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Show new changes starting from 19:02, 22 August 2026
 
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22 August 2026

     15:57  Template:News 5 changes history +2,280 [John d (5×)]
     
15:57 (cur | prev) +162 John d talk contribs (linked to CSMANTECH paper)
     
15:53 (cur | prev) +794 John d talk contribs (added csmantech paper)
     
15:39 (cur | prev) +791 John d talk contribs (added carp HS CHIP program)
     
15:30 (cur | prev) +2 John d talk contribs
     
15:30 (cur | prev) +531 John d talk contribs (added make microchips)
     15:55 Upload log John d talk contribs uploaded File:2026 CSMANTECH Paper-2366 - Foong Fatt - Machine Matching Methodology for Single-shot Lab to Lab Dry Etch Process Transfer.pdf (Machine Matching Methodology for Single-shot Lab to Lab Dry Etch Process Transfer Fatt Foong, Brian Thibeault, Noah Dutra, Demis D. John, Vraj Mehalana, Chandan Ramakrishnaiah, Shivakumar Bhaskaran, Jacky Tseng, Shimin Huang, Michio Aruga, Weldom Xie, Bokai Ma, Jeongho Ha, John Tamelier, Fubo Rao Conference: CS MANTECH Year: 2026 Topics Process Transfer Compound Semiconductors GaAs Design of Experiments InP Dry Etch Nanofabrication Abstract Small start-up companies benefit significantly...)

21 August 2026

     15:46  CAIBE (Oxford Ion Mill) diffhist +283 John d talk contribs (Detailed Specifications: moves Smaple Saizes to it's own section) Tag: Visual edit

20 August 2026

     20:11  CAIBE (Oxford Ion Mill) diffhist +69 John d talk contribs (removed 6" wafer capability) Tag: Visual edit

18 August 2026

     17:42  Process Group Interns diffhist +8 Noahdutra talk contribs (Alumni) Tag: Visual edit