Surface Analysis (KLA/Tencor Surfscan): Difference between revisions

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==Documentation==
==Documentation==


=== Operating Procedures ===
*[[KLA-Tencor Surfscan - Standard Operating Procedure|Standard Operating Procedure]]

*[https://wiki.nanotech.ucsb.edu/w/images/9/96/Surfscan-Operation-Manual.pdf Operations Manual]
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*[https://wiki.nanofab.ucsb.edu/w/images/0/04/SURFSCAN_6200_8inch_wafers.pdf Surfscan 6200 8inch wafers] *
⚫
**''For detailed measurement info, it is highly recommended that you read the manual.''
⚫
*[https://wiki.nanofab.ucsb.edu/w/images/d/d6/SURFSCAN_6200_6inch_wafers.pdf Surfscan 6200 6inch wafers] *
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*[https://wiki.nanofab.ucsb.edu/w/images/8/87/SURFSCAN_6200_4inch_wafers.pdf Surfscan 6200 4inch wafers] *
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*[https://wiki.nanofab.ucsb.edu/w/images/1/1a/SURFSCAN_6200_2_and_3inch_wafers.pdf Surfscan 6200 2 and 3inch wafers] *
*[https://wiki.nanofab.ucsb.edu/w/images/4/4e/SURFSCAN_6200_Small_substrates.pdf Surfscan 6200 Small samples] *
*[[Wafer scanning process traveler]]
*[[Wafer scanning process traveler]]
**''This is the procedure Staff uses to calibrate particle counts on our deposition tools.''
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*[[Glossary]]
*[[Errors]]


=== Other Documentation ===
==Standard Recipes==


* [https://wiki.nanofab.ucsb.edu/w/images/0/04/SURFSCAN_6200_8inch_wafers.pdf Surfscan 6200 8inch wafers] *
* [https://wiki.nanotech.ucsb.edu/w/images/9/96/Surfscan-Operation-Manual.pdf Operations Manual]
⚫
**''For detailed measurement info, it is highly recommended that you read the manual.''
⚫
* [https://wiki.nanofab.ucsb.edu/w/images/d/d6/SURFSCAN_6200_6inch_wafers.pdf Surfscan 6200 6inch wafers] *

⚫
* [https://wiki.nanofab.ucsb.edu/w/images/8/87/SURFSCAN_6200_4inch_wafers.pdf Surfscan 6200 4inch wafers] *
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*[[Glossary]]
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* [https://wiki.nanofab.ucsb.edu/w/images/1/1a/SURFSCAN_6200_2_and_3inch_wafers.pdf Surfscan 6200 2 and 3inch wafers] *
*[[Surfscan Errors and Workarounds|Common Errors & Workarounds]]
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* [https://wiki.nanofab.ucsb.edu/w/images/4/4e/SURFSCAN_6200_Small_substrates.pdf Surfscan 6200 Small samples] *


==Examples==
==Examples==

Revision as of 18:34, 4 January 2024

Surface Analysis (KLA/Tencor Surfscan)
KLA.jpg
Location Bay 5
Tool Type Inspection, Test and Characterization
Manufacturer Tencor
Description Surface Analysis 
KLA/Tencor Surfscan
Primary Supervisor Biljana Stamenic
(805) 893-4002
biljana@ece.ucsb.edu

Secondary Supervisor

Don Freeborn

Recipes


About

This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. It can scan wafers in size from 4 to 8 inches.

Documentation

Operating Procedures

Other Documentation

  • Operations Manual
    • For detailed measurement info, it is highly recommended that you read the manual.

Examples


A low-particle 4-inch wafer example:
Gain 4: Small Particles

(0.160µm – 1.60µm)

Gain 2: Large Particles

(1.60µm – 28.0µm)

Surfscan Low-Particle Example - G4.png Surfscan Low-Particle Example - G2.png
A high-particle 4-inch wafer example:
Gain 4: Small Particles

(0.160µm – 1.60µm)

Gain 2: Large Particles

(1.60µm – 28.0µm)

Surfscan - 230113A7 Gain4 high particles.jpg Surfscan 230113A7G2 after low particles.jpg
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