Vacuum Deposition Recipes: Difference between revisions

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(corrected PECVD2 a-Si link)
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{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
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! colspan="18" width="1675" height="45" | <div style="font-size: 150%;">Vacuum Deposition Recipes</div>
! colspan="16" width="1675" height="45" |<div style="font-size: 150%;">Vacuum Deposition Recipes</div>
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|<!-- INTENTIONALLY LEFT BLANK --><br>
! colspan="4" bgcolor="#d0e7ff" align="center" | '''[[E-Beam Evaporation Recipes|E-Beam Evaporation]]'''
! colspan="4" bgcolor="#d0e7ff" align="center" |'''[[E-Beam Evaporation Recipes|E-Beam Evaporation]]'''
! colspan="6" bgcolor="#d0e7ff" align="center" | '''[[Sputtering Recipes|Sputtering]]'''
! colspan="4" |'''[[Sputtering Recipes|Sputtering]]'''
! colspan="2" bgcolor="#d0e7ff" align="center" | '''[[Thermal Evaporation Recipes|Thermal Evaporation]]'''
! colspan="2" bgcolor="#d0e7ff" align="center" |'''[[Thermal Evaporation Recipes|Thermal Evaporation]]'''
! colspan="3" bgcolor="#d0e7ff" align="center" | '''[[PECVD Recipes|Plasma Enhanced Chemical<br>Vapor Deposition (PECVD)]]'''
! colspan="3" bgcolor="#d0e7ff" align="center" |'''[[PECVD Recipes|Plasma Enhanced Chemical<br>Vapor Deposition (PECVD)]]'''
! width="90" bgcolor="#d0e7ff" align="center" | '''[[Atomic Layer Deposition Recipes|Atomic Layer Deposition]]'''
! width="90" bgcolor="#d0e7ff" align="center" |'''[[Atomic Layer Deposition Recipes|Atomic Layer Deposition]]'''
! width="80" bgcolor="#d0e7ff" align="center" | '''[[Molecular Vapor Deposition Recipes|Molecular Vapor Deposition]]'''
! width="80" bgcolor="#d0e7ff" align="center" |'''[[Molecular Vapor Deposition Recipes|Molecular Vapor Deposition]]'''
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! width="20" bgcolor="#d0e7ff" align="center" | '''Material'''
! width="20" bgcolor="#d0e7ff" align="center" |'''Material'''
| width="65" bgcolor="#daf1ff" | [[E-Beam Evaporation Recipes#E-Beam_1_.28Sharon.29|E-Beam 1 (Sharon)]]
| width="65" bgcolor="#daf1ff" |[[E-Beam Evaporation Recipes#E-Beam_1_.28Sharon.29|E-Beam 1 (Sharon)]]
| width="65" bgcolor="#daf1ff" | [[E-Beam Evaporation Recipes#E-Beam_2_.28Custom.29|E-Beam 2 (Custom)]]
| width="65" bgcolor="#daf1ff" |[[E-Beam Evaporation Recipes#E-Beam_2_.28Custom.29|E-Beam 2 (Custom)]]
| width="65" bgcolor="#daf1ff" | [[E-Beam Evaporation Recipes#E-Beam_3_.28Temescal.29|E-Beam 3 (Temescal)]]
| width="65" bgcolor="#daf1ff" |[[E-Beam Evaporation Recipes#E-Beam_3_.28Temescal.29|E-Beam 3 (Temescal)]]
| width="65" bgcolor="#daf1ff" | [[E-Beam Evaporation Recipes#E-Beam_4_.28CHA.29|E-Beam 4 (CHA)]]
| width="65" bgcolor="#daf1ff" |[[E-Beam Evaporation Recipes#E-Beam_4_.28CHA.29|E-Beam 4 (CHA)]]
| width="65" bgcolor="#daf1ff" | [[Sputtering Recipes#Sputter_1_.28Custom.29|Sputter 1 (Custom)]]
| width="65" bgcolor="#daf1ff" |[[Sputtering_Recipes#Sputter_3_.28AJA_ATC_2000-F.29|Sputter 3<br>(AJA ATC 2000-F)]]
| width="65" bgcolor="#daf1ff" | [[Sputtering Recipes#Sputter_2_.28SFI_Endeavor.29|Sputter 2<br>(SFI Endeavor)]]
| width="65" bgcolor="#daf1ff" |[[Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29|Sputter 4<br>(AJA ATC 2200-V)]]
| width="65" bgcolor="#daf1ff" | [[Sputtering_Recipes#Sputter_3_.28AJA_ATC_2000-F.29|Sputter 3<br>(AJA ATC 2000-F)]]
| width="65" bgcolor="#daf1ff" |[https://www.nanotech.ucsb.edu/wiki/index.php/Sputtering_Recipes#Sputter_5_.28AJA_ATC_2200-V.29 Sputter 5 (AJA ATC 2200-V)]
| width="65" bgcolor="#daf1ff" | [[Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29|Sputter 4<br>(AJA ATC 2200-V)]]
| width="55" bgcolor="#daf1ff" |[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|Ion Beam<br>Deposition (Veeco Nexus)]]
| width="45" bgcolor="#daf1ff" |[[Thermal Evaporation Recipes#Thermal_Evap_1|Thermal<br>Evap 1]]
| width="65" bgcolor="#daf1ff" | [https://www.nanotech.ucsb.edu/wiki/index.php/Sputtering_Recipes#Sputter_5_.28AJA_ATC_2200-V.29 Sputter 5 (AJA ATC 2200-V)]
| width="55" bgcolor="#daf1ff" | [[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|Ion Beam<br>Deposition (Veeco Nexus)]]
| width="65" bgcolor="#daf1ff" |[[Thermal Evaporation Recipes#Thermal_Evap_2_.28Solder.29|Thermal Evap 2 (Solder)]]
| width="45" bgcolor="#daf1ff" | [[Thermal Evaporation Recipes#Thermal_Evap_1|Thermal<br>Evap 1]]
| width="65" bgcolor="#daf1ff" |[[PECVD Recipes#PECVD_1_.28PlasmaTherm_790.29|PECVD 1<br>(PlasmaTherm 790)]]
| width="65" bgcolor="#daf1ff" | [[Thermal Evaporation Recipes#Thermal_Evap_2_.28Solder.29|Thermal Evap 2 (Solder)]]
| width="65" bgcolor="#daf1ff" |[[PECVD Recipes#PECVD_2_.28Advanced_Vacuum.29|PECVD 2<br>(Advanced Vacuum)]]
| width="65" bgcolor="#daf1ff" | [[PECVD Recipes#PECVD_1_.28PlasmaTherm_790.29|PECVD 1<br>(PlasmaTherm 790)]]
| width="65" bgcolor="#daf1ff" |[[PECVD_Recipes#ICP-PECVD_.28Unaxis_VLR.29|Unaxis VLR ICP-PECVD]]
| width="65" bgcolor="#daf1ff" | [[PECVD Recipes#PECVD_2_.28Advanced_Vacuum.29|PECVD 2<br>(Advanced Vacuum)]]
| width="65" bgcolor="#daf1ff" |[[Atomic_Layer_Deposition_Recipes|Atomic Layer Deposition (Oxford FlexAL)]]
| width="65" bgcolor="#daf1ff" | [[PECVD_Recipes#ICP-PECVD_.28Unaxis_VLR.29|Unaxis VLR ICP-PECVD]]
| width="65" bgcolor="#daf1ff" |[[Molecular Vapor Deposition|Molecular Vapor Deposition (Tool)]]
| width="65" bgcolor="#daf1ff" | [[Atomic_Layer_Deposition_Recipes|Atomic Layer Deposition (Oxford FlexAL)]]
| width="65" bgcolor="#daf1ff" | [[Molecular Vapor Deposition|Molecular Vapor Deposition (Tool)]]
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| bgcolor="#eeffff" |[https://www.nanotech.ucsb.edu/wiki/index.php/Sputtering_Recipes#Al2O3_deposition_.28IBD.29 R]
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! bgcolor="#d0e7ff" align="center" | HfO<sub>2</sub>
! bgcolor="#d0e7ff" align="center" |HfO<sub>2</sub>
| <br>
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|[[Sputtering Recipes|A]]
| <br>
|[[Sputtering Recipes|A]]
| <br>
|<br>
| [[Sputtering Recipes|A]]
|<br>
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| <br>
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|{{rl|Atomic Layer Deposition Recipes|HfO2 deposition (ALD CHAMBER 3)}}
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| {{rl|Atomic Layer Deposition Recipes|HfO2 deposition (ALD CHAMBER 3)}}
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| bgcolor="#eeffff" |[[Thermal Evaporation Recipes|A]]
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | [[Thermal Evaporation Recipes|A]]
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! bgcolor="#d0e7ff" align="center" |Ir
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| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | {{rl|E-Beam Evaporation Recipes|E-Beam 2 (Custom)|ITO deposition (E-Beam 2)}}
| bgcolor="#eeffff" |{{rl|E-Beam Evaporation Recipes|E-Beam 2 (Custom)|ITO deposition (E-Beam 2)}}
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | <br>
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| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" | [[Sputtering Recipes|A]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | [[Sputtering Recipes|A]]
| bgcolor="#eeffff" |[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]
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| bgcolor="#eeffff" | [[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]
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| bgcolor="#eeffff" |[[Sputtering Recipes|R]]
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| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" | [[Sputtering Recipes|R]]
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! bgcolor="#d0e7ff" align="center" |Nb
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|[[Sputtering Recipes|R]]
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! bgcolor="#d0e7ff" align="center" |Ni
| bgcolor="#eeffff" | {{Al/E1}}
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | {{Al/E3}}
| bgcolor="#eeffff" |{{Al/E3}}
| bgcolor="#eeffff" | {{Al/E4}}
| bgcolor="#eeffff" |{{Al/E4}}
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter 3 (AJA ATC 2000-F)}}
| bgcolor="#eeffff" | <br>
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| bgcolor="#eeffff" | {{rl|Sputtering Recipes|Sputter 3 (AJA ATC 2000-F)}}
| bgcolor="#eeffff" |<br>
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| bgcolor="#eeffff" |[[Thermal Evaporation Recipes|A]]
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |[[Thermal Evaporation Recipes|A]]
| bgcolor="#eeffff" | [[Thermal Evaporation Recipes|A]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | [[Thermal Evaporation Recipes|A]]
| bgcolor="#eeffff" |<br>
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! bgcolor="#d0e7ff" align="center" |NiCr
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! bgcolor="#d0e7ff" align="center" |NiFe
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| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
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| {{Al/E1}}
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|[[Thermal Evaporation Recipes|A]]
| <br>
|[[Thermal Evaporation Recipes|A]]
| <br>
|<br>
| [[Thermal Evaporation Recipes|A]]
|<br>
| [[Thermal Evaporation Recipes|A]]
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! bgcolor="#d0e7ff" align="center" | Pt
! bgcolor="#d0e7ff" align="center" |Pt
| bgcolor="#eeffff" | {{Al/E1}}
| bgcolor="#eeffff" |{{Al/E1}}
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | {{Al/E3}}
| bgcolor="#eeffff" |{{Al/E3}}
| bgcolor="#eeffff" | {{Al/E4}}
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| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter 4 (AJA ATC 2200-V)}}
| bcolor="EEFFFF" |<br>
| bgcolor="#eeffff" | [[Sputtering Recipes|A]]
| bgcolor="#eeffff" | {{rl|Sputtering Recipes|Sputter 4 (AJA ATC 2200-V)}}
| bgcolor="#eeffff" |<br>
| bcolor="EEFFFF" | <br>
| bgcolor="#eeffff" |<br>
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| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|Pt deposition (ALD CHAMBER 1)}}
| bgcolor="#eeffff" | <br>
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| bgcolor="#eeffff" | {{rl|Atomic Layer Deposition Recipes|Pt deposition (ALD CHAMBER 1)}}
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! bgcolor="#d0e7ff" align="center" | Ru
! bgcolor="#d0e7ff" align="center" |Ru
| {{Al/E1}}
|{{Al/E1}}
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| {{Al/E4}}
|{{Al/E4}}
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|{{rl|Atomic Layer Deposition Recipes|Ru deposition (ALD CHAMBER 1)}}
| <br>
| <br>
|<br>
| {{rl|Atomic Layer Deposition Recipes|Ru deposition (ALD CHAMBER 1)}}
| <br>
|-
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! bgcolor="#d0e7ff" align="center" | Si
! bgcolor="#d0e7ff" align="center" |Si
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | {{Al/E2}}
| bgcolor="#eeffff" |{{Al/E2}}
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |<br>
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| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |[[Sputtering Recipes|R]]
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" | [[Sputtering Recipes|R]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | [[Sputtering Recipes|A]]
| bgcolor="#eeffff" |<br>[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | <br>[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" |[https://www.nanotech.ucsb.edu/wiki/index.php/PECVD_Recipes#Amorphous-Si_deposition_.28PECVD_.232.29 R]
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| bgcolor="#eeffff" |[[PECVD_Recipes#Amorphous_Si_.28100.25SiH4_Ar_He.29|R]]
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| bgcolor="#eeffff" | [https://www.nanotech.ucsb.edu/wiki/index.php/PECVD_Recipes#Amorphous-Si_deposition_.28PECVD_.232.29 R]
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! bgcolor="#d0e7ff" align="center" |SiN
| <br>
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|{{rl|Sputtering Recipes|SiN deposition (Sputter 3)}}
| <br>
|[[Sputtering Recipes|A]]
| <br>
|<br>
| {{rl|Sputtering Recipes|SiN deposition (Sputter 3)}}
|[[Sputtering_Recipes#Si3N4_deposition_.28IBD.29|R]]
| [[Sputtering Recipes|A]]
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| [[Sputtering_Recipes#Si3N4_deposition_.28IBD.29|R]]
|{{rl|PECVD Recipes|SiN deposition (PECVD #1)}}
| <br>
|{{rl|PECVD Recipes|SiN deposition (PECVD #2)}}
| <br>
| {{rl|PECVD Recipes|SiN deposition (PECVD #1)}}
|{{rl|PECVD Recipes|SiN deposition (Unaxis VLR)}}
|<br>
| {{rl|PECVD Recipes|SiN deposition (PECVD #2)}}
|<br>
| {{rl|PECVD Recipes|SiN deposition (Unaxis VLR)}}
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! bgcolor="#d0e7ff" align="center" | SiO<sub>2</sub>
! bgcolor="#d0e7ff" align="center" |SiO<sub>2</sub>
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| bgcolor="#eeffff" |{{rl|Sputtering Recipes|SiO2 deposition (Sputter 3)}}
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| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" | {{rl|Sputtering Recipes|SiO2 deposition (Sputter 3)}}
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
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| bgcolor="#eeffff" |[[Sputtering_Recipes#SiO2_deposition_.28IBD.29|R]]
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| bgcolor="#eeffff" |<br>
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| bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 deposition (PECVD #1)}}
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 deposition (PECVD #2)}}
| bgcolor="#eeffff" | {{rl|PECVD Recipes|SiO2 deposition (PECVD #1)}}
| bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 deposition (Unaxis VLR)}}
| bgcolor="#eeffff" | {{rl|PECVD Recipes|SiO2 deposition (PECVD #2)}}
| bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|SiO2 deposition (ALD CHAMBER 3)}}
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| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | {{rl|Atomic Layer Deposition Recipes|SiO2 deposition (ALD CHAMBER 3)}}
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|-
|-
! bgcolor="#d0e7ff" align="center" | SiO<sub>x</sub>N<sub>y</sub>
! bgcolor="#d0e7ff" align="center" |SiO<sub>x</sub>N<sub>y</sub>
| <br>
|<br>
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|<br>
| <br>
|<br>
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|<br>
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|<br>
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|<br>
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|<br>
|[https://www.nanotech.ucsb.edu/wiki/index.php/Sputtering_Recipes#SiOxNy_deposition_.28IBD.29 A]
| <br>
| <br>
|<br>
|<br>
| [https://www.nanotech.ucsb.edu/wiki/index.php/Sputtering_Recipes#SiOxNy_deposition_.28IBD.29 A]
|[[PECVD_Recipes#PECVD_1_.28PlasmaTherm_790.29|R]]
| <br>
| <br>
|<br>
|<br>
| [[PECVD_Recipes#PECVD_1_.28PlasmaTherm_790.29|R]]
| <br>
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! bgcolor="#d0e7ff" align="center" | Sn
! bgcolor="#d0e7ff" align="center" |Sn
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| bgcolor="#eeffff" |[[Thermal Evaporation Recipes|A]]
| bgcolor="#eeffff" | <br>
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| bgcolor="#eeffff" | [[Thermal Evaporation Recipes|A]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |<br>
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! bgcolor="#d0e7ff" align="center" | SrF<sub>2</sub>
! bgcolor="#d0e7ff" align="center" |SrF<sub>2</sub>
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! bgcolor="#d0e7ff" align="center" |Ta
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| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Ta deposition (Sputter 3)}}
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" | {{rl|Sputtering Recipes|Ta deposition (Sputter 3)}}
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | [[Sputtering Recipes|A]]
| bgcolor="#eeffff" |<br>[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | <br>[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]
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! bgcolor="#d0e7ff" align="center" | Ta<sub>2</sub>O<sub>5</sub>
! bgcolor="#d0e7ff" align="center" |Ta<sub>2</sub>O<sub>5</sub>
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| {{Al/E2}}
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|[[Sputtering_Recipes#Ta2O5_deposition_.28IBD.29|R]]
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| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter 3 (AJA ATC 2000-F)}}
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Ti-Au Deposition (Sputter 4)}}
| bgcolor="#eeffff" | {{rl|Sputtering Recipes|Sputter 3 (AJA ATC 2000-F)}}
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| bgcolor="#eeffff" |<br>[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]
| bgcolor="#eeffff" | {{rl|Sputtering Recipes|Ti-Au Deposition (Sputter 4)}}
| bgcolor="#eeffff" | <br>
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| bgcolor="#eeffff" | <br>[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]
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|[https://www.nanotech.ucsb.edu/wiki/index.php/Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29 R]
| [[Sputtering Recipes|A]]
| <br>
|<br>
| [https://www.nanotech.ucsb.edu/wiki/index.php/Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29 R]
|[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]]
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|{{rl|Atomic Layer Deposition Recipes|TiN deposition (ALD CHAMBER 3)}}
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! bgcolor="#d0e7ff" align="center" | TiW
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| bgcolor="#eeffff" |{{rl|Sputtering Recipes|W-TiW Deposition (Sputter 4)}}
| bgcolor="#eeffff" | [[Sputtering Recipes|A]]
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| bgcolor="#eeffff" | {{rl|Sputtering Recipes|W-TiW Deposition (Sputter 4)}}
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! bgcolor="#d0e7ff" align="center" | TiO<sub>2</sub>
! bgcolor="#d0e7ff" align="center" |TiO<sub>2</sub>
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| bgcolor="#eeffff" | {{Al/E2}}
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| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" | {{Rl|Sputtering Recipes|TiO2 deposition (Sputter 2)}}
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter 4 (AJA ATC 2200-V)}}
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| bgcolor="#eeffff" |[[Sputtering_Recipes#TiO2_deposition_.28IBD.29|R]]
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| bgcolor="#eeffff" | {{rl|Atomic Layer Deposition Recipes|TiO2 deposition (ALD CHAMBER 3)}}
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| bgcolor="#eeffff" |[[Sputtering Recipes|A]]
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |{{rl|Sputtering Recipes|W deposition (Sputter 4)}}
| bgcolor="#eeffff" | [[Sputtering Recipes|A]]
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | {{rl|Sputtering Recipes|W deposition (Sputter 4)}}
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|[[Thermal Evaporation Recipes|A]]
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| [[Thermal Evaporation Recipes|A]]
|<br>
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! bgcolor="#d0e7ff" align="center" | ZnO
! bgcolor="#d0e7ff" align="center" |ZnO
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| bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|ZnO:Al deposition (ALD CHAMBER 1)}}
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| bgcolor="#eeffff" | {{rl|Atomic Layer Deposition Recipes|ZnO:Al deposition (ALD CHAMBER 1)}}
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! bgcolor="#d0e7ff" align="center" | ZrO<sub>2</sub>
! bgcolor="#d0e7ff" align="center" |ZrO<sub>2</sub>
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| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|ZrO2 deposition (ALD CHAMBER 3)}}
| bgcolor="#eeffff" | <br>
| bgcolor="#eeffff" |<br>
| bgcolor="#eeffff" | {{rl|Atomic Layer Deposition Recipes|ZrO2 deposition (ALD CHAMBER 3)}}
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|-
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! width="20" bgcolor="#d0e7ff" align="center" | '''Material'''
! width="20" bgcolor="#d0e7ff" align="center" |'''Material'''
| width="65" bgcolor="#daf1ff" | [[E-Beam Evaporation Recipes#E-Beam_1_.28Sharon.29|E-Beam 1 (Sharon)]]
| width="65" bgcolor="#daf1ff" |[[E-Beam Evaporation Recipes#E-Beam_1_.28Sharon.29|E-Beam 1 (Sharon)]]
| width="65" bgcolor="#daf1ff" | [[E-Beam Evaporation Recipes#E-Beam_2_.28Custom.29|E-Beam 2 (Custom)]]
| width="65" bgcolor="#daf1ff" |[[E-Beam Evaporation Recipes#E-Beam_2_.28Custom.29|E-Beam 2 (Custom)]]
| width="65" bgcolor="#daf1ff" | [[E-Beam Evaporation Recipes#E-Beam_3_.28Temescal.29|E-Beam 3 (Temescal)]]
| width="65" bgcolor="#daf1ff" |[[E-Beam Evaporation Recipes#E-Beam_3_.28Temescal.29|E-Beam 3 (Temescal)]]
| width="65" bgcolor="#daf1ff" | [[E-Beam Evaporation Recipes#E-Beam_4_.28CHA.29|E-Beam 4 (CHA)]]
| width="65" bgcolor="#daf1ff" |[[E-Beam Evaporation Recipes#E-Beam_4_.28CHA.29|E-Beam 4 (CHA)]]
| width="65" bgcolor="#daf1ff" | [[Sputtering Recipes#Sputter_1_.28Custom.29|Sputter 1 (Custom)]]
| width="65" bgcolor="#daf1ff" |[[Sputtering Recipes#Sputter_3_.28ATC_2000-F.29|Sputter 3<br>(ATC 2000-F)]]
| width="65" bgcolor="#daf1ff" | [[Sputtering Recipes#Sputter_2_.28SFI_Endeavor.29|Sputter 2<br>(SFI Endeavor)]]
| width="65" bgcolor="#daf1ff" |[[Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29|Sputter 4<br>(ATC 2200-V)]]
| width="65" bgcolor="#daf1ff" | [[Sputtering Recipes#Sputter_3_.28ATC_2000-F.29|Sputter 3<br>(ATC 2000-F)]]
| width="65" bgcolor="#daf1ff" |[[Sputtering Recipes|Sputter 5 (ATC 2200-V)]]
| width="65" bgcolor="#daf1ff" | [[Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29|Sputter 4<br>(ATC 2200-V)]]
| width="55" bgcolor="#daf1ff" |[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|Ion Beam<br>Deposition (Veeco Nexus)]]
| width="65" bgcolor="#daf1ff" | [[Sputtering Recipes|Sputter 5 (ATC 2200-V)]]
| width="45" bgcolor="#daf1ff" |[[Thermal Evaporation Recipes#Thermal_Evap_1|Thermal<br>Evap 1]]
| width="55" bgcolor="#daf1ff" | [[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|Ion Beam<br>Deposition (Veeco Nexus)]]
| width="65" bgcolor="#daf1ff" |[[Thermal Evaporation Recipes#Thermal_Evap_2_.28Solder.29|Thermal Evap 2 (Solder)]]
| width="45" bgcolor="#daf1ff" | [[Thermal Evaporation Recipes#Thermal_Evap_1|Thermal<br>Evap 1]]
| width="65" bgcolor="#daf1ff" |[[PECVD Recipes#PECVD_1_.28PlasmaTherm_790.29|PECVD 1<br>(PlasmaTherm 790)]]
| width="65" bgcolor="#daf1ff" | [[Thermal Evaporation Recipes#Thermal_Evap_2_.28Solder.29|Thermal Evap 2 (Solder)]]
| width="65" bgcolor="#daf1ff" |[[PECVD Recipes#PECVD_2_.28Advanced_Vacuum.29|PECVD 2<br>(Advanced Vacuum)]]
| width="65" bgcolor="#daf1ff" | [[PECVD Recipes#PECVD_1_.28PlasmaTherm_790.29|PECVD 1<br>(PlasmaTherm 790)]]
| width="65" bgcolor="#daf1ff" |[[PECVD_Recipes#ICP-PECVD_.28Unaxis_VLR.29|Unaxis VLR ICP-PECVD]]
| width="65" bgcolor="#daf1ff" | [[PECVD Recipes#PECVD_2_.28Advanced_Vacuum.29|PECVD 2<br>(Advanced Vacuum)]]
| width="65" bgcolor="#daf1ff" |[[Atomic_Layer_Deposition_Recipes|Atomic Layer Deposition (Oxford FlexAl)]]
| width="65" bgcolor="#daf1ff" | [[PECVD_Recipes#ICP-PECVD_.28Unaxis_VLR.29|Unaxis VLR ICP-PECVD]]
| width="65" bgcolor="#daf1ff" |[[Molecular Vapor Deposition|Molecular Vapor Deposition (Tool)]]
| width="65" bgcolor="#daf1ff" | [[Atomic_Layer_Deposition_Recipes|Atomic Layer Deposition (Oxford FlexAl)]]
| width="65" bgcolor="#daf1ff" | [[Molecular Vapor Deposition|Molecular Vapor Deposition (Tool)]]
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Revision as of 04:28, 17 September 2019

  • R = Recipe is available. Clicking this link will take you to the recipe.
  • A = Material is available for use, but no recipes are provided.
Vacuum Deposition Recipes

E-Beam Evaporation Sputtering Thermal Evaporation Plasma Enhanced Chemical
Vapor Deposition (PECVD)
Atomic Layer Deposition Molecular Vapor Deposition
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 3
(AJA ATC 2000-F)
Sputter 4
(AJA ATC 2200-V)
Sputter 5 (AJA ATC 2200-V) Ion Beam
Deposition (Veeco Nexus)
Thermal
Evap 1
Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790)
PECVD 2
(Advanced Vacuum)
Unaxis VLR ICP-PECVD Atomic Layer Deposition (Oxford FlexAL) Molecular Vapor Deposition (Tool)
Ag A
A A A A








Al A
A A A R1

A
A A




Al2O3 A A

A R1
R




R1
AlN



A A
A




R1
Au A
A A A R1

A A




B














C R1
CeO2
CeO2 deposition (E-Beam 2)












Co A

A R









Cr A

A R


A A




Cu A


R1 A








Fe A

A R









Ge A
A A A A








GeO2 A
Gd A

A










Hf A













HfO2



A A






R1
In








A




Ir A













ITO
ITO deposition (E-Beam 2)

A A
A






MgF2 A A
MgO A
Mo A


R A








Nb A



R








Nd



A








Ni A
A A R1


A A




NiCr A A
NiFe A A A
Pd A
A A



A A




Pt A
A A A R1






R1
Ru A

A








R1
Si
A

R A

A



R R

SiN



R1 A
R

R1 R1 R1

SiO2 A A

R1 A A R

R1 R1 R1 R1
SiOxNy






A

R



Sn








A




SrF2
A












Ta A


R1 A

A







Ta2O5


A


R






Ti A
A A R1 R1

A







TiN




R
A




R1
TiW A


A R1








TiO2
A

A R1
R




R1
V



A A








W A


A R1








Zn







A A




ZnO












R1
Zr A

A A A








ZrO2












R1
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 3
(ATC 2000-F)
Sputter 4
(ATC 2200-V)
Sputter 5 (ATC 2200-V) Ion Beam
Deposition (Veeco Nexus)
Thermal
Evap 1
Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790)
PECVD 2
(Advanced Vacuum)
Unaxis VLR ICP-PECVD Atomic Layer Deposition (Oxford FlexAl) Molecular Vapor Deposition (Tool)