Atomic Layer Deposition Recipes

Back to Vacuum Deposition Recipes.

Atomic Layer Deposition (Oxford FlexAL)

Al₂O₃ deposition (ALD)

• Al₂O₃ 300
• Al₂O₃ 300 Saturated
• Al₂O₃ plasma 300C
• Al₂O₃ 100

AlN deposition (ALD)

• AlN 300

HfO₂ deposition (ALD)

• HfO₂ 100
• HfO₂ 300

SiO₂ deposition (ALD)

• SiO₂ 100
• SiO₂ 300

ZrO₂ deposition (ALD)

• ZrO₂ 300

TiO₂ deposition (ALD)

TiO₂ recipe WJM_TDMAT_H2O_r2 water dose 1s, at 200C, gives grow rate 0.11 nm/cy as measured by ellipsometer (pdf file to be added)