Atomic Layer Deposition Recipes

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Atomic Layer Deposition (Oxford FlexAL)

Al₂O₃ deposition (ALD)

• Al₂O₃ 300
• Al₂O₃ 300 Saturated
• Al₂O₃ plasma 300C
• Al₂O₃ 100

AlN deposition (ALD)

• AlN 300

HfO₂ deposition (ALD)

• HfO₂ 100
• HfO₂ 300

SiO₂ deposition (ALD)

• SiO₂ 100
• SiO₂ 300

ZrO₂ deposition (ALD)

• ZrO₂ 300

TiO₂ deposition (ALD)

• TiO₂ 200 recipe WJM_TDMAT_H2O_r2 water dose 1s (pdf file to be added)gives grow rate 0.9 A/cycle as measured by ellipsometer