Don Freeborn: Difference between revisions
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Freeborn d (talk | contribs) (Linked the Fluorine etch page.) |
Freeborn d (talk | contribs) (Added links.) |
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Current Work |
Current Work |
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=Current Work= |
=Current Work= |
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*Plasma Therm DSE-iii(Plasma-Therm/Deep Silicon Etcher) |
*[[DSEIII (PlasmaTherm/Deep Silicon Etcher)|Plasma Therm DSE-iii(Plasma-Therm/Deep Silicon Etcher)]] |
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*[[Wafer Bonder (SUSS SB6-8E)]] |
*[[Wafer Bonder (SUSS SB6-8E)]] |
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*[[E-Beam 3 (Temescal)]] |
*[[E-Beam 3 (Temescal)]] |
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*[[Plasma-Therm SLR: Fluorine ICP]] |
*[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)|Plasma-Therm SLR: Fluorine ICP]] |
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*[[ICP Etch 1 (Panasonic E626I)]] |
*[[ICP Etch 1 (Panasonic E626I)]] |
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*[[XeF2 Etch (Xetch)|XeF<sub>2</sub> Etch (Xetch)]] |
*[[XeF2 Etch (Xetch)|XeF<sub>2</sub> Etch (Xetch)]] |
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Revision as of 22:26, 25 February 2019
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About
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Don Freeborn
is in charge of the following tools: