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- |email = mitchell@ece.ucsb.edu436 bytes (50 words) - 18:32, 23 March 2020
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- |email = mitchell@ece.ucsb.edu436 bytes (50 words) - 18:32, 23 March 2020
- |super2= Bill Mitchell850 bytes (122 words) - 04:08, 1 March 2024
- |super2= Bill Mitchell |email=mitchell@ece.ucsb.edu2 KB (301 words) - 18:57, 30 August 2022
- ...Mitchell]]||Process Expert||(805) 893-4974||[mailto:mitchell@ece.ucsb.edu mitchell@ece.ucsb.edu]5 KB (764 words) - 23:38, 14 August 2024
- ''Technique developed by [[Bill Mitchell]]. Written by [[Demis D. John]].''2 KB (392 words) - 17:38, 2 November 2024
- ...this tool, as achieving the atomic-layer regime is rather complex. [[Bill Mitchell]] is the resident expert on ALD recipe development.3 KB (377 words) - 21:56, 8 March 2023
- |super2= Bill Mitchell3 KB (487 words) - 17:48, 2 November 2024
- |super= Bill Mitchell5 KB (734 words) - 06:28, 15 August 2022
- **''Ning Cao & Bill Mitchell, 2019-06'' ...ertical Etch of Silicon Dioxide using Ruthenium Films as an Etch Mask|W.J. Mitchell ''et al.'', JVST-A, May 2021]]30 KB (4,732 words) - 23:51, 9 January 2025
- # Andrew D. Carter, J. J. M. Law, E. Lobisser, G. J. Burek, W. J. Mitchell, B. J. Thibeault, A. C. Gossard, and M. J. W. Rodwell, " 60 nm gate length # Andrew D. Carter, Jeremy J. M. Law, William Mitchell, Gregory J. Burek, Brian J. Thibeault, Arthur C. Gossard, Mark. J. W. Rodwe100 KB (14,246 words) - 23:34, 4 March 2020
- |A. Boes, B. Corcoran, L. Chang, J. Bowers, and A. Mitchell77 KB (11,491 words) - 23:10, 27 November 2019