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* Job to copy: '''TEST''' * From? '''[10,61]TEST.*''' ...

#Job to copy: '''TEST''' #From? '''[10,61]TEST.*''' ...

# Job to copy: '''TEST''' # From? '''[10,61]TEST.*''' ...

==== Test run on "dummy wafer" ==== ** Load cleaning recipe "Post dep PD", t=900sec ...

***Chamber season on a clean test wafer *Seasoning recipe name: '''SiO2 seasoning''', '''t=2min''' ...

::::'''''SiO 1/4λ time''': t_1/4λ = 259.4nm ÷ 5.2nm/min = 49.88min = '''2993.077 sec''''' ...sub>1/4λ</sub> * λ_target / λ_measured = ''corrected'' t_1/4λ ...

*Don't load a mask plate. *You will use [Lamp Test] for the exposure. You can also use "Flood Expose" program and type in an ...

...oogle.com/document/d/1sNfphnUfw0k9v7HkZGNpgm5siRxQiU6SCPqIY13mD2w/edit?tab=t.0 '''<big>UCSB Masks and Images for ASML</big>'''] ...ent markers for various NanoFab lithography systems, along with resolution test structures and patterns for calibrating [https://en.wikipedia.org/wiki/Opti ...

|type = Inspection, Test and Characterization ...probes are provided. The measurements can be taken with various electronic test equipment detailed below, including HP multimeters, a Tektronix Curve-Trace ...

**Battery Test<br /> ''Old pages we don't use on the Wiki anymore, but are kept for possible utility later on.'' ...

Especially useful for photoresists that don't chemically dissolve easily, such as PMGI, SU8, BCB. *Don't load a mask plate. ...

|type = Inspection, Test and Characterization ...considered a "reasonable" fit because the curves are very similar, but don't overlay perfectly, giving only reasonable confidence in the reported number ...

UPDATE: doesn’t work: Ning tried this and found these patterns were too difficult to see on *** ''More info on either pattern can be [[ASML Stepper 3 - UCSB Test Reticles|found here]].'' ...

|type = Inspection, Test and Characterization ...aves literally hundreds of hours over non-infrared techniques and it doesn't damage or affect the part in any way. ...

If you don't know how photomasks are made, it is easy to make a mistake in your order or ## Most photomasks are ''used'' in the fab with ''Chrome Down''. Don't confuse these two! ...

...lines must be manually switched between the two options shown (gasses can't be used simultaneously): N₂/He, CHF₃/Ar and CF<sub>4< **''Historical Data'' records "calibration" etches to test tool performance. ...

...ern "Visual Editor". Due to existing page linking/URLs, many of these can't be changed (such as code used for superscripts and subscripts in page names Only Staff & Admins can make new pages. If you want to do this but don’t have permission, please let the [[Wiki Admin|wiki admin]] know and we’ll be ...

...ice users. Charge for All wafers, including test/dummy wafers that we don't send to the user. Discuss any possible exceptions as needed. ...

...upload/convert until the job runs as expected. (Be sure to actually run a test exposure as well - some errors only pop up during exposure.) <code>D. John, D., UCSB Nanofabrication Facility, Morin, T., & Daal, M. (2024). ASML_JobCreator (Version 1.4.3) [Computer software]. < ...

===[[ASML Stepper 3 - UCSB Test Reticles|UCSB Photomasks Available]]=== |The ''Best'' exposure without OPC corrections; '''doesn't meet device criteria'''. Would require ordering a 2nd mask to correct. ...