Sputtering Recipes

Back to Vacuum Deposition Recipes.

Ion Beam Deposition (Veeco NEXUS)

IBD Calibrations Spreadsheet - Records of historical film depositions (rates, indices), Uniformity etc. All users are required to enter their calibration deps (simple test deps only)

SiO₂ deposition (IBD)

• Refractive Index: ≈1.485
• Rate: ≈6.1nm/min (users must calibrate this prior to critical deps)
• Stress ≈ -320MPa (compressive)

• Recipe: SiO₂_dep

Si₃N₄ deposition (IBD)

• Refractive Index ≈ 2.01
• Rate ≈ 4.5nm/min (users must calibrate this prior to critical deps)
• Stress ≈ -1756MPa (compressive)

• Recipe: SiN_dep
• SiN Film Data (IBD)
• SiN Recipe Details (IBD)

Ta₂O₅ deposition (IBD)

• Refractive Index ≈ 2.10
• Rate ≈7.8nm/min (users must calibrate this prior to critical deps)
• Stress ≈ -140MPa (compressive)

• Recipe: Ta₂O₅_dep

TiO₂ deposition (IBD)

• Refractive Index ≈ 2.3-2.4
• Dep Rate ≈ 1.8nm/min
• Recipe: TiO₂_dep