User contributions for John d

Results for John d talk block log uploads logs

A user with 4,619 edits. Account created on 5 September 2012.

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14:0314:03, 1 March 2025 diff hist −409 Stepper 2 (AutoStep 200) new training vid link, v2 Tag: Visual edit

18:4218:42, 28 February 2025 diff hist +1,239 E-Beam 4 (CHA) added process control data, changed to heading level 1, renamed to "recipes" section Tag: Visual edit: Switched
18:3518:35, 28 February 2025 diff hist +1,373 Process Group - Process Control Data Added EBeam-4 cals Tag: Visual edit
01:3901:39, 28 February 2025 diff hist +1,524 Packaging Recipes cut depth accuracy Tag: Visual edit
01:2201:22, 28 February 2025 diff hist +345 Packaging Recipes →Blue Tape: explain better how to attach Tag: Visual edit

18:1718:17, 26 February 2025 diff hist +446 Stepper Mask-Making Guidelines (Generic) →Generic Stepper Mask Parameters: update Tempalte insertion instructions Tag: Visual edit

04:5704:57, 25 February 2025 diff hist −106 Template:Announcements DSX up
00:3400:34, 25 February 2025 diff hist +700 Frequently Asked Questions →What Supplies do I need to bring to the lab?: added optional CR toolbelt Tag: Visual edit

23:2923:29, 21 February 2025 diff hist +214 Stepper Mask-Making Guidelines (Generic) link to (0,0) marker on KLayout Tag: Visual edit
23:2723:27, 21 February 2025 diff hist −135 Stepper 3 (ASML DUV) →Mask Design and CAD files: removed separate mask making page, instead updated the "generic" page Tag: Visual edit
22:3222:32, 21 February 2025 diff hist +142 m Stepper Mask-Making Guidelines (Generic) No edit summary Tag: Visual edit
22:3022:30, 21 February 2025 diff hist +2,254 Stepper Mask-Making Guidelines (Generic) added GCA + ASML params Tag: Visual edit
22:1122:11, 21 February 2025 diff hist +90 N File:ASML Mask Design Area.png No edit summary current
21:5121:51, 21 February 2025 diff hist +327 Stepper 3 (ASML DUV) →Mask Design and CAD files: link to ASML mask making (public) Tag: Visual edit
06:0206:02, 21 February 2025 diff hist +48 Process Group Interns →Current Interns: updated responsibilities Tag: Visual edit

00:0800:08, 20 February 2025 diff hist −525 Template:Announcements deleted old announcements

00:1300:13, 15 February 2025 diff hist +444 Stepper 3 (ASML DUV) →Optical Proximity Correction (OPC): Going below resolution limit: update o "rule-based OPC" and other minor updates Tag: Visual edit

21:3121:31, 14 February 2025 diff hist +18 m Stepper 3 (ASML DUV) Renamed job creator to mention Python script in TOC Tag: Visual edit
08:0908:09, 14 February 2025 diff hist +128 m Stepper Mask-Making Guidelines (Generic) →Generic Stepper Mask Parameters Tag: Visual edit
08:0708:07, 14 February 2025 diff hist +384 Stepper Mask-Making Guidelines (Generic) →Generic Stepper Mask Parameters: added polarity Tag: Visual edit
08:0108:01, 14 February 2025 diff hist +132 m Stepper Mask-Making Guidelines (Generic) →Generic Stepper Mask Parameters Tag: Visual edit
07:5507:55, 14 February 2025 diff hist +66 Stepper 3 (ASML DUV) →Optical Proximity Correction (OPC): Going below resolution limit: moved Gopi's doc to top and highlighted and listed author Tag: Visual edit

22:3922:39, 13 February 2025 diff hist +36 m MLA150 - Design Guidelines →General CAD Guidelines Tag: Visual edit
19:1619:16, 13 February 2025 diff hist +6 m Services →Important Info on Fabrication Services Tag: Visual edit

22:2322:23, 10 February 2025 diff hist −230 Template:Announcements deleted lab closure, lab open

23:5023:50, 7 February 2025 diff hist +56 m Stepper 3 (ASML DUV) →Optical Proximity Correction: Going below resolution limit: link to skyler's google scholar Tag: Visual edit
23:4523:45, 7 February 2025 diff hist +36 m Stepper 3 (ASML DUV) →Optical Proximity Correction: Going below resolution limit
23:4323:43, 7 February 2025 diff hist +784 Stepper 3 (ASML DUV) →UCSB Photomasks Available: added Skyler's OPC images. Tag: Visual edit
23:3623:36, 7 February 2025 diff hist +98 N File:ASML OPC - Skyler Palatnik 060224 PR vtxHvP 23mJ NO OPC 1.png No edit summary current
23:3423:34, 7 February 2025 diff hist +74 N File:ASML OPC - Skyler Palatnik 060224 PR vtxHvP 15mJOPC 3.png No edit summary current
21:1421:14, 7 February 2025 diff hist +48 m Template:Announcements No edit summary
21:1321:13, 7 February 2025 diff hist +336 Template:Announcements Lab Closure: Mon Feb 10th, 8a-12n
00:5400:54, 7 February 2025 diff hist +34 m Process Group - Process Control Data →Deposition (Process Control Data) Tag: Visual edit
00:5100:51, 7 February 2025 diff hist +475 Process Group - Process Control Data →Deposition (Process Control Data): added screenshots of SPC charts and data Tag: Visual edit: Switched
00:5000:50, 7 February 2025 diff hist +61 N File:PECVD1 SiO2 F50 WaferMap example.jpg No edit summary current
00:4600:46, 7 February 2025 diff hist +31 N File:PECVD SPC Chart Example.png No edit summary current
00:3000:30, 7 February 2025 diff hist +170 m Stepper 3 (ASML DUV) →Optical Proximity Correction: Going below resolution limit Tag: Visual edit
00:2700:27, 7 February 2025 diff hist +63 m Stepper 3 (ASML DUV) →Optical Proximity Correction: Going below resolution limit Tag: Visual edit

23:4123:41, 6 February 2025 diff hist +556 Stepper 3 (ASML DUV) →Optical Proximity Correction: Going below resolution limit: added table of images Tag: Visual edit
23:3923:39, 6 February 2025 diff hist +21 N File:ASML SEM DBR With OPC .png No edit summary current
23:3823:38, 6 February 2025 diff hist +24 N File:ASML SEM DBR without OPC.png No edit summary current
23:3723:37, 6 February 2025 diff hist +31 N File:ASML OPC CAD.png No edit summary current
22:0922:09, 6 February 2025 diff hist +153 Services →Fabrication Services by NanoFab Staff: added academic rates policy for technical contact Tag: Visual edit

23:5423:54, 5 February 2025 diff hist +42 m Holographic Lith/PL Setup (Custom) No edit summary Tag: Visual edit

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