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The following pages do not link to other pages in UCSB Nanofab Wiki.
Showing below up to 50 results in range #51 to #100.
- PECVD.docx
- PECVD1-(PlasmaTherm 790)
- PECVD1-SiN-standard recipe.pdf
- PECVD1-SiN standard recipe.pdf
- PECVD1 Operating Instructions.pdf
- PECVD1 Wafer Coating Process Traveler
- Peder Lenvik
- Photonics Presentations
- Probe Station: I-V Curves with Keithley 2400 and Python Script
- ProcessGroup: Shipping Samples on Dicing Tape+Frame
- Process Group - Billing Instructions
- Process Group - Lab Stocking/Supplies Tasks
- Process Group - Remote Fabrication Jobs
- Process Group Interns
- Programming a Job
- PubList2018
- Publications - 2013-2014
- RIE5 - Standard Operating procedure (Cortex Software)
- SPR220-7 at 3kW various temperature without N2 gas
- STD SiO2 recipe
- SiN 100C Table-2019
- SiO2 Etching Test using CF4/CHF3
- Sputter 5
- Stepper 1 (GCA6300) How to select proper chuck
- Stepper 1 (GCA 6300) Available chucks
- Stepper 1 (GCA 6300) Substrate Thickness, Shim Thickness ans Target Thickness
- Stepper 2 (AutoStep 200) - Operating Procedure - Piece Parts
- Stepper 2 (Autostep 200) - Chuck Selection
- Stepper 2 (Autostep 200) - Piece vs. Wafer Programming Differences
- Stepper 2 (Autostep 200) - Table of Chucks, Shims, Target Thicknesses
- Stocked Chemical List
- Surfscan6200 photos
- Surfscan Errors and Workarounds
- Surfscan SOP for 4inch wafers
- Surfscan SOP for 6inch wafers
- Surfscan SOP for 8inch wafers
- Surfscan SOP for small substrates
- Surfscan photo
- Suss MA-6 Backside Alignment QuickStart
- TEST PAGE
- THz Physics Presentations
- Tech Talks Seminar Series
- Test Data of Etching SiO2 with CHF3/CF4-Florine ICP Etcher
- Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher
- Test Data of etching SiO2 with CHF3/CF4-Florine
- Test Data of etching SiO2 with CHF3/CF4-Florine ICP Etcher
- Test Data of etching SiO2 with CHF3/CF4-ICP1
- Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer)
- Test Page
- Tino Sy