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Showing below up to 50 results in range #1 to #50.
- (hist) Publications - 2013-2014 [102,378 bytes]
- (hist) Lab Rules [80,469 bytes]
- (hist) PubList2018 [78,929 bytes]
- (hist) ICP Etching Recipes [40,371 bytes]
- (hist) Old Deposition Data - NastaziaM 2021-11-22 [36,993 bytes]
- (hist) GCA 6300 training manual -old instructions [35,770 bytes]
- (hist) Lab Rules backup [35,139 bytes]
- (hist) Wafer scanning process traveler [34,065 bytes]
- (hist) Lithography Recipes [33,802 bytes]
- (hist) Old Deposition Data - 2021-12-15 [31,421 bytes]
- (hist) Frequently Asked Questions [30,208 bytes]
- (hist) Vacuum Deposition Recipes [29,159 bytes]
- (hist) Stepper Recipes [21,398 bytes]
- (hist) MLA150 - Troubleshooting [20,605 bytes]
- (hist) Chemical List - OLD 2018-09-05 [19,940 bytes]
- (hist) Process Group - Process Control Data [19,585 bytes]
- (hist) PECVD Recipes [19,483 bytes]
- (hist) Calculators + Utilities [18,958 bytes]
- (hist) Editing Tutorials [18,259 bytes]
- (hist) Deposition Data - temporary 2021-12-15 [17,583 bytes]
- (hist) Sputtering Recipes [17,401 bytes]
- (hist) Stepper 3 (ASML DUV) [15,619 bytes]
- (hist) UCSB NanoFab Microscope Training [15,127 bytes]
- (hist) MLA150 - Design Guidelines [14,938 bytes]
- (hist) Stepper 1 (GCA 6300) - Standard Operating Procedure [14,869 bytes]
- (hist) Stepper Mask-Making Guidelines (Generic) [14,330 bytes]
- (hist) Wet Benches [13,740 bytes]
- (hist) Dry Etching Recipes [12,975 bytes]
- (hist) Programming a Job [12,807 bytes]
- (hist) Glossary [12,789 bytes]
- (hist) Packaging Recipes [12,073 bytes]
- (hist) Services [11,961 bytes]
- (hist) ADT 7100 - Initial Setup Before Cutting [11,605 bytes]
- (hist) Wet Etching Recipes [11,380 bytes]
- (hist) Direct-Write Lithography Recipes [11,313 bytes]
- (hist) ASML Stepper 3 - UCSB Test Reticles [11,181 bytes]
- (hist) Atomic Layer Deposition Recipes [11,036 bytes]
- (hist) GCA 6300 Mask Making Guidance [10,484 bytes]
- (hist) Contact Alignment Recipes [10,167 bytes]
- (hist) Microscopes [10,149 bytes]
- (hist) Filmetrics F50 - Operating Procedure [9,961 bytes]
- (hist) Mask Making Guidelines for Contact Aligners [9,770 bytes]
- (hist) Stocked Chemical List [9,608 bytes]
- (hist) KLayout Design Tips [9,594 bytes]
- (hist) GoPro Hero8 Black (Internal) [9,508 bytes]
- (hist) ASML Stepper 3 Standard Operating Procedure [9,394 bytes]
- (hist) Laser Etch Monitoring [9,336 bytes]
- (hist) Tutorial - How Photomasks are Made [9,257 bytes]
- (hist) Lithography Calibration - Analyzing a Focus-Exposure Matrix [9,144 bytes]
- (hist) Stepper 2 (AutoStep 200) [8,592 bytes]