Sputtering Recipes: Difference between revisions
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(→Ta{{sub|2}}O{{sub|5}} deposition (IBD): added reate, index, stress) |
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=[[Sputter 5 (Lesker AXXIS)]]= |
=[[Sputter 5 (Lesker AXXIS)]]= |
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=[[Ion Beam Deposition (Veeco NEXUS)]]= |
=[[Ion Beam Deposition (Veeco NEXUS)]]= |
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[https://docs.google.com/spreadsheet/ccc?key=0AuBs1GfMrpnXcEdXanZQNko3X0lUcHhVUlNyYnVDUkE&usp=sharing IBD Calibrations Spreadsheet] - Records of historical film depositions (rates, indices), Uniformity etc. |
[https://docs.google.com/spreadsheet/ccc?key=0AuBs1GfMrpnXcEdXanZQNko3X0lUcHhVUlNyYnVDUkE&usp=sharing IBD Calibrations Spreadsheet] - Records of historical film depositions (rates, indices), Uniformity etc. '''All users are required to enter their calibration deps (simple test deps only)''' |
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==SiO{{sub|2}} deposition (IBD)== |
==SiO{{sub|2}} deposition (IBD)== |
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* Refractive Index: ≈1.485 |
* Refractive Index: ≈1.485 |
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* Rate: ≈6.1nm/min (users must calibrate this prior to critical deps) |
* Rate: ≈6.1nm/min (users must calibrate this prior to critical deps) |
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* Stress ≈ -320MPa (compressive) |
* Stress ≈ -320MPa (compressive) |
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==SiN deposition (IBD)== |
==SiN deposition (IBD)== |
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* Stress ≈ -1756MPa (compressive) |
* Stress ≈ -1756MPa (compressive) |
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*{{fl|IBD-SiN-recipe.pdf| |
*{{fl|IBD-SiN-recipe.pdf|Recipe: SiN_dep}} |
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*{{fl|SiNfilm.pdf|SiN Film Data (IBD)}} |
*{{fl|SiNfilm.pdf|SiN Film Data (IBD)}} |
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*{{fl|SiNrecipedetails.pdf|SiN Recipe Details (IBD)}} |
*{{fl|SiNrecipedetails.pdf|SiN Recipe Details (IBD)}} |
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* Stress ≈ -140MPa (compressive) |
* Stress ≈ -140MPa (compressive) |
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*{{fl|IBD-Ta2O5-Recipe.pdf|Ta{{sub|2}}O{{sub|5}} |
*{{fl|IBD-Ta2O5-Recipe.pdf|Recipe: Ta{{sub|2}}O{{sub|5}}_dep}} |
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==TiO{{sub|2}} deposition (IBD)== |
==TiO{{sub|2}} deposition (IBD)== |
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*{{fl|IBD-TiO2-Recipe.pdf|TiO{{sub|2}} |
*{{fl|IBD-TiO2-Recipe.pdf|Recipe: TiO{{sub|2}}_dep}} |
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Revision as of 20:10, 13 August 2013
Back to Vacuum Deposition Recipes.
Sputter 1 (Custom)
Sputter 2 (SFI Endeavor)
Sputter 3 (AJA ATC 2000-F)
Sputter 4 (AJA ATC 2200-V)
Sputter 5 (Lesker AXXIS)
Ion Beam Deposition (Veeco NEXUS)
IBD Calibrations Spreadsheet - Records of historical film depositions (rates, indices), Uniformity etc. All users are required to enter their calibration deps (simple test deps only)
SiO2 deposition (IBD)
- Refractive Index: ≈1.485
- Rate: ≈6.1nm/min (users must calibrate this prior to critical deps)
- Stress ≈ -320MPa (compressive)
SiN deposition (IBD)
- Refractive Index ≈ 2.01
- Rate ≈ 4.5nm/min (users must calibrate this prior to critical deps)
- Stress ≈ -1756MPa (compressive)
Ta2O5 deposition (IBD)
- Refractive Index ≈ 2.10
- Rate ≈7.8nm/min (users must calibrate this prior to critical deps)
- Stress ≈ -140MPa (compressive)