User contributions for Biljana
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30 December 2024
- 23:0423:04, 30 December 2024 diff hist 0 Stepper 2 (AutoStep 200) →Job Programming Tag: Reverted
- 23:0323:03, 30 December 2024 diff hist +83 Stepper 2 (AutoStep 200) →Job Programming Tag: Reverted
- 23:0223:02, 30 December 2024 diff hist −100 Stepper 2 (AutoStep 200) →Job Programming Tag: Manual revert
- 23:0123:01, 30 December 2024 diff hist −117 Stepper 2 (AutoStep 200) →Job Programming Tag: Reverted
- 23:0023:00, 30 December 2024 diff hist +140 Stepper 2 (AutoStep 200) →Job Programming Tag: Reverted
- 22:5322:53, 30 December 2024 diff hist +56 N Quarter First Layer Instructions Created page with "File:5th draft Autostep200 Quarter FIRST LAYER.docx" current Tag: Visual edit
- 22:5222:52, 30 December 2024 diff hist +4 Stepper 2 (AutoStep 200) →Job Programming Tags: Reverted Visual edit
- 22:5222:52, 30 December 2024 diff hist +4 Stepper 2 (AutoStep 200) →Job Programming Tags: Reverted Visual edit
- 22:4422:44, 30 December 2024 diff hist 0 N File:5th draft Autostep200 Quarter FIRST LAYER.docx No edit summary current
- 22:4422:44, 30 December 2024 diff hist +69 Stepper 2 (AutoStep 200) →Job Programming Tags: Reverted Visual edit
17 December 2024
- 16:2916:29, 17 December 2024 diff hist 0 Atomic Layer Deposition Recipes →Al{{sub|2}}O{{sub|3}} deposition (ALD CHAMBER 3) current
16 December 2024
- 18:2318:23, 16 December 2024 diff hist 0 Atomic Layer Deposition Recipes →Al{{sub|2}}O{{sub|3}} deposition (ALD CHAMBER 3)
- 18:2218:22, 16 December 2024 diff hist 0 Atomic Layer Deposition Recipes →Oxford FlexAL Chamber #3: Dielectrics
- 18:2118:21, 16 December 2024 diff hist −2 Atomic Layer Deposition Recipes →Al{{sub|2}}O{{sub|3}} deposition (ALD CHAMBER 3) Tag: Manual revert
- 18:2018:20, 16 December 2024 diff hist +2 Atomic Layer Deposition Recipes →Al{{sub|2}}O{{sub|3}} deposition (ALD CHAMBER 3) Tag: Reverted
- 18:1918:19, 16 December 2024 diff hist +120 Atomic Layer Deposition Recipes →Al{{sub|2}}O{{sub|3}} deposition (ALD CHAMBER 3)
12 December 2024
- 17:0917:09, 12 December 2024 diff hist −3 PECVD Recipes →SiO2 deposition rate at 150C is 35nm/min
- 17:0817:08, 12 December 2024 diff hist +2 PECVD Recipes →SiO2 deposition (PECVD #2)
- 17:0817:08, 12 December 2024 diff hist +19 PECVD Recipes →SiO2 deposition (PECVD #2)
- 17:0817:08, 12 December 2024 diff hist +36 PECVD Recipes →SiO2 deposition (PECVD #2)
20 November 2024
- 23:0423:04, 20 November 2024 diff hist +4 Surface Analysis (KLA/Tencor Surfscan) →Operating Procedures current
- 23:0323:03, 20 November 2024 diff hist −62 Surface Analysis (KLA/Tencor Surfscan) →Operating Procedures Tag: Visual edit
- 23:0323:03, 20 November 2024 diff hist −1 Surface Analysis (KLA/Tencor Surfscan) →Operating Procedures Tag: Visual edit
- 23:0223:02, 20 November 2024 diff hist +5 Surface Analysis (KLA/Tencor Surfscan) →Operating Procedures
- 23:0123:01, 20 November 2024 diff hist +2 Surface Analysis (KLA/Tencor Surfscan) →Operating Procedures Tag: Visual edit
- 23:0123:01, 20 November 2024 diff hist +2 Surface Analysis (KLA/Tencor Surfscan) →Operating Procedures Tag: Visual edit
- 23:0023:00, 20 November 2024 diff hist +2,747 N Surfscan SOP for 8inch wafers Surfscan 8 inch current Tag: Visual edit
- 22:5922:59, 20 November 2024 diff hist +2,648 N Surfscan SOP for 6inch wafers Surfscan 6 inch current Tag: Visual edit
- 22:5822:58, 20 November 2024 diff hist +4 Surface Analysis (KLA/Tencor Surfscan) →Operating Procedures Tag: Visual edit
- 22:5822:58, 20 November 2024 diff hist +4 Surface Analysis (KLA/Tencor Surfscan) →Operating Procedures Tag: Visual edit
- 22:5722:57, 20 November 2024 diff hist +2,576 N Surfscan SOP for small substrates Surfscan for small samples current Tag: Visual edit
- 22:5622:56, 20 November 2024 diff hist −272 Surface Analysis (KLA/Tencor Surfscan) →Operating Procedures Tag: Visual edit
- 22:5422:54, 20 November 2024 diff hist +2,268 N Surfscan SOP for 4inch wafers Surfscan for 4 inch wafers current Tag: Visual edit
- 22:5122:51, 20 November 2024 diff hist +33 Surface Analysis (KLA/Tencor Surfscan) →Operating Procedures Tag: Visual edit
- 22:4622:46, 20 November 2024 diff hist 0 N File:SURFSCAN 6200 241120 small substrates.pdf No edit summary current
- 22:4522:45, 20 November 2024 diff hist 0 N File:SURFSCAN 6200 241120 for 8inch wafers.pdf No edit summary current
- 22:4422:44, 20 November 2024 diff hist 0 N File:SURFSCAN 6200 241120 for 6inch wafers.pdf No edit summary current
- 22:4422:44, 20 November 2024 diff hist 0 N File:SURFSCAN 6200 241120 for 4inch wafers.pdf No edit summary current
18 November 2024
15 November 2024
- 00:4200:42, 15 November 2024 diff hist +5 Atomic Layer Deposition Recipes →Al2O3 deposition (ALD CHAMBER 1) Tag: Visual edit
- 00:4100:41, 15 November 2024 diff hist −1 Atomic Layer Deposition Recipes →Al{{sub|2}}O{{sub|3}} deposition (ALD CHAMBER 3)
- 00:4000:40, 15 November 2024 diff hist +126 Atomic Layer Deposition Recipes →Al2O3 deposition (ALD CHAMBER 3): updated ALD Al2O3 dep. rate Tag: Visual edit
12 November 2024
- 19:2119:21, 12 November 2024 diff hist −2 Lithography Recipes →Process Ranking Table
- 19:2019:20, 12 November 2024 diff hist −1 MLA Recipes →Positive Resist (MLA150) current Tag: Visual edit
- 19:1919:19, 12 November 2024 diff hist −2 Lithography Recipes →Process Ranking Table
- 19:1919:19, 12 November 2024 diff hist +47 Lithography Recipes →Process Ranking Table
- 19:1219:12, 12 November 2024 diff hist 0 MLA Recipes →Positive Resist (MLA150) Tag: Visual edit
- 19:1019:10, 12 November 2024 diff hist +179 Direct-Write Lithography Recipes →Positive Resist (MLA150): Update for SPR 955-1.8 current Tag: Visual edit
- 19:0019:00, 12 November 2024 diff hist +1 Lithography Recipes →Photolithography Recipes Tag: Visual edit
- 18:5318:53, 12 November 2024 diff hist +178 MLA Recipes →Positive Resist (MLA150): MLA Info about SPR955-1.8 Tag: Visual edit