Tony Bosch: Difference between revisions
Jump to navigation
Jump to search
No edit summary |
No edit summary |
||
| (8 intermediate revisions by the same user not shown) | |||
| Line 18: | Line 18: | ||
|- valign="top" |
|- valign="top" |
||
| |
| |
||
*[[Oven 4 (Fisher)]] |
|||
*[[Vacuum Oven (YES)]] |
|||
*[[Sputter 3 (AJA ATC 2000-F)]] |
*[[Sputter 3 (AJA ATC 2000-F)]] |
||
*[[Sputter 4 (AJA ATC 2200-V)]] |
*[[Sputter 4 (AJA ATC 2200-V)]] |
||
| Line 25: | Line 23: | ||
*[[ICP-PECVD (Unaxis VLR)]] |
*[[ICP-PECVD (Unaxis VLR)]] |
||
*[[ICP-Etch (Unaxis VLR)]] |
*[[ICP-Etch (Unaxis VLR)]] |
||
*[[Oxford ICP Etcher (PlasmaPro 100 Cobra)]] |
|||
*[[Gold Plating Bench]] |
*[[Gold Plating Bench]] |
||
*[[ICP Etch 2 (Panasonic E640)]] |
*[[ICP Etch 2 (Panasonic E640)]] |
||
| Line 31: | Line 30: | ||
*[[Tube Furnace AlGaAs Oxidation (Linberg)]] |
*[[Tube Furnace AlGaAs Oxidation (Linberg)]] |
||
*[[Flip-Chip Bonder (Finetech)]] |
*[[Flip-Chip Bonder (Finetech)]] |
||
*[[Microscopes]] |
|||
*[[Probe Station & Curve Tracer]] |
|||
*[[Optical Film Thickness (Filmetrics)]] |
|||
*[[Resistivity Mapper (CDE RESMAP)]] |
|||
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]] |
|||
*[[Deep UV Optical Microscope (Olympus)]] |
*[[Deep UV Optical Microscope (Olympus)]] |
||
* |
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]] |
||
*[[Automated Coat/Develop System (S-Cubed Flexi)]] |
|||
*[[DSEIII (PlasmaTherm/Deep Silicon Etcher)]] |
|||
*[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)]] |
|||
|} |
|} |
||
Latest revision as of 16:53, 28 October 2021
|
About
.
.
.
Tools
Tony Bosch is the supervisor for the following tools.