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ICP Etching Recipes
...tch_Bosch_DSEIII.pdf Bosch Process Recipe and Characterization] - Standard recipe on the tool. **Recipe Name: "'''''Plasma-Therm Standard DSE'''''" (''Production'' - copy to your

28 KB (4,356 words) - 12:49, 7 May 2024
LegacyTable
{{Recipe Table Explanation}}

7 KB (841 words) - 17:19, 18 July 2013
Lift-Off with I-Line Imaging Resist + LOL2000 Underlayer
...re tool. You can find starting exposure parameters for SPR955CM-0.8 on the recipe pages for the exposure tool you are using: |SPR955CM-0.9 spin @ 3krpm (Spin Recipe #5)

5 KB (854 words) - 14:58, 31 August 2022
Frequently Asked Questions
===Where do I find a recipe for a process (litho/etch/dep etc.)?=== ...mate only. '''''If you have tight tolerances, you need to characterize the recipe yourself''''' (ie. figure out deposition/etch rate, selectivity, verticalit

25 KB (4,202 words) - 20:37, 13 May 2024
Sputter 5 (AJA ATC 2200-V)
...ls as well as the sputtering of a wide variety of materials. The system is recipe driven and computer controlled for reproducible results.

3 KB (413 words) - 15:50, 16 September 2022
Thermal Evaporator 1
...ration_Recipes#Materials_Table_(Thermal Evaporator #1)|Thermal Evaporation Recipe Page]].

2 KB (382 words) - 17:31, 12 October 2017
Test Data of etching SiO2 with CHF3/CF4
*[[Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer)|Test Data of etching SiO2 w

7 KB (976 words) - 13:15, 11 January 2023
Thermal Evap 1
...ration_Recipes#Materials_Table_(Thermal Evaporator #1)|Thermal Evaporation Recipe Page]].

3 KB (384 words) - 10:28, 30 August 2022
Unaxis VLR Etch - Process Control Data
...r to the etch, do O2 clean 15 minutes, then, chamber coating with the same recipe on 1/4-2" InP on Silicon carrier for 15 minutes.

5 KB (717 words) - 18:41, 21 November 2022
Sputter 3 (AJA ATC 2000-F)
...te biasing and pre-cleaning. Samples can be heated to 650°C. The system is recipe driven and computer controlled for reproducible results.

3 KB (479 words) - 10:36, 30 August 2022
Stepper Recipes
...give you the values of the key parameters you will need to establish your recipe. Underlayers such as LOL2000 or PMGI can be used on the stepper systems. &n ==Positive Resist (GCA 6300)== 

17 KB (2,294 words) - 17:03, 21 March 2024
Staff List
...s group provides expertise on process development, fabrication techniques, recipe development, and some direct tool training and maintenance. The Process Gro

5 KB (664 words) - 09:42, 11 March 2024
Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)
...nanotech.ucsb.edu/w/images/6/65/Editing_a_Recipe_on_Plasma.pdf How to edit recipe]

4 KB (606 words) - 09:59, 14 June 2024
Lift-Off with DUV Imaging + PMGI Underlayer
Optionally can use lift-pins & Recipe "'''00 220deg, 3min Vac'''";

4 KB (608 words) - 16:32, 27 April 2022
Packaging Recipes
...asily without aborting the programmed cuts. The "Height Check Rate" in the recipe will check the blade exposure after this many cuts, using the optical heigh ...opriate thickness, and spin-coat it & soft-bake it according to a standard recipe.

10 KB (1,597 words) - 11:18, 1 May 2024
Lithography Recipes
#*[[#Photolithography_Recipes |'''Photo Lithography Recipe section''']] ...ll>'''R''': ''Recipe is available. Clicking this link will take you to the recipe.''</small>

23 KB (3,174 words) - 12:37, 9 May 2024
Stepper 1 (GCA 6300) - Standard Operating Procedure
#Spin coat resist following the recipe for spinning/baking specific resist (make sure the resist is fresh) # When exposure is finished, follow the recipe (post exposure bake if needed) with development. Please take your time for

15 KB (2,499 words) - 09:42, 19 March 2020
Stepper 2 (AutoStep 200)
|recipe = Lithography

6 KB (893 words) - 17:44, 12 February 2024
Stepper 3 (ASML DUV)
|recipe = Lithography

9 KB (1,400 words) - 13:08, 3 May 2024

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