User contributions for John d

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20:2920:29, 12 March 2025 diff hist +90‎ ASML Stepper 3 - Job Creator ‎ →‎Instructions for Usage: listed exposure job location current Tag: Visual edit
19:5419:54, 12 March 2025 diff hist +9‎ ASML Stepper 3 - Job Creator ‎ added TOC

19:1519:15, 11 March 2025 diff hist −156‎ Template:Announcements ‎ EBL move update
19:1319:13, 11 March 2025 diff hist 0‎ File:Nanofabrication Facility Project Description.xlsx ‎ John d uploaded a new version of File:Nanofabrication Facility Project Description.xlsx current
15:0115:01, 11 March 2025 diff hist +402‎ Logitech WBS7 - Procedure for Wax Mounting with Spin-On Crystalbond ‎ Added crystal bond grams and ACE mL, and mentioned cleaning polos chuck and wafer backside current Tag: Visual edit

23:4723:47, 10 March 2025 diff hist −15‎ m Template:Announcements ‎No edit summary
23:4723:47, 10 March 2025 diff hist +394‎ Template:Announcements ‎ EBL move-in

19:0319:03, 9 March 2025 diff hist +153‎ Services ‎ →‎Paperwork for Fabrication Services: UC users: request Rechareg acct number Tag: Visual edit
18:5718:57, 9 March 2025 diff hist +139‎ ICP Etching Recipes ‎ →‎SiO2 Etch Recipes (Fluorine ICP Etcher): added links to process control data Tag: Visual edit
18:5518:55, 9 March 2025 diff hist +2‎ Dry Etching Recipes ‎ updated FL-ICP Si + SIO2 link cuz changed header title current Tag: Visual edit
18:5118:51, 9 March 2025 diff hist +1,202‎ ICP Etching Recipes ‎ →‎Si Etching (Fluorine ICP Etcher): reorg - put Etch cals in the Etch cal section, and added Recipe info for Si & SiO2 etching in Recipe section Tag: Visual edit
18:4018:40, 9 March 2025 diff hist +49‎ N File:FL-ICP 50W SiO2 etch with Ru Hard Mask.png ‎No edit summary current
18:3918:39, 9 March 2025 diff hist 0‎ File:FL-ICP 200W SiO2 Etch with Ru Hardmask - Ning Cao.png ‎ John d uploaded a new version of File:FL-ICP 200W SiO2 Etch with Ru Hardmask - Ning Cao.png current
18:3618:36, 9 March 2025 diff hist +49‎ N File:FL-ICP 200W SiO2 Etch with Ru Hardmask - Ning Cao.png ‎No edit summary

20:5120:51, 7 March 2025 diff hist +64‎ Template:Announcements ‎ MLA up
06:3106:31, 7 March 2025 diff hist +9‎ m Template:Announcements ‎ →‎Stepper #3 (ASML DUV) - Maint
02:1802:18, 7 March 2025 diff hist −844‎ Template:Announcements ‎ deleted old tools

17:5517:55, 5 March 2025 diff hist +1‎ m Vacuum Deposition Recipes ‎ →‎Deposition Tools/Materials Table current Tag: Visual edit
17:5417:54, 5 March 2025 diff hist +16‎ Vacuum Deposition Recipes ‎ Updated EB4 Ti/Au/Cr/Ni to R6 & linked to Process Control data Tag: Visual edit
17:5217:52, 5 March 2025 diff hist +32‎ Process Group - Process Control Data ‎ →‎E-Beam 4 (CHA): made subheadings for each metal Tag: Visual edit
08:0308:03, 5 March 2025 diff hist +10‎ m ICP Etching Recipes ‎ →‎High Rate Bosch Etch (DSEIII): replaced image name for 16um SEM
08:0108:01, 5 March 2025 diff hist +51‎ N File:Copy of 22 013 (1).jpg ‎ John d moved page File:Copy of 22 013 (1).jpg to File:DSE 16um Bosch Etch - 22 013.jpg: more descriptive file title current Tag: New redirect
08:0108:01, 5 March 2025 diff hist 0‎ m File:DSE 16um Bosch Etch - 22 013.jpg ‎ John d moved page File:Copy of 22 013 (1).jpg to File:DSE 16um Bosch Etch - 22 013.jpg: more descriptive file title current
07:5807:58, 5 March 2025 diff hist +138‎ File:DSE 16um Bosch Etch - 22 013.jpg ‎ pasted caption Tag: Visual edit
07:5207:52, 5 March 2025 diff hist +118‎ m ICP Etching Recipes ‎ →‎High Rate Bosch Etch (DSEIII) Tag: Visual edit
04:2804:28, 5 March 2025 diff hist +12‎ m ICP Etching Recipes ‎ →‎High Rate Bosch Etch (DSEIII): added uv6 thickness to figure Tag: Visual edit
02:5902:59, 5 March 2025 diff hist 0‎ Stepper Mask-Making Guidelines (Generic) ‎ Corrected ASML reticle size Tag: Visual edit

02:0202:02, 2 March 2025 diff hist 0‎ File:GCA Autostep 200 training vid title screen.png ‎ John d uploaded a new version of File:GCA Autostep 200 training vid title screen.png current
01:4901:49, 2 March 2025 diff hist 0‎ m Stepper 2 (AutoStep 200) ‎ →‎Video Training: updated link on Image current

14:0314:03, 1 March 2025 diff hist −409‎ Stepper 2 (AutoStep 200) ‎ new training vid link, v2 Tag: Visual edit

18:4218:42, 28 February 2025 diff hist +1,239‎ E-Beam 4 (CHA) ‎ added process control data, changed to heading level 1, renamed to "recipes" section current Tag: Visual edit: Switched
18:3518:35, 28 February 2025 diff hist +1,373‎ Process Group - Process Control Data ‎ Added EBeam-4 cals Tag: Visual edit
01:3901:39, 28 February 2025 diff hist +1,524‎ Packaging Recipes ‎ cut depth accuracy Tag: Visual edit
01:2201:22, 28 February 2025 diff hist +345‎ Packaging Recipes ‎ →‎Blue Tape: explain better how to attach Tag: Visual edit

18:1718:17, 26 February 2025 diff hist +446‎ Stepper Mask-Making Guidelines (Generic) ‎ →‎Generic Stepper Mask Parameters: update Tempalte insertion instructions Tag: Visual edit

04:5704:57, 25 February 2025 diff hist −106‎ Template:Announcements ‎ DSX up
00:3400:34, 25 February 2025 diff hist +700‎ Frequently Asked Questions ‎ →‎What Supplies do I need to bring to the lab?: added optional CR toolbelt Tag: Visual edit

23:2923:29, 21 February 2025 diff hist +214‎ Stepper Mask-Making Guidelines (Generic) ‎ link to (0,0) marker on KLayout Tag: Visual edit
23:2723:27, 21 February 2025 diff hist −135‎ Stepper 3 (ASML DUV) ‎ →‎Mask Design and CAD files: removed separate mask making page, instead updated the "generic" page Tag: Visual edit
22:3222:32, 21 February 2025 diff hist +142‎ m Stepper Mask-Making Guidelines (Generic) ‎No edit summary Tag: Visual edit
22:3022:30, 21 February 2025 diff hist +2,254‎ Stepper Mask-Making Guidelines (Generic) ‎ added GCA + ASML params Tag: Visual edit
22:1122:11, 21 February 2025 diff hist +90‎ N File:ASML Mask Design Area.png ‎No edit summary current
21:5121:51, 21 February 2025 diff hist +327‎ Stepper 3 (ASML DUV) ‎ →‎Mask Design and CAD files: link to ASML mask making (public) Tag: Visual edit
06:0206:02, 21 February 2025 diff hist +48‎ Process Group Interns ‎ →‎Current Interns: updated responsibilities Tag: Visual edit

00:0800:08, 20 February 2025 diff hist −525‎ Template:Announcements ‎ deleted old announcements

00:1300:13, 15 February 2025 diff hist +444‎ Stepper 3 (ASML DUV) ‎ →‎Optical Proximity Correction (OPC): Going below resolution limit: update o "rule-based OPC" and other minor updates Tag: Visual edit

21:3121:31, 14 February 2025 diff hist +18‎ m Stepper 3 (ASML DUV) ‎ Renamed job creator to mention Python script in TOC Tag: Visual edit
08:0908:09, 14 February 2025 diff hist +128‎ m Stepper Mask-Making Guidelines (Generic) ‎ →‎Generic Stepper Mask Parameters Tag: Visual edit
08:0708:07, 14 February 2025 diff hist +384‎ Stepper Mask-Making Guidelines (Generic) ‎ →‎Generic Stepper Mask Parameters: added polarity Tag: Visual edit
08:0108:01, 14 February 2025 diff hist +132‎ m Stepper Mask-Making Guidelines (Generic) ‎ →‎Generic Stepper Mask Parameters Tag: Visual edit

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