Tony Bosch: Difference between revisions

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*[[ICP-PECVD (Unaxis VLR)]]
*[[ICP-PECVD (Unaxis VLR)]]
*[[ICP-Etch (Unaxis VLR)]]
*[[ICP-Etch (Unaxis VLR)]]
*[[Oxford ICP Cobra Etch]]
*[[Oxford ICP Etcher (PlasmaPro 100 Cobra)]]
*[[Gold Plating Bench]]
*[[Gold Plating Bench]]
*[[ICP Etch 2 (Panasonic E640)]]
*[[ICP Etch 2 (Panasonic E640)]]
||
||
*[[Rodwell Tube Furnace]]
*[[Tube Furnace (Tystar 8300)]]
*[[Tube Furnace (Tystar 8300)]]
*[[Tube Furnace AlGaAs Oxidation (Linberg)]]
*[[Tube Furnace AlGaAs Oxidation (Linberg)]]
Line 33: Line 32:
*[[Deep UV Optical Microscope (Olympus)]]
*[[Deep UV Optical Microscope (Olympus)]]
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]]
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]]
*[[Automated Coat/Develop System (S-Cubed Flexi)]]
*[[Coater Track (SCube)]]
*[[DSEIII (PlasmaTherm/Deep Silicon Etcher)]]
*[[DSEIII (PlasmaTherm/Deep Silicon Etcher)]]
*[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)]]
*[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)]]
*[[Lift-Off Station]]
* [[]]
|}
|}

Latest revision as of 16:53, 28 October 2021