User contributions for John d

Results for John d talk block log uploads logs

A user with 4,621 edits. Account created on 5 September 2012.

Jump to navigation Jump to search

00:4400:44, 25 June 2025 diff hist +48 MLA150 - Design Guidelines →Compatibility with Heidelberg's convert software Tag: Visual edit

20:5220:52, 24 June 2025 diff hist +201 Plasma Clean (YES EcoClean) →Detailed Info: added wafer sizes and best guesses at other params. current Tag: Visual edit
20:4720:47, 24 June 2025 diff hist +15 ICP Etch 1 (Panasonic E646V) No edit summary

18:0018:00, 19 June 2025 diff hist +1,539 MLA150 - Design Guidelines →General CAD Guidelines: added a "compatiblity" section Tag: Visual edit
17:4717:47, 19 June 2025 diff hist −1 m Maskless Aligner (Heidelberg MLA150) →Video Trainings Tag: Visual edit
17:4617:46, 19 June 2025 diff hist −121 Maskless Aligner (Heidelberg MLA150) updated design info section Tag: Visual edit
04:0604:06, 19 June 2025 diff hist 0 m E-Beam Lithography System (JEOL JBX-6300FS) No edit summary current Tag: Visual edit
04:0604:06, 19 June 2025 diff hist +133 E-Beam Lithography System (JEOL JBX-6300FS) tool decomissioned notice Tag: Visual edit
04:0404:04, 19 June 2025 diff hist +15 E-Beam Lithography System (JEOL JBX-6300FS) No edit summary Tag: Visual edit: Switched
03:0203:02, 19 June 2025 diff hist +585 E-Beam 3 (Temescal) added gun angling current Tag: Visual edit

16:4616:46, 18 June 2025 diff hist +53 KLayout Design Tips No edit summary current Tag: Visual edit
16:4616:46, 18 June 2025 diff hist +1,811 KLayout Design Tips added sub headings nand layer styles Tag: Visual edit
16:4116:41, 18 June 2025 diff hist +47 N File:KLayout - auto-load layer properties screenshot.png No edit summary current
16:3616:36, 18 June 2025 diff hist +6 m Calculators + Utilities →CAD Layout and Mask Design Tag: Visual edit

18:3618:36, 16 June 2025 diff hist +228 Template:Announcements water outage chemical processing

22:5322:53, 13 June 2025 diff hist +580 Template:Announcements Raith EBL update

19:2119:21, 10 June 2025 diff hist +630 Stepper Mask-Making Guidelines (Generic) →CAD Tips: linked to multi-image stepper reticle tutorials Tag: Visual edit
19:0619:06, 10 June 2025 diff hist +89 m Stepper Reticle Layout (Advanced) - Complex Experiments and Variations →Exposures during processing current Tag: Visual edit
19:0519:05, 10 June 2025 diff hist +1 m Stepper Reticle Layout (Advanced) - Complex Experiments and Variations →Stepper Job Programming Tag: Visual edit

06:1206:12, 7 June 2025 diff hist +38 m Maskless Aligner (Heidelberg MLA150) →Documentation Tag: Visual edit

17:5417:54, 5 June 2025 diff hist +153 Tutorials link to "Processing- How do I?" Tag: Visual edit
17:5117:51, 5 June 2025 diff hist +162 Frequently Asked Questions →Processing/Fabrication Questions: link to "processing…How do ?" Tag: Visual edit
17:4717:47, 5 June 2025 diff hist +61 Processing - How Do I…? added experiment setup current Tag: Visual edit
17:4317:43, 5 June 2025 diff hist −801 Template:Announcements deleted toolbelts annc, moved to "supplies" FAQ page
17:4217:42, 5 June 2025 diff hist −116 Template:Announcements raith update, deleted SEM1 and one other
16:1816:18, 5 June 2025 diff hist +1,003 Tutorials added Experimetn Setup links and figures Tag: Visual edit: Switched
15:5115:51, 5 June 2025 diff hist +172 ASML Stepper 3 - UCSB Test Reticles →Other Masks and Images: reminder about NetID current Tag: Visual edit

22:5722:57, 30 May 2025 diff hist +584 Stepper Mask-Making Guidelines (Generic) →Plots for Approval or Online Mask Viewer: adde polarity & mirroring Tag: Visual edit
22:5122:51, 30 May 2025 diff hist +1,342 Stepper Mask-Making Guidelines (Generic) →Required Parameters to Order: added Plots of Approval Tag: Visual edit

22:2422:24, 28 May 2025 diff hist −285 Template:Announcements deleted Velion up
21:4921:49, 28 May 2025 diff hist +398 Template:Announcements sem1 update

17:5517:55, 22 May 2025 diff hist −376 Template:Announcements deleted wet bench down

18:3518:35, 21 May 2025 diff hist +168 E-Beam 1 (Sharon) →Recipes: link to process control data current Tag: Visual edit
18:3418:34, 21 May 2025 diff hist +234 Process Group - Process Control Data →E-Beam 4 (CHA): renamed section to include "Process Control" in header title Tag: Visual edit
18:2918:29, 21 May 2025 diff hist +371 Process Group - Process Control Data →Deposition, Metal (Process Control Data): added all eBeam 1 data + plots Tag: Visual edit
17:5617:56, 21 May 2025 diff hist +753 Process Group - Process Control Data linked to EB-eam #1 sheets - plots not ready yet Tag: Visual edit
01:5401:54, 21 May 2025 diff hist +377 Template:Announcements Bench 3 down

22:3822:38, 13 May 2025 diff hist +75 Template:Announcements velion up
22:3722:37, 13 May 2025 diff hist +1,199 Lithography Calibration - Analyzing a Focus-Exposure Matrix added "optically similar" substrate Tag: Visual edit
21:1021:10, 13 May 2025 diff hist +29 Main Page added Tutorials <-- NEW Tag: Visual edit
20:5520:55, 13 May 2025 diff hist +1,314 MLA150 - Troubleshooting added "autofocus not working" solution current Tag: Visual edit
20:5420:54, 13 May 2025 diff hist +3 m Photolithography - Manual Edge-Bead Removal Techniques →EBR100 Swabbing Tag: Visual edit

23:3423:34, 8 May 2025 diff hist +48 m Tutorials →Mask Making Guidelines Tag: Visual edit
23:3323:33, 8 May 2025 diff hist +102 Tutorials added TOC, moved CAD to it's own header Tag: Visual edit: Switched
23:3023:30, 8 May 2025 diff hist −24 MediaWiki:Sidebar changed link to Tutorials
23:2923:29, 8 May 2025 diff hist +23 N CAD and Photomask Layout John d moved page CAD and Photomask Layout to Tutorials: purpose of the page changed current Tag: New redirect
23:2923:29, 8 May 2025 diff hist 0 m Tutorials John d moved page CAD and Photomask Layout to Tutorials: purpose of the page changed
22:2422:24, 8 May 2025 diff hist +133 m Optical Film Thickness & Wafer-Mapping (Filmetrics F50) No edit summary current Tag: Visual edit
22:1622:16, 8 May 2025 diff hist +98 Ion Beam Deposition (Veeco NEXUS) →Documentation: moved DBR calibration into "documentation" section current Tag: Visual edit

18:0118:01, 7 May 2025 diff hist +915 PECVD Recipes →SiO2 deposition (PECVD #2): mentioned RIX, stress etc. Tag: Visual edit

Retrieved from "https://wiki.nanofab.ucsb.edu/wiki/Special:Contributions/John_d"