Atomic Layer Deposition Recipes: Difference between revisions
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==ZrO{{sub|2}} deposition (ALD)== |
==ZrO{{sub|2}} deposition (ALD)== |
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*{{fl|ALD-ZrO2-300-recipe.pdf|ZrO{{sub|2}} 300}} |
*{{fl|ALD-ZrO2-300-recipe.pdf|ZrO{{sub|2}} 300}} |
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==TiO{{sub|2}} deposition (ALD)== |
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TiO{{sub|2}} recipe '''WJM_TDMAT_H2O_r2''' water dose 1s, at 200C, gives grow rate 0.11 nm/cy (pdf file to be added) |
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Revision as of 00:32, 5 July 2013
Back to Vacuum Deposition Recipes.
Atomic Layer Deposition (Oxford FlexAL)
Al2O3 deposition (ALD)
AlN deposition (ALD)
HfO2 deposition (ALD)
SiO2 deposition (ALD)
ZrO2 deposition (ALD)
TiO2 deposition (ALD)
TiO2 recipe WJM_TDMAT_H2O_r2 water dose 1s, at 200C, gives grow rate 0.11 nm/cy (pdf file to be added)