Atomic Layer Deposition Recipes: Difference between revisions
Jump to navigation
Jump to search
No edit summary |
|||
| Line 1: | Line 1: | ||
{{recipes|Vacuum Deposition}} |
{{recipes|Vacuum Deposition}} |
||
=[[Atomic Layer Deposition (Oxford FlexAL)]]= |
=[[Atomic Layer Deposition (Oxford FlexAL)]]= |
||
==Al{{sub|2}}O{{sub|3}} |
==Al{{sub|2}}O{{sub|3}} deposition== |
||
*{{fl|ALD-Al2O3-300-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 300}} |
|||
*{{fl|ALD-Al2O3-300-Saturated-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 300 Saturated}} |
|||
*{{fl|ALD-Al2O3-Plasma-300C-Recipe.pdf|Al{{sub|2}}O{{sub|3}} plasma 300C}} |
|||
*{{fl|ALD-Al2O3-100-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 100}} |
|||