Vacuum Deposition Recipes: Difference between revisions

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| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|Al2O3 deposition}}
| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|Al2O3 deposition (ALD)}}
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| {{rl|Atomic Layer Deposition Recipes|AlN deposition}}
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| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|HfO2 deposition}}
| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|HfO2 deposition (ALD)}}
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| bgcolor="EEFFFF" | {{rl|PECVD Recipes|SiO2 deposition (PECVD #2)}}
| bgcolor="EEFFFF" | {{rl|PECVD Recipes|SiO2 deposition (PECVD #2)}}
| bgcolor="EEFFFF" | {{rl|PECVD Recipes|SiO2 deposition (Unaxis VLR)}}
| bgcolor="EEFFFF" | {{rl|PECVD Recipes|SiO2 deposition (Unaxis VLR)}}
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| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|SiO2 deposition (ALD)}}
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| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|ZrO2 deposition (ALD)}}
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Revision as of 18:35, 6 September 2012