Sputtering Recipes

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Revision as of 19:36, 13 August 2013 by John d (talk | contribs) (→‎SiO{{sub|2}} deposition (IBD): added rate, index, stress)
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Back to Vacuum Deposition Recipes.

Sputter 1 (Custom)

Sputter 2 (SFI Endeavor)

Sputter 3 (AJA ATC 2000-F)

Sputter 4 (AJA ATC 2200-V)

Sputter 5 (Lesker AXXIS)

Ion Beam Deposition (Veeco NEXUS)

IBD Calibrations Spreadsheet - Records of historical film depositions (rates, indices), Uniformity etc.

SiO2 deposition (IBD)

  • SiO2 dep
  • Refractive Index: ≈1.485
  • Rate: ≈6.1nm/min (users must calibrate this prior to critical deps)
  • Stress ≈ -320MPa (compressive)

SiN deposition (IBD)

Ta2O5 deposition (IBD)

TiO2 deposition (IBD)

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