Tutorials

The following are various tutorials from our NanoFab Wiki, collected here for your convenience.

General Fabrication

• Processing - How Do I…? ← This page attempts to list common solutions to fabrication issues our lab users often run into.
• Design of Experiments: Taguchi/L9 DOE methods - Gopi explains how to identify trends in your process, using multi-variable experiments (to minimize the number of experiments). Do this when you don't have a good physical understanding of how the process variables interact.

Fabrication Tracking and Process Design

Designing experiments, tracking your fabrication steps/process improvements, and keeping track of your results are key to achieving repeatable and improved results!

Processing: Experiment Setup

See the above ↑ tutorial pages for examples of:

• Process Travelers/RunCards/Followers - Write your process and track what you actually did during the fab
• Design of Experiments - Develop/optimize a fab step
• Manufacturing Execution Systems - Track all your designs, fab runs and experiment results, so you can iterate.

Examples of Trello + Google Drive for tracking fabrication jobs

Tracking to-do and completed tasks. Example Job Folder on Google Drive with in-process traveler, microscope/SEM images, testing results etc.

Example job card for a fabrication run.

CAD/Drawing Mask Plates

Here are pages to help you design your devices in drawing programs, and make photomasks (aka. "masks" or "reticles") for various systems in our lab.

KLayout: example CAD file.

Microfabrication CAD drawings are simple 2D drawings with layers, even though they are intended to become 3D devices through the fabrication process. The fabrication is all top-down, hence only 2D patterning is used.

• Calculators + Utilities > CAD Layout and Mask Design - links to drawing programs and tutorials
• Calculators + Utilities > CAD Design Tips - key concepts you should utilize in your drawings, and tips for setting up your CAD programs
• Calculators + Utilities > Example CAD File - example stepper mask CAD files, including advanced layout for multiple experiments.
• Calculators + Utilities > CAD Files & Templates - example GDS/OAS files for various useful structures (alignment marks, verniers, fonts etc)

Mask Making Guidelines

Info for mask/CAD layout for specific tools.

General

• Photomask Ordering Procedure for UCSB Users - see this page for how to submit your order into the purchasing system.
• See CAD tutorials above for layout tips and examples.
• Tutorial - How Photomasks are Made - this will help you submit your mask orders and clear up common misconceptions.

Stepper Mask Tutorials

Click for Stepper Reticle Tutorial Stepper Reticle Patterns (“images”) can optionally be much more sophisticated and flexible than contact plates.

• Stepper Reticle Layout vs Wafer Layout (Demis D. John) - explains how Stepper mask layout is very different than other litho systems.
• Stepper Reticle Layout (Advanced) - Complex Experiments and Variations - If you need many design variations on your wafer.

Steppers

• Stepper Mask-Making Guidelines - Info needed to design and order a reticle for our Stepper systems.
• ASML-specific Mask Making Guidelines (Private) - More detailed info to design and order a reticle for this specific ASML system.
  • Access is restricted to trained users only by ASML's requirement - please contact tool supervisor for access.

• Autostep 200 Mask Making Guidance - information on designing and ordering your photomasks for the GCA AutoStep 200.
• GCA 6300 Mask Making Guidance (Work in progress) - GCA 6300 Stepper

Contact Aligners

• Mask Making Guidelines - Contact Masks - for the MJB-3 & MA6 Contact Aligners

Direct-Write

• MLA150 - Design Guidelines - for the Heidelberg MLA150 Direct-Writer

Lithography Tutorials

• Lithography Calibration - Analyzing a Focus-Exposure Matrix (FEM) - Projection litho systems (steppers, direct-writers) usually require a lithography calibration, using a Focus-Exposure Matrix/Array (FEM/FEA).
• Lift-Off Description/Tutorial - How it works, process limits and considerations for designing your process.