Atomic Layer Deposition Recipes: Difference between revisions
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==TiO{{sub|2}} deposition (ALD)== |
==TiO{{sub|2}} deposition (ALD)== |
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TiO{{sub|2}} recipe '''WJM_TDMAT_H2O_r2''' water dose 1s (pdf file to be added) |
*TiO{{sub|2}} 200 recipe '''WJM_TDMAT_H2O_r2''' water dose 1s (pdf file to be added)gives grow rate 0.11 nm/cy as measured by ellipsometer |
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Revision as of 00:27, 16 July 2013
Back to Vacuum Deposition Recipes.
Atomic Layer Deposition (Oxford FlexAL)
Al2O3 deposition (ALD)
AlN deposition (ALD)
HfO2 deposition (ALD)
SiO2 deposition (ALD)
ZrO2 deposition (ALD)
TiO2 deposition (ALD)
- TiO2 200 recipe WJM_TDMAT_H2O_r2 water dose 1s (pdf file to be added)gives grow rate 0.11 nm/cy as measured by ellipsometer