Atomic Layer Deposition Recipes: Difference between revisions
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{{recipes|Vacuum Deposition}} |
{{recipes|Vacuum Deposition}} |
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=[[Atomic Layer Deposition (Oxford FlexAL)]]= |
=[[Atomic Layer Deposition (Oxford FlexAL)]]= |
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==Al{{sub|2}}O{{sub|3}} deposition== |
==Al{{sub|2}}O{{sub|3}} deposition (ALD)== |
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*{{fl|ALD-Al2O3-300-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 300}} |
*{{fl|ALD-Al2O3-300-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 300}} |
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*{{fl|ALD-Al2O3-100-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 100}} |
*{{fl|ALD-Al2O3-100-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 100}} |
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==AlN deposition== |
==AlN deposition (ALD)== |
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*{{fl|ALD-AlN-300-recipe.pdf|AlN 300}} |
*{{fl|ALD-AlN-300-recipe.pdf|AlN 300}} |
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==HfO{{sub|2}} deposition== |
==HfO{{sub|2}} deposition (ALD)== |
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*{{fl|ALD-HfO2-100-recipe.pdf|HfO{{sub|2}} 100}} |
*{{fl|ALD-HfO2-100-recipe.pdf|HfO{{sub|2}} 100}} |
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*{{fl|ALD-HfO2-300-recipe.pdf|HfO{{sub|2}} 300}} |
*{{fl|ALD-HfO2-300-recipe.pdf|HfO{{sub|2}} 300}} |
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==SiO{{sub|2}} deposition== |
==SiO{{sub|2}} deposition (ALD)== |
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*{{fl|ALD-SiO2-100-recipe.pdf|SiO{{sub|2}} 100}} |
*{{fl|ALD-SiO2-100-recipe.pdf|SiO{{sub|2}} 100}} |
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*{{fl|ALD-SiO2-300-recipe.pdf|SiO{{sub|2}} 300}} |
*{{fl|ALD-SiO2-300-recipe.pdf|SiO{{sub|2}} 300}} |
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==ZrO{{sub|2}} deposition== |
==ZrO{{sub|2}} deposition (ALD)== |
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*{{fl|ALD-ZrO2-300-recipe.pdf|ZrO{{sub|2}} 300}} |
*{{fl|ALD-ZrO2-300-recipe.pdf|ZrO{{sub|2}} 300}} |
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Revision as of 18:35, 6 September 2012
Back to Vacuum Deposition Recipes.