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Unaxis ICP-PECVD is DOWN

RF1 continues to be a problem. I will start the process of elimination from a hardware point of view Monday. Once I resolve the hardware issue our Process group will be exclusively running the system for about a week. During this time we will NOT be allowing anyone else to use the system. Sorry for the inconvenience. //Vraj Mehalana 14:17, 22 September 2023 (PDT)

Wafer Bonder, (Suss SB6-8E)

The top heater has failed. We are currently in the process of trying to source a new heater. we will send out an email once I have an update.

//Vraj Mehalana 09:59, 20 September 2023 (PDT)

Dicing Saw (ADT) Upgrade 10/9

The dicing saw is scheduled go down for an upgrade on Monday October 9th and will be down for that week and into the weekend. Part of the upgrade will be updated software and will require users to be re-trained. I will provide more info on the re-training once I get a little hands on time with the updated software. I'll send out a couple of reminder emails between now and then and keep everyone updated in the event the schedule for this changes. //Vraj Mehalana 10:33, 6 September 2023 (PDT)

Stepper #1 (GCA 6300) Scheduled Maintenance

The tool has been scheduled for maintenance on 9-28-23 from 8:00am to 5:00pm. During this time the tool will be unavailable for use. Please plan your lab activities accordingly. //Vraj Mehalana 10:13, 6 September 2023 (PDT)

EVG is up

The work on the tool has been completed and it is available for use without Staff supervision. We made 30 runs on the tool without any high reflected power issues, but the possibility still remains that it could happen. System available for use. //Vraj Mehalana 14:16, 22 September 2023 (PDT)

How to use this wiki

NanoFab Users are responsible for understanding their chemistry, risks and usage of various chemicals. Please read the MSDS sheets for the chemicals you use!
Users can add qualified processing data to the Wiki pages; see the Editing_Tutorials for how to do that.

Supervisors of individuals using the facility, e.g., UCSB Principal Investigators and external user managers are ultimately responsible for ensuring that their supervisees have the appropriate knowledge and training to work safely in the facility.
They are also responsible for ensuring that all applicable regulatory requirements are met. This includes having a compliant "Chemical Hygiene Plan" per OSHA regulations.
The information on this site should be considered as providing "general supporting information" to the Chemical Hygiene Plan of a particular supervisor. Supervisors can reference all or some of this site information within their Plans. UCSB EH&S can provide assistance to supervisors in preparing their Plans.

News & Announcements

News from the U.C. Santa Barbara Nanofabrication Facility.

JEOL SEM's Installed

Both SEM's have been replaced with new JEOL SEM's #1 and SEM #2. SEM#1 has the NABITY lithography system installed, and SEM #2 has always-on EDAX elemental analysis. Contact the supervisor, Aidan Hopkins, for more information. // John d 18:31, 20 September 2023 (PDT)

Wide FOV Microscope Installed

We have installed an AmScope stereo microscope in Bay 4 for wide field-of-view digital imaging/capture, with >2cm of FOV currently available. Wiki page here: AmScope Wide Field of View Stereoscope // John d 14:52, 19 April 2023 (PDT)

Loomis Scribe & Break installed

We have installed a new Loomis LSD-155LT Automated Scribe & Break Cleaving tool in the Back-End Processing lab. Qualifications are underway. Contact supervisor, Aidan Hopkins, for more information. // John d 09:41, 16 April 2023 (PDT)

Dektak XT installed

We have replaced the old Dektak 6M with a new Dektak XT profilometer. This tool will provide robust, fast metrology for rapid in-process topography inspection. // John d 10:41, 25 January 2023 (PST)

New Process Control data tables

We have added "Process Control Data" - data on deposition/etch repeatability - to a number of our highest used etchers and deposition tools. The datasheets are linked in multiple places, mainly on the Recipes pages for each tool, or on the general Recipes pages for Deposition Recipes or Etch Recipes. // John d 16:07, 5 January 2023 (PST)

Oxford PlasmaPro ICP Etcher installed

We have a new ICP etcher in Bay 2: Oxford_ICP_Etcher_(PlasmaPro_100_Cobra)

The tool has been qualified for InP Ridge and InGaAsP Grating etches, and is intended for III-V etching in general (GaAs, GaN, GaSb etc.)

In addition, the tool is capable of Atomic Layer Etching on various materials. Contact the supervisor for training. // John d 11:27, 29 September 2021 (PDT)

SiO2 etching, High-Aspect Ratio

Dr. Bill Mitchell recently published an article detailing high-aspect ratio SiO2 etching (JVST-A, May 2021) in the Plasma-Therm Fluorine ICP etcher, using a novel Ruthenium Hard Mask.

Ruthenium can be deposited using the Oxford ALD or AJA Sputter and etched in one of the Panasonic ICP's.

You can find a full process flow at the FL-ICP's Recipe Page, in this case using a Sputtered Ru hard mask and I-line stepper lithography. // John d 08:05, 27 May 2021 (PDT)

Wafer Polisher available

We have added an Allied Wafer Polish tool to our equipment list. Contact Bill_Millerski for more information. // John d 16:49, 10 May 2021 (PDT)

Digital Microscope: Olympus DSX-1000

You'll see a new digital microscope in Bay 4/Metrology, that's our new Olympus DSX-1000. We are currently developing procedures, keep an eye out for training emails. // John d 13:49, 8 April 2021 (PDT)

Raith Velion: FIB/SEM Installation

We have installed a new state-of-the-art focused ion beam/electron beam tool in Bay 1. The Raith Velion enables synchronized interferometric stage, Focused-ion Beam Lithography with ~10nm features or less, live SEM during writing, and Electron-Beam Lithography.

Learn more about the tool's capabilities at the Raith website:

Tool qualification is currently underway. Dr. Dan Read is the resident expert on this new tool.

// John d 06:53, 30 November 2020 (PST)

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