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Showing below up to 50 results in range #1 to #50.
- (hist) Publications - 2013-2014 [102,378 bytes]
- (hist) Lab Rules [80,469 bytes]
- (hist) PubList2018 [78,929 bytes]
- (hist) Old Deposition Data - NastaziaM 2021-11-22 [36,993 bytes]
- (hist) GCA 6300 training manual -old instructions [35,770 bytes]
- (hist) Lab Rules backup [35,139 bytes]
- (hist) Wafer scanning process traveler [34,065 bytes]
- (hist) Lithography Recipes [32,855 bytes]
- (hist) Old Deposition Data - 2021-12-15 [31,421 bytes]
- (hist) ICP Etching Recipes [30,068 bytes]
- (hist) Vacuum Deposition Recipes [29,552 bytes]
- (hist) Frequently Asked Questions [26,932 bytes]
- (hist) Chemical List - OLD 2018-09-05 [19,940 bytes]
- (hist) Stepper Recipes [19,562 bytes]
- (hist) MLA150 - Troubleshooting [19,291 bytes]
- (hist) Editing Tutorials [18,259 bytes]
- (hist) PECVD Recipes [17,669 bytes]
- (hist) Deposition Data - temporary 2021-12-15 [17,583 bytes]
- (hist) Calculators + Utilities [17,534 bytes]
- (hist) Sputtering Recipes [16,874 bytes]
- (hist) Stepper 1 (GCA 6300) - Standard Operating Procedure [14,869 bytes]
- (hist) UCSB NanoFab Microscope Training [14,134 bytes]
- (hist) Wet Benches [13,740 bytes]
- (hist) Process Group - Process Control Data [13,442 bytes]
- (hist) Dry Etching Recipes [12,835 bytes]
- (hist) Programming a Job [12,807 bytes]
- (hist) Glossary [12,789 bytes]
- (hist) MLA150 - Design Guidelines [12,637 bytes]
- (hist) Services [11,711 bytes]
- (hist) ADT 7100 - Initial Setup Before Cutting [11,605 bytes]
- (hist) Wet Etching Recipes [11,114 bytes]
- (hist) GCA 6300 Mask Making Guidance [10,484 bytes]
- (hist) Stepper 3 (ASML DUV) [10,331 bytes]
- (hist) ASML Stepper 3 - UCSB Test Reticles [10,271 bytes]
- (hist) Filmetrics F50 - Operating Procedure [9,961 bytes]
- (hist) Packaging Recipes [9,951 bytes]
- (hist) Contact Alignment Recipes [9,886 bytes]
- (hist) Microscopes [9,822 bytes]
- (hist) Stocked Chemical List [9,733 bytes]
- (hist) GoPro Hero8 Black (Internal) [9,508 bytes]
- (hist) Laser Etch Monitoring [9,336 bytes]
- (hist) ASML Stepper 3 Standard Operating Procedure [9,076 bytes]
- (hist) Oxford ICP Etcher - Process Control Data [8,520 bytes]
- (hist) Stepper 2 (AutoStep 200) [8,337 bytes]
- (hist) E-Beam Evaporation Recipes [8,005 bytes]
- (hist) Stepper Mask-Making Guidelines (Generic) [7,857 bytes]
- (hist) Atomic Layer Deposition Recipes [7,839 bytes]
- (hist) Direct-Write Lithography Recipes [7,814 bytes]
- (hist) Mask Making Guidelines for Contact Aligners [7,596 bytes]
- (hist) KLayout Design Tips [7,545 bytes]