Difference between revisions of "PECVD Recipes"
Jump to navigation
Jump to search
Line 15: | Line 15: | ||
*[[media:PECVD1 SiO2 Data-March 2014 SiO2 Data.pdf|SiO<sub>2</sub> Data (Deposition rate, Refractive Index, Stress, HF etch rate)]] |
*[[media:PECVD1 SiO2 Data-March 2014 SiO2 Data.pdf|SiO<sub>2</sub> Data (Deposition rate, Refractive Index, Stress, HF etch rate)]] |
||
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dGtRLWROZGFONTBpLVBNRGQyU3Mxa2c&usp=drive_web#gid=sharing SiO<sub>2</sub> 1000A Thickness uniformity 2014] |
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dGtRLWROZGFONTBpLVBNRGQyU3Mxa2c&usp=drive_web#gid=sharing SiO<sub>2</sub> 1000A Thickness uniformity 2014] |
||
− | * |
+ | *[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEw0bjFEdTF2SUhRa25Ca0d0SzBha3c#gid=sharing SiO<sub>2</sub>PECVD1 SiO2 Data March 2014] |
Revision as of 17:22, 21 March 2014
Back to Vacuum Deposition Recipes.
PECVD 1 (PlasmaTherm 790)
SiN deposition (PECVD #1)
- SiN Standard Recipe
- SiN Data (Deposition rate, Refractive index, Stress, HF etch rate)
- SiN 1000A Thickness uniformity 2014
- SiN Data March 2014
SiO2 deposition (PECVD #1)
- SiO2 Deposition Recipe
- SiO2 Data (Deposition rate, Refractive Index, Stress, HF etch rate)
- SiO2 1000A Thickness uniformity 2014
- SiO2PECVD1 SiO2 Data March 2014
SiOxNy deposition (PECVD #1)
PECVD 2 (Advanced Vacuum)
SiN deposition (PECVD #2)
SiO2 deposition (PECVD #2)
Amorphous-Si deposition (PECVD #2)
ICP-PECVD (Unaxis VLR)
SiN deposition (Unaxis VLR)
SiN (2% SiH4)
SiN (2% SiH4 - No-Ar)
50° | 100° | 250° |
---|---|---|
SiN (2% SiH4 - No-Ar - Extra N2)
50° | 100° | 250° |
---|---|---|
SiN (100% SiH4 )
50° | 100° | 250° |
---|---|---|
SiO2 deposition (Unaxis VLR)
SiO2 (2% SiH4)
50° | 100° | 250° |
---|---|---|
SiO2 (2% SiH4 - No Ar)
50° | 100° | 250° |
---|---|---|
SiO2 (100% SiH4 HDR)
50° | 100° | 250° |
---|---|---|
SiO2 (100% SiH4 LDR)
50° | 100° | 250° |
---|---|---|
Amorphous Si (100%SiH4 Ar He)
90° | 250° |
---|---|