Sputtering Recipes: Difference between revisions
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(→Ion Beam Deposition (Veeco NEXUS): added link to ibd calibrations spreadsheet) |
(→SiO{{sub|2}} deposition (IBD): added rate, index, stress) |
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==SiO{{sub|2}} deposition (IBD)== |
==SiO{{sub|2}} deposition (IBD)== |
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*{{fl|IBD-SiO2-Recipe.pdf|SiO{{Sub|2}} dep}} |
*{{fl|IBD-SiO2-Recipe.pdf|SiO{{Sub|2}} dep}} |
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* Refractive Index: ≈1.485 |
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* Rate: ≈6.1nm/min (users must calibrate this prior to critical deps) |
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* Stress ≈ -320MPa (compressive) |
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==SiN deposition (IBD)== |
==SiN deposition (IBD)== |
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Revision as of 19:36, 13 August 2013
Back to Vacuum Deposition Recipes.
Sputter 1 (Custom)
Sputter 2 (SFI Endeavor)
Sputter 3 (AJA ATC 2000-F)
Sputter 4 (AJA ATC 2200-V)
Sputter 5 (Lesker AXXIS)
Ion Beam Deposition (Veeco NEXUS)
IBD Calibrations Spreadsheet - Records of historical film depositions (rates, indices), Uniformity etc.
SiO2 deposition (IBD)
- SiO2 dep
- Refractive Index: ≈1.485
- Rate: ≈6.1nm/min (users must calibrate this prior to critical deps)
- Stress ≈ -320MPa (compressive)