Vacuum Deposition Recipes: Difference between revisions

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| width="65" bgcolor="#daf1ff" |[[Sputtering_Recipes#Sputter_3_.28AJA_ATC_2000-F.29|Sputter 3<br>(AJA ATC 2000-F)]]
| width="65" bgcolor="#daf1ff" |[[Sputtering_Recipes#Sputter_3_.28AJA_ATC_2000-F.29|Sputter 3<br>(AJA ATC 2000-F)]]
| width="65" bgcolor="#daf1ff" |[[Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29|Sputter 4<br>(AJA ATC 2200-V)]]
| width="65" bgcolor="#daf1ff" |[[Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29|Sputter 4<br>(AJA ATC 2200-V)]]
| width="65" bgcolor="#daf1ff" |[https://wiki.nanotech.ucsb.edu/wiki/index.php/Sputtering_Recipes#Sputter_5_.28AJA_ATC_2200-V.29 Sputter 5 (AJA ATC 2200-V)]
| width="65" bgcolor="#daf1ff" |[https://wiki.nanotech.ucsb.edu/wiki/index.php?title=Sputtering_Recipes#Sputter_5_.28AJA_ATC_2200-V.29 Sputter 5 (AJA ATC 2200-V)]
| width="55" bgcolor="#daf1ff" |[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|Ion Beam<br>Deposition (Veeco Nexus)]]
| width="55" bgcolor="#daf1ff" |[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|Ion Beam<br>Deposition (Veeco Nexus)]]
| width="45" bgcolor="#daf1ff" |[[Thermal Evaporation Recipes#Thermal_Evap_1|Thermal<br>Evap 1]]
| width="45" bgcolor="#daf1ff" |[[Thermal Evaporation Recipes#Thermal_Evap_1|Thermal<br>Evap 1]]
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| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Al2O3 Deposition (Sputter 4)}}
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Al2O3 Deposition (Sputter 4)}}
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| bgcolor="#eeffff" |[https://wiki.nanotech.ucsb.edu/wiki/index.php/Sputtering_Recipes#Al2O3_deposition_.28IBD.29 R]
| bgcolor="#eeffff" |[https://wiki.nanotech.ucsb.edu/wiki/index.php?title=Sputtering_Recipes#Al2O3_deposition_.28IBD.29 R]
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|[https://wiki.nanotech.ucsb.edu/wiki/index.php/Sputtering_Recipes#Sputter_3_.28AJA_ATC_2000-F.29 R]
|[https://wiki.nanotech.ucsb.edu/wiki/index.php?title=Sputtering_Recipes#Sputter_3_.28AJA_ATC_2000-F.29 R]
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| bgcolor="#eeffff" |[https://wiki.nanotech.ucsb.edu/wiki/index.php/PECVD_Recipes#Amorphous-Si_deposition_.28PECVD_.232.29 R]
| bgcolor="#eeffff" |[https://wiki.nanotech.ucsb.edu/wiki/index.php?title=PECVD_Recipes#Amorphous-Si_deposition_.28PECVD_.232.29 R]
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|[https://wiki.nanotech.ucsb.edu/wiki/index.php/Sputtering_Recipes#SiOxNy_deposition_.28IBD.29 R]
|[https://wiki.nanotech.ucsb.edu/wiki/index.php?title=Sputtering_Recipes#SiOxNy_deposition_.28IBD.29 R]
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|[https://wiki.nanotech.ucsb.edu/wiki/index.php/Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29 R]
|[https://wiki.nanotech.ucsb.edu/wiki/index.php?title=Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29 R]
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|[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]
|[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]

Revision as of 19:48, 4 September 2021

  • R = Recipe is available. Clicking this link will take you to the recipe.
  • A = Material is available for use, but no recipes are provided.
Vacuum Deposition Recipes

 E-Beam Evaporation Sputtering Thermal Evaporation Plasma Enhanced Chemical
Vapor Deposition (PECVD) 		Atomic Layer Deposition Molecular Vapor Deposition
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 3
(AJA ATC 2000-F) 		Sputter 4
(AJA ATC 2200-V) 		Sputter 5 (AJA ATC 2200-V) Ion Beam
Deposition (Veeco Nexus) 		Thermal
Evap 1 		Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790) 		PECVD 2
(Advanced Vacuum) 		Unaxis VLR ICP-PECVD Atomic Layer Deposition (Oxford FlexAL) Molecular Vapor Deposition (Tool)
Ag A
A A A A








Al A
A A A R1

A 		A A




Al2O3 A A

A R1
R




R1
AlN



A A
A




R1
Au A
A A A R1

A A




B














C R1
CeO2
CeO2 deposition (E-Beam 2)












Co A

A R









Cr A

A R


A A




Cu A


R1 A








Fe A

A R









Ge A
A A A A








GeO2 A
Gd A

A










Hf A













HfO2



A A






R1
In








A




Ir A













ITO
ITO deposition (E-Beam 2)

A A
A






MgF2 A A
MgO A
Mo A


R A








Nb A



R








Nd



A








Ni A
A A R1


A A




NiCr A A
NiFe A A A
Pd A
A A



A A




Pt A
A A A R1






R1
Ru A

A
R






R1
Si
A

R A

A


R

SiN



R1 A
R

R1 R1 R1

SiN - Low Stress R1 R1 R1
SiO2 A A

R1 A A R

R1 R1 R1 R1
SiOxNy






R

R



Sn








A




SrF2
A












Ta A


R1 A

A






Ta2O5


A


R






Ti A
A A R1 R1

A






TiN




R
A




R1
TiW A


A R1








TiO2
A

A R1
R




R1
V



A A








W A


A R1








Zn







A A




ZnO












R1
Zr A

A A A








ZrO2












R1
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 3
(ATC 2000-F) 		Sputter 4
(ATC 2200-V) 		Sputter 5 (ATC 2200-V) Ion Beam
Deposition (Veeco Nexus) 		Thermal
Evap 1 		Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790) 		PECVD 2
(Advanced Vacuum) 		Unaxis VLR ICP-PECVD Atomic Layer Deposition (Oxford FlexAl) Molecular Vapor Deposition (Tool)
Retrieved from "https://wiki.nanofab.ucsb.edu/w/index.php?title=Vacuum_Deposition_Recipes&oldid=159152"