PECVD Recipes

Back to Vacuum Deposition Recipes.

PECVD 1 (PlasmaTherm 790)

SiN deposition (PECVD #1)

• SiN Standard Recipe
• SiN Data (Deposition rate, Refractive index, Stress, HF etch rate)
• SiN 1000A Thickness uniformity 2014
• SiN Data March 2014

• Low Stress Si₃N₄ - Variable Stress Recipes
• Low Stress Si₃N₄ - Variable Stress Plot

SiO₂ deposition (PECVD #1)

• SiO₂ Deposition Recipe
• SiO₂ Data (Deposition rate, Refractive Index, Stress, HF etch rate)
• SiO₂ 1000A Thickness uniformity 2014
• {https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEw0bjFEdTF2SUhRa25Ca0d0SzBha3c#gid=sharing SiO₂PECVD1 SiO2 Data March 2014]

• SiO₂ Data March 2014

SiO_xN_y deposition (PECVD #1)

• SiO_xN_y Deposition Recipes - Varying N/O Ratio
• SiO_xN_y Stress/Index vs. O/N Ratio

PECVD 2 (Advanced Vacuum)

SiN deposition (PECVD #2)

• SiN Deposition Recipe
• SiN Deposition Particle Thickness Data

SiO₂ deposition (PECVD #2)

• SiO₂ Deposition Recipe
• SiO₂ Oxide March 2014

Amorphous-Si deposition (PECVD #2)

• Amorphous Si Deposition Recipe

ICP-PECVD (Unaxis VLR)

SiN deposition (Unaxis VLR)

SiN (2% SiH₄)

50°	100°	250°
SiN Deposition Recipe (5W 50° High Stress) SiN Deposition Recipe (50W 50° Medium Stress) SiN Deposition Recipe (120W 50° Low Stress)	SiN Deposition Recipe (5W 100° High Stress) SiN Deposition Recipe (50W 100° Medium Stress) SiN Deposition Recipe (120W 100° Low Stress) Comparison Table SiNx (120W 100° Low Stress) Comparison Table SiNx (50W 100° Medium Stress) Comparison Table SiNx (5W 100° High Stress) SiNx SEM images (50W 100° Medium Stress) SiNx SEM images (5W 100° High Stress)	SiN Deposition Recipe (5W 250° High Stress) SiN Deposition Recipe (50W 250° Medium Stress) SiN Deposition Recipe (120W 250° Low Stress) Comparison Table SiNx (120W 250° Low Stress) Comparison Table SiNx (50W 250° Medium Stress) Comparison Table SiNx (5W 250° High Stress) Very-Low-Pin-Hole-Density SiNx Recipe(25W 300°)

SiN (2% SiH₄ - No-Ar)

50°	100°	250°
SiN Deposition Recipe - No Ar (5W 50° High Stress) SiN Deposition Recipe - No Ar (50W 50° Medium Stress) SiN Deposition Recipe - No Ar (120W 50° Low Stress)	SiN Deposition Recipe - No Ar (5W 100° High Stress) SiN Deposition Recipe - No Ar (50W 100° Medium Stress) SiN Deposition Recipe - No Ar (120W 100° Low Stress)	SiN Deposition Recipe - No Ar (5W 250° High Stress) SiN Deposition Recipe - No Ar (50W 250° Medium Stress) SiN Deposition Recipe - No Ar (120W 250° Low Stress)

SiN (2% SiH₄ - No-Ar - Extra N₂)

50°	100°	250°
SiN Deposition Recipe - No Ar Extra N2 (120W 50° Low Stress)	SiN Deposition Recipe - No Ar Extra N2 (120W 100° Low Stress)	SiN Deposition Recipe - No Ar Extra N2 (120W 250° Low Stress)

SiN (100% SiH₄ )

50°	100°	250°
SiN Deposition Recipe (120W 50° Low Stress)	SiN Deposition Recipe (120W 100° Low Stress) SiN Comparison Table 120W-100(250)C	SiN Deposition Recipe (120W 250° Low Stress) SiN Comparison Table 120W, 100(250)C
SiN Deposition Recipe (50W 50° Medium Stress)	SiN Deposition Recipe (50W 100° Medium Stress) SiN Comparison Table 50W, 100(250)C SiN SEM sidewall coverage	SiN Deposition Recipe (50W 250° Medium Stress) SiN ComparisonTable 50W, 100(250)C

SiO₂ deposition (Unaxis VLR)

SiO₂ (2% SiH₄)

50°	100°	250°
SiO2 Deposition Recipe (5W 50°)	SiO2 Deposition Recipe (5W 100°) SiO2 film Unaxis ICP vs PECVD I SiO2 SEM pictures 100C	SiO2 Deposition Recipe (5W 250°) SiO2 film Unaxis ICP vs PECVD I

SiO₂ (2% SiH₄ - No Ar)

50°	100°	250°
SiO2 Deposition Recipe - No Ar (50°)	SiO2 Deposition Recipe - No Ar (100°)	SiO2 Deposition Recipe - No Ar (250°)

SiO₂ (100% SiH₄ HDR)

50°	100°	250°
SiO2 Deposition Recipe - HDR (50°)	SiO2 Deposition Recipe - HDR (100°) SiO2 Comparison Table - HDR (100°)	SiO2 Deposition Recipe - HDR (250°) SiO2 Comparison Table - HDR (250°)

SiO₂ (100% SiH₄ LDR)

50°	100°	250°
SiO2 Deposition Recipe - LDR (50°)	SiO2 Deposition Recipe - LDR (100°) SiO2 Comparison Table - LDR (100°) SiO2 SEM sidewall coverage	SiO2 Deposition Recipe - LDR (250°) SiO2 Comparison Table - LDR (250°)

Amorphous Si (100%SiH₄ Ar He)

90°	250°
a-Si Deposition Recipe - 90°	a-Si Deposition Recipe - 250°