User contributions for Zwarburg
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11 July 2012
- 14:0814:08, 11 July 2012 diff hist +10 Field Emission SEM 2 (JEOL IT800SHL) No edit summary
- 14:0714:07, 11 July 2012 diff hist +11 Gold Plating Bench (Semcon) No edit summary
- 14:0614:06, 11 July 2012 diff hist +11 Chemical-Mechanical Polisher (Logitech) No edit summary
- 14:0514:05, 11 July 2012 diff hist +11 Tube Furnace Wafer Bonding (Thermco) No edit summary
- 14:0514:05, 11 July 2012 diff hist +11 Rapid Thermal Processor (AET RX6) No edit summary
- 14:0414:04, 11 July 2012 diff hist +11 Wire Saw (Takatori) No edit summary
- 14:0414:04, 11 July 2012 diff hist +11 Dicing Saw (ADT) No edit summary
- 14:0314:03, 11 July 2012 diff hist +11 Flip-Chip Bonder (Finetech) No edit summary
- 14:0314:03, 11 July 2012 diff hist +11 Wafer Bonder (SUSS SB6-8E) No edit summary
- 14:0214:02, 11 July 2012 diff hist −2 Wafer Bonder (SUSS SB6-8E) No edit summary
- 14:0114:01, 11 July 2012 diff hist +33 Tool List →Packaging
- 14:0114:01, 11 July 2012 diff hist −33 Tool List →Lithography
- 14:0014:00, 11 July 2012 diff hist +4 Tool List →Lithography
- 14:0014:00, 11 July 2012 diff hist +8 Adam Abrahamsen →Tools
- 13:5913:59, 11 July 2012 diff hist +4 Lab Rules OLD 2018 →Tools unavailable for intern use during Summer 2012:
- 13:5913:59, 11 July 2012 diff hist +4 ASML DUV Redirected page to Stepper 3 (ASML DUV) current
- 13:5913:59, 11 July 2012 diff hist +34 N Stepper 3 (ASML) moved Stepper 3 (ASML) to Stepper 3 (ASML DUV) current
- 13:5913:59, 11 July 2012 diff hist 0 m Stepper 3 (ASML DUV) moved Stepper 3 (ASML) to Stepper 3 (ASML DUV)
- 13:5813:58, 11 July 2012 diff hist +11 Stepper 3 (ASML DUV) No edit summary
- 13:5813:58, 11 July 2012 diff hist +11 Stepper 2 (AutoStep 200) No edit summary
- 13:5813:58, 11 July 2012 diff hist +11 Stepper 1 (GCA 6300) No edit summary
- 13:5813:58, 11 July 2012 diff hist −5 Tool List →Lithography
- 13:5713:57, 11 July 2012 diff hist −5 Tony Bosch No edit summary
- 13:5713:57, 11 July 2012 diff hist 0 m Nano-Imprint (Nanonex NX2000) moved Nano-Imprint Tool (Nanonex NX2000) to Nano-Imprint (Nanonex NX2000)
- 13:5713:57, 11 July 2012 diff hist +11 Nano-Imprint (Nanonex NX2000) No edit summary
- 13:5613:56, 11 July 2012 diff hist +9 Lab Rules OLD 2018 →Tools unavailable for intern use during Summer 2012:
- 13:5613:56, 11 July 2012 diff hist +9 Ning Cao →Tools
- 13:5613:56, 11 July 2012 diff hist +9 Tool List →Lithography
- 13:5613:56, 11 July 2012 diff hist +11 Holographic Lith/PL Setup (Custom) No edit summary
- 13:5513:55, 11 July 2012 diff hist +48 N Holographic Lith/PL Setup moved Holographic Lith/PL Setup to Holographic Lith/PL Setup (Custom) current
- 13:5513:55, 11 July 2012 diff hist 0 m Holographic Lith/PL Setup (Custom) moved Holographic Lith/PL Setup to Holographic Lith/PL Setup (Custom)
- 13:5513:55, 11 July 2012 diff hist +11 E-Beam Lithography System (JEOL JBX-6300FS) No edit summary
- 13:5213:52, 11 July 2012 diff hist +23 N Category:NOID Created page with "Tools with No ID added."
- 13:5113:51, 11 July 2012 diff hist +18 Template:Tool No edit summary
- 13:5113:51, 11 July 2012 diff hist +11 IR Aligner (SUSS MJB-3 IR) No edit summary
- 13:4913:49, 11 July 2012 diff hist +11 Contact Aligner (SUSS MA-6) No edit summary
- 13:4813:48, 11 July 2012 diff hist +11 XeF2 Etch (Xetch) No edit summary
- 13:4813:48, 11 July 2012 diff hist +11 ICP Etch 2 (Panasonic E626I) No edit summary
- 13:4713:47, 11 July 2012 diff hist +11 ICP Etch 1 (Panasonic E646V) No edit summary
- 13:4713:47, 11 July 2012 diff hist +12 Lab Rules OLD 2018 →Tools unavailable for intern use during Summer 2012:
- 13:4713:47, 11 July 2012 diff hist +12 Don Freeborn →Tools
- 13:4613:46, 11 July 2012 diff hist +12 Tool List →Dry Etch
- 13:4613:46, 11 July 2012 diff hist +50 N Si Deep RIE (Bosch Etch) moved Si Deep RIE (Bosch Etch) to Si Deep RIE (PlasmaTherm/Bosch Etch) current
- 13:4613:46, 11 July 2012 diff hist 0 m Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP) moved Si Deep RIE (Bosch Etch) to Si Deep RIE (PlasmaTherm/Bosch Etch)
- 13:4613:46, 11 July 2012 diff hist +11 Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP) No edit summary
- 13:4413:44, 11 July 2012 diff hist −4 Lab Rules OLD 2018 →Tools unavailable for intern use during Summer 2012:
- 13:4413:44, 11 July 2012 diff hist −4 Don Freeborn No edit summary
- 13:4413:44, 11 July 2012 diff hist −4 Tool List →Dry Etch
- 13:4313:43, 11 July 2012 diff hist +11 RIE 5 (PlasmaTherm) No edit summary
- 13:4313:43, 11 July 2012 diff hist +33 N RIE 5 (PlasmaTherm SLR) moved RIE 5 (PlasmaTherm SLR) to RIE 5 (PlasmaTherm) current