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* Job to copy: '''TEST''' * From? '''[10,61]TEST.*'''

#Job to copy: '''TEST''' #From? '''[10,61]TEST.*'''

# Job to copy: '''TEST''' # From? '''[10,61]TEST.*'''

==== Test run on "dummy wafer" ==== ** Load cleaning recipe "Post dep PD", t=900sec

***Chamber season on a clean test wafer *Seasoning recipe name: '''SiO2 seasoning''', '''t=2min'''

::::'''''SiO 1/4λ time''': t_1/4λ = 259.4nm ÷ 5.2nm/min = 49.88min = '''2993.077 sec''''' ...sub>1/4λ</sub> * λ_target / λ_measured = ''corrected'' t_1/4λ

*Don't load a mask plate. *You will use [Lamp Test] for the exposure. You can also use "Flood Expose" program and type in an

...oogle.com/document/d/1sNfphnUfw0k9v7HkZGNpgm5siRxQiU6SCPqIY13mD2w/edit?tab=t.0 '''<big>UCSB Masks and Images for ASML</big>'''] ...ent markers for various NanoFab lithography systems, along with resolution test structures and patterns for calibrating [https://en.wikipedia.org/wiki/Opti

|type = Inspection, Test and Characterization ...probes are provided. The measurements can be taken with various electronic test equipment detailed below, including HP multimeters, a Tektronix Curve-Trace

**Battery Test<br /> ''Old pages we don't use on the Wiki anymore, but are kept for possible utility later on.''

|type = Inspection, Test and Characterization ...considered a "reasonable" fit because the curves are very similar, but don't overlay perfectly, giving only reasonable confidence in the reported number

UPDATE: doesn’t work: Ning tried this and found these patterns were too difficult to see on *** ''More info on either pattern can be [[ASML Stepper 3 - UCSB Test Reticles|found here]].''

|type = Inspection, Test and Characterization ...aves literally hundreds of hours over non-infrared techniques and it doesn't damage or affect the part in any way.

...lines must be manually switched between the two options shown (gasses can't be used simultaneously): N₂/He, CHF₃/Ar and CF<sub>4< **''Historical Data'' records "calibration" etches to test tool performance.

...ern "Visual Editor". Due to existing page linking/URLs, many of these can't be changed (such as code used for superscripts and subscripts in page names Only Staff & Admins can make new pages. If you want to do this but don’t have permission, please let the [[Wiki Admin|wiki admin]] know and we’ll

...ice users. Charge for All wafers, including test/dummy wafers that we don't send to the user. Discuss any possible exceptions as needed.

...upload/convert until the job runs as expected. (Be sure to actually run a test exposure as well - some errors only pop up during exposure.) <code>D. John, D., UCSB Nanofabrication Facility, Morin, T., & Daal, M. (2024). ASML_JobCreator (Version 1.4.3) [Computer software]. <

===[[ASML Stepper 3 - UCSB Test Reticles|UCSB Photomasks Available]]=== |The ''Best'' exposure without OPC corrections; '''doesn't meet device criteria'''. Would require ordering a 2nd mask to correct.

**For ''Back side alignment'', don't forget to mirror your pattern horizontally/over the Y-axis (since your wafe ...aled to the reticle scale), so the vendor will print & measure & guarantee test structures at that exact size.

...x reticle scale), so the photomask vendor will print & measure & guarantee test structures at that exact size. They'll usually write a small CD pattern som *You don't have to include the Stepper outer template - usually photomask vendors can