E-Beam Evaporation Recipes
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Back to Vacuum Deposition Recipes.
Vapor Pressure Chart and Materials Deposition Table
Aluminum Deposition
E-Beam 1 (Sharon)
Ar-Ion Beam Source
Materials Table (E-Beam #1)
There are four hearth "positions" able to be loaded at any one time, meaning only up to 4 materials can be evaporated without breaking vacuum. Now able to handle Four-4" wafers in one run.
| Material | Position | Hearth / Crucible | Film Number | Density | Z Ratio | Tooling | Comments | |
|---|---|---|---|---|---|---|---|---|
| Ag | 4 | C | 5 | 10.5 | 0.529 | 140 | ||
| Al | 2 | C | 6 | 2.7 | 1.080 | 118 | ||
| Al2O3 | 1 | C | 6 | 3.97 | 0.336 | 169 | ||
| Au | 4 | C | 4 | 19.3 | 0.381 | 138 | Bazookas can be used at 20-30Å/sec. | |
| AuGe | 3 | C | 5 | 17.63 | 0.397 | 151 | Composition unpredictable unless you practically empty the crucible. | |
| C | 2 | H | 2 | 2.250 | 3.260 | 150 | Carbon. Must sweep beam. 1Å/sec (fluctuating 0.4–0.9Å/sec) at ~1.4–1.6 emission. | |
| Co | 2 | C | 1 | 8.9 | 0.343 | 150 | Use only with permission | |
| Fe | 7.86 | 0.349 | ||||||
| Ge | 3 | C | 6 | 5.35 | 0.516 | 130 | ||
| Gd | 3 | H | 3 | 7.89 | 0.670 | 120 | Use only with permission | |
| MgO | 1 | 6 | 3.58 | 0.411 | Use only with permission | |||
| Mo | 10.2 | 0.257 | 140 | |||||
| Ni | 1 | H | 1 | 8.91 | 0.331 | 140 | Prone to spitting. Cool down for 15 minutes before venting. | |
| NiCr | 1 | H | 6 | 8.50 | 0.3258 | Density and z-ratio for Nichrome IV | ||
| Nb | 4 | C | 6 | 8.57 | 0.516 ( should be 0.492) | Cool down for at least 35 minutes before venting. | ||
| Pd | 1 | H | 9 | 12.0 | 0.357 | 140 | ||
| Pt | 1 | C | 8 | 21.40 | 0.245 | 140 | Prone to spitting. Evaporate at 1.5Å/sec or less. | |
| Ru | 1 | C | 6 | 12.362 | 0.182 | 142 | Prone to spitting. Evaporate at 1.0Å/sec or less. Cool down for 20 minutes before venting. | |
| Si | 2 | H | 2 | 2.32 | 0.712 | 150 | Cool down very slowly after evaporating lest you crack the source. | |
| SiO | C | 6 | 2.13 | 0.87 | 132 | Use only with permission | ||
| SiO2 | 1 | C | 6 | 2.648 | 1.00 | 140 | Use only with permission.
Please change the crystal and the upper mirror after evaporating oxide. Density 2.2-2.7 according to thin film dep. table. | |
| SrF2 | 1 | C | 6 | 4.28 | 0.727 | 140 | Use only with permission | |
| Ta | 1 | H | 6 | 16.6 | 0.262 | Requires extremely high current. Minimum 35 minute cool down. Hearth #3 may be used. Call maintainer before you try Ta. | ||
| W | 1 | C | 6 | 19.3 | 0.163 | 138 | ||
| Ti | 3 | H | 3 | 4.50 | 0.628 | 139 |
E-Beam 2 (Custom)
Materials Table (E-Beam #2)
| Material | Density, g/cm3 | Z Ratio | Tooling factor, % | Comments |
|---|---|---|---|---|
| Al2O3 | 3.97 | 0.336 | 140.0 | Tony could you please check this? |
| CeO2 | 7.13 | 1.000 | 252.0 | Deposition at room temperature (see the details in the following file) |
| CeO2 | 7.13 | 1.000 | 117.0 | Deposition at 200 C (see the details in the following file) |
| CeO2 | 7.13 | 1.000 | 99.7 | Deposition at 250 C (see the details in the following file) |
| GeO2 | 6.24 | 1.000 | 139.0 | |
| ITO | 6.43-7.14 | 1.000 | 139.0 | z ratio unknown |
| MgO | 3.58 | 0.411 | 157.6 | OK |
| Si | 2.32 | 0.712 | 150.0 | |
| SiO2 | 2.648 | 1.000 | 157.6 | Density 2.2-2.7 according to thin film deposition tables |
| SiOx | 2.13 | 0.87 | 130.0 | |
| SrF2 | 4.28 | 0.727 | 140.0 | |
| Ta2O5 | 8.2 | 0.30 | 157.6 | |
| TiO2 | 4.26 | 0.400 | 139.0 |
ITO deposition (E-Beam 2)
- Room-temperature ITO Deposition, Annealing, and Electrical and Optical Properties
- ITO Deposition at 200 C
CeO2 deposition (E-Beam 2)
E-Beam 3 (Temescal)
Materials Table (E-Beam #3)
The following materials are always installed in the evaporator. There are 4 materials available on each gun (front/rear guns), allowing for co-deposition by running both guns simultaneously.
| Material | Gun | Hearth /Crucible | Process Gain, A/sec/%pwr | Film Number | Density, g/cm3 | Z Ratio | Tooling, % | Comments |
|---|---|---|---|---|---|---|---|---|
| Au | Front | C | 2.0 | 3 | 19.30 | 0.381 | 56 | |
| Ni | Front | C | 0.5 | 2 | 8.91 | 0.331 | 67 | |
| Pt | Front | C | 0.4 | 1 | 21.40 | 0.245 | 67 | |
| Ti | Front | C | 5.0 | 4 | 4.50 | 0.628 | 67 | |
| Ag | Rear | C | 10.0 | 2 | 10.50 | 0.529 | 67 | |
| Al | Rear | C | 10.0 | 1 | 2.70 | 1.080 | 53 | |
| Ge | Rear | C | 10.0 | 3 | 5.35 | 0.516 | 80 | |
| Pd | Rear | C | 0.9 | 4 | 12.038 | 0.357 | 48 |
E-Beam 4 (CHA)
Materials Table (E-Beam #4)
| Material | Density, g/cm3 | Z Ratio | Master tooling, % | Process Gain, A/sec/%pwr | Comments |
|---|---|---|---|---|---|
| Ag | 10.50 | 0.529 | 110 | 10.0 | |
| Al | 2.70 | 1.080 | 110 | 6.0 | updated 9/1/2021 |
| Au | 19.30 | 0.381 | 120 | 10.0 | |
| Co | 8.90 | 0.343 | 150 | 5.0 | |
| Cr | 7.20 | 0.305 | 140 | 10.0 | |
| Fe | 7.86 | 0.349 | 165 | 10.0 | |
| Ge | 5.35 | 0.516 | 126 | 10.0 | |
| Hf | 13.09 | 0.360 | 150 | 10.0 | |
| Ir | 22.40 | 0.129 | 130 | 10.0 | |
| Ni | 8.91 | 0.331 | 150 | 5.0 | |
| NiCr | 8.50 | 0.3258 | 140 | 10.0 | density and z ratio for Nichrome IV |
| NiFe | 8.70 | 1.000 | 100 | 10.0 | |
| Pd | 12.038 | 0.357 | 112 | 10.0 | |
| Pt | 21.40 | 0.245 | 130 | 10.0 | |
| Ru | 12.362 | 0.182 | 100 | 10.0 | |
| Ti | 4.50 | 0.628 | 183 | 10.0 | |
| Zr | 6.49 | 0.600 | 150 | 10.0 |