	A	R1			A	A
B
C	R1
CeO₂		CeO₂ deposition (E-Beam 2)
Co	A			A	R
Cr	A			A	R				A	A
Cu	A				R1	A
Fe	A			A	R
Ge	A		A	A	A	A
GeO₂		A
Gd	A			A
Hf	A
HfO₂					A	A								R1
In										A
Ir	A
ITO		ITO deposition (E-Beam 2)			A	A		A
MgF2					A	A
MgO		A
Mo	A				R	A
Nb	A					R
Nd						A
Ni	A		A	A	R1				A	A
NiCr	A			A
NiFe	A			A	A
Pd	A		A	A					A	A
Pt	A		A	A	A	R1								R1
Ru	A			A										R1
Si		A			R	A		A				R
SiN					R1	A		R			R1	R1	R1
SiN - Low Stress											R1	R1	R1
SiO₂	A	A			R1	A	A	R			R1	R1	R1	R1
SiO_xN_y								A			R
Sn										A
SrF₂		A
Ta	A				R1	A		A
Ta₂O₅				A				R
Ti	A		A	A	R1	R1		A
TiN						R		A						R1
TiW	A				A	R1
TiO₂		A			A	R1		R						R1
V					A	A
W	A				A	R1
Zn									A	A
ZnO														R1
Zr	A			A	A	A
ZrO₂														R1
Material	E-Beam 1 (Sharon)	E-Beam 2 (Custom)	E-Beam 3 (Temescal)	E-Beam 4 (CHA)	Sputter 3 (ATC 2000-F)	Sputter 4 (ATC 2200-V)	Sputter 5 (ATC 2200-V)	Ion Beam Deposition (Veeco Nexus)	Thermal Evap 1	Thermal Evap 2 (Solder)	PECVD 1 (PlasmaTherm 790)	PECVD 2 (Advanced Vacuum)	Unaxis VLR ICP-PECVD	Atomic Layer Deposition (Oxford FlexAl)	Molecular Vapor Deposition (Tool)

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 | bgcolor="#eeffff" |[https://wiki.nanotech.ucsb.edu/wiki/index.php/PECVD_Recipes#Amorphous-Si_deposition_.28PECVD_.232.29 R]
-| bgcolor="#eeffff" |[[PECVD_Recipes#Amorphous_Si_.28100.25SiH4_Ar_He.29|R]]
+| bgcolor="#eeffff" |
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 |{{rl|PECVD Recipes|SiN deposition (PECVD #1)}}
 |{{rl|PECVD Recipes|SiN deposition (PECVD #2)}}
-|{{rl|PECVD Recipes|SiN deposition (Unaxis VLR)}}
+|{{rl|PECVD Recipes|SiN 250C deposition (Unaxis VLR)}}
 |<br>
 |<br>
+|-
+!SiN - Low Stress
+!
+!
+!
+!
+!
+!
+!
+!
+!
+!
+!{{rl|PECVD Recipes|Low-Stress SiN - LS-SiN (PECVD#1)}}
+!{{rl|PECVD Recipes|Low-Stress SiN deposition (PECVD #2)}}
+!{{rl|PECVD Recipes|SiN LS 250C Deposition (Unaxis VLR)}}
+!
+!
 |-
 ! bgcolor="#d0e7ff" align="center" |SiO<sub>2</sub>
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 | bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 deposition (PECVD #1)}}
 | bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 deposition (PECVD #2)}}
-| bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 deposition (Unaxis VLR)}}
+| bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 LDR 250C Deposition (Unaxis VLR)}}
 | bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|SiO2 deposition (ALD CHAMBER 3)}}
 | bgcolor="#eeffff" |<br>