E-Beam Lithography System (Raith EBPG 5150+)

E-Beam Lithography System (Raith EBPG 5150+) [[image:|300x350px|center|]] Tool Type Lithography Location Bay 7 Supervisor Bill Mitchell Supervisor Phone (805) 893-4974 Supervisor E-Mail mitchell@ece.ucsb.edu Description Vector Scan Electron Beam Lithography System Manufacturer Raith GmbH Model EBPG 5150+ Sign up for this tool

Instructions + Procedures

Sign Up

Get Trained

Maintenance Messages

Report Issue

About

TBD

Detailed Specifications

• Maximum write area:
• Maximum wafer/substrate size:
• Cassette loader/substrate holders available
• Beam Voltage: 100kV
• Min/Maximum Current (Dose):
• Scanner Speed (or other speed specs):
• Layer-to-Layer Alignment Accuracy:
• Options purchased:
  • Non-Manhattan scanning for curved edges
  • Stand-alone optical alignment station
  • OTHER

(Other EBL-specific specs)

• Advanced Fracturing software available (Layout BEAMER from GeniSys, Inc)
  • automated proximity correction of patterns possible
  • ability to manually position write fields within a pattern for optimum inter-field writing performance
  • ability to adjust beam scanning strategy within a write field for optimum intra-field writing performance
  • fine tuning of line-edge roughness by shot pitch correction

Recipes

All recipes can be found on the following page:

• Recipes > Litho. > Direct-Write > EBL Recipes.