Atomic Layer Deposition Recipes: Difference between revisions
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*{{fl|ALD-Al2O3-Plasma-300C-Recipe.pdf|Al{{sub|2}}O{{sub|3}} plasma 300C}} |
*{{fl|ALD-Al2O3-Plasma-300C-Recipe.pdf|Al{{sub|2}}O{{sub|3}} plasma 300C}} |
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*{{fl|ALD-Al2O3-100-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 100}} |
*{{fl|ALD-Al2O3-100-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 100}} |
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==AlN deposition== |
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*{{fl|ALD-AlN-300-recipe.pdf|AlN 300}} |
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==HfO{{sub|2}} deposition== |
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*{{fl|ALD-HfO2-100-recipe.pdf|HfO{{sub|2}} 100}} |
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*{{fl|ALD-HfO2-300-recipe.pdf|HfO{{sub|2}} 300}} |
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Revision as of 18:31, 6 September 2012
Back to Vacuum Deposition Recipes.