Recent changes
Jump to navigation
Jump to search
Track the most recent changes to the wiki on this page.
List of abbreviations:
- N
- This edit created a new page (also see list of new pages)
- m
- This is a minor edit
- b
- This edit was performed by a bot
- (±123)
- The page size changed by this number of bytes
13 August 2025
| 01:26 | ICP Etching Recipes diffhist +157 John d talk contribs (→Process Control Data (Oxford ICP Etcher): added note that 60°C is no longer run regularly) Tag: Visual edit | ||||
12 August 2025
|
|
23:55 | Process Group - Process Control Data 3 changes history +964 [Noahdutra (3×)] | |||
|
|
23:55 (cur | prev) +124 Noahdutra talk contribs (→NEW Std InP Ridge Etch Cl2/H2/Ar/200°C) | ||||
|
|
23:54 (cur | prev) −129 Noahdutra talk contribs (→NEW Std InP Ridge Etch Cl2/H2/Ar/200°C) Tag: Visual edit | ||||
|
|
23:53 (cur | prev) +969 Noahdutra talk contribs (→InP Ridge Etch: Cl2/CH4/H2/60°C: adding 200C InP for OXFD) Tag: Visual edit | ||||
|
|
23:51 | ICP Etching Recipes 5 changes history +1,577 [Noahdutra (5×)] | |||
|
|
23:51 (cur | prev) 0 Noahdutra talk contribs (→Process Control Data (Oxford ICP Etcher)) Tag: Visual edit | ||||
|
|
23:48 (cur | prev) +124 Noahdutra talk contribs (→Process Control Data (Oxford ICP Etcher)) | ||||
|
|
23:45 (cur | prev) +18 Noahdutra talk contribs (→Process Control Data (Oxford ICP Etcher)) Tag: Visual edit | ||||
|
|
23:44 (cur | prev) −131 Noahdutra talk contribs (→Process Control Data (Oxford ICP Etcher): added more 200C info) Tag: Visual edit | ||||
|
|
23:41 (cur | prev) +1,566 Noahdutra talk contribs (→Low-Temp (60°C) Process: Adding 200C InP) Tag: Visual edit | ||||
|
|
23:41 | (Upload log) [Noahdutra; John d] | |||
|
|
23:41 Noahdutra talk contribs uploaded File:200C InP.png | ||||
|
|
00:16 John d talk contribs uploaded File:ASML Dose vs Hole Diam - AT230829.png | ||||
| 21:12 | Template:Announcements diffhist +307 Mehalana v talk contribs (→E-Beam #2 is down - Update) | ||||
| 18:52 | E-Beam 4 (CHA) diffhist +71 John d talk contribs (→Detailed Specifications: updated # of samples) Tag: Visual edit | ||||
|
|
17:58 | Dry Etching Recipes 2 changes history 0 [Noahdutra (2×)] | |||
|
|
17:58 (cur | prev) 0 Noahdutra talk contribs (updating FICP to have W and TiW to R3) Tag: Visual edit | ||||
|
|
16:38 (cur | prev) 0 Noahdutra talk contribs (GaAs etch on OXFD Cobra to R3) Tag: Visual edit | ||||
|
|
17:56 | Vacuum Deposition Recipes 4 changes history 0 [Noahdutra (4×)] | |||
|
|
17:56 (cur | prev) 0 Noahdutra talk contribs (Demoted IBD AlO and TiO to R3 which is correct ranking due to not >= 4 data per year) Tag: Visual edit | ||||
|
|
17:09 (cur | prev) 0 Noahdutra talk contribs (Bringing Sputter 5 Ti, Al, Cr to R5 (once the details are put on the wiki, we will update these all to R6)) Tag: Visual edit | ||||
|
|
16:54 (cur | prev) 0 Noahdutra talk contribs (Updating Ti, Au, Cr, Ni to R6 for Ebeam1) Tag: Visual edit | ||||
|
|
16:32 (cur | prev) 0 Noahdutra talk contribs (updating Ebeam1 rankings) Tag: Visual edit | ||||
| 00:21 | Stepper Recipes diffhist +1,441 John d talk contribs (→Photomasks & Job Programming: "general" seciton, added Dose vs Hole Diam for litho) Tag: Visual edit | ||||
Retrieved from "https://wiki.nanofab.ucsb.edu/wiki/Special:RecentChanges"