Recent changes
Jump to navigation
Jump to search
Track the most recent changes to the wiki on this page.
List of abbreviations:
- N
- This edit created a new page (also see list of new pages)
- m
- This is a minor edit
- b
- This edit was performed by a bot
- (±123)
- The page size changed by this number of bytes
31 January 2025
| 18:54 | Template:Announcements diffhist +366 Mehalana v talk contribs | ||||
30 January 2025
| 23:45 | Stepper 3 (ASML DUV) diffhist +113 John d talk contribs (tutorial explanation) | ||||
| 23:44 | Stepper 2 (AutoStep 200) diffhist +113 John d talk contribs (tutorial explanation) | ||||
| 23:44 | Stepper 1 (GCA 6300) diffhist +433 John d talk contribs (→CAD Files: added Mask Making section and Cell+Layer for the CAD tempalte) | ||||
| 23:40 | Autostep 200 Mask Making Guidance diffhist +312 John d talk contribs (→CAD Files: added photomask Cell + Layer) | ||||
28 January 2025
|
|
18:54 | ICP Etching Recipes 4 changes history +777 [Gopimeena (4×)] | |||
|
|
18:54 (cur | prev) −2 Gopimeena talk contribs (→Photoresist Strip/Polymer Removal (Fluorine ICP Etcher)) Tag: Visual edit | ||||
|
|
18:53 (cur | prev) −2 Gopimeena talk contribs (→Photoresist Strip/Polymer Removal (Fluorine ICP Etcher)) Tags: Manual revert Visual edit | ||||
|
|
18:53 (cur | prev) +2 Gopimeena talk contribs (→Photoresist Strip/Polymer Removal (Fluorine ICP Etcher)) Tag: Visual edit | ||||
|
|
18:52 (cur | prev) +779 Gopimeena talk contribs (→Photoresist Strip/Polymer Removal (Fluorine ICP Etcher)) Tag: Visual edit | ||||
| 18:50 | File:SEM Image.png diffhist +104 Gopimeena talk contribs | ||||
|
|
18:47 | (Upload log) [Gopimeena (2×)] | |||
|
|
18:47 Gopimeena talk contribs uploaded File:SEM Image.png | ||||
|
|
18:36 Gopimeena talk contribs uploaded File:SEM Image of wafer after PR strip.png | ||||
| 15:30 | Mask Making Guidelines for Contact Aligners diffhist +656 Sawyer l talk contribs (tool specific mask and sub info added) | ||||
27 January 2025
|
|
22:57 | ICP Etching Recipes 3 changes history +34 [Gopimeena (3×)] | |||
|
|
22:57 (cur | prev) 0 Gopimeena talk contribs (→GaN Etch (Oxford ICP Etcher)) Tag: Visual edit | ||||
|
|
19:13 (cur | prev) +34 Gopimeena talk contribs (→GaAs Etch (Oxford ICP Etcher)) Tag: Visual edit | ||||
|
|
19:10 (cur | prev) 0 Gopimeena talk contribs (→GaAs Etch (Oxford ICP Etcher)) Tag: Visual edit | ||||
|
|
20:00 | Stepper 3 (ASML DUV) 2 changes history +507 [Gopimeena (2×)] | |||
|
|
20:00 (cur | prev) +3 Gopimeena talk contribs (→UCSB Photomasks Available) Tag: Visual edit | ||||
|
|
19:58 (cur | prev) +504 Gopimeena talk contribs (→Design Tools) Tag: Visual edit | ||||