Processing - How Do I…?
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Below are answers to common processing questions in the NanoFab.
Lithography
Mask Plates - How do I order a mask plate?
- How to order a contact mask plate
- How to order a mask plate for the GCA Steppers
- How to order an ASML mask plate
Calibration - How do I determine the correct exposure Dose/Focus?
On tools that have motorized autofocus (steppers & direct-write litho tools), you often need to analyze both the Focus Offset & Exposure Dose simultaneously. (Remember that "Focus Offset" is an offset from the autofocus' "zero" position of the wafer surface.) These tools will have a function for shooting a "Focus Exposure Matrix/Array", or "FEM/FEA", which exposes a grid with Dose varying in one direction, and Focus varying in another - the following explains how to find the Process Window from your FEM:
Deposition
Metal Deposition
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Dielectric/Insulator Deposition
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Etching
Dry (plasma) Etching
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Wet (chemical) Etching
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Materials
Material "Quality"
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Alloying metals
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Impurities
Experiment Setup
Design of Experiments
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Tracking your processes
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