User contributions for John d
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8 February 2025
- 18:0618:06, 8 February 2025 diff hist +16 m Stepper 3 (ASML DUV) →Optical Proximity Correction (OPC): Going below resolution limit current Tag: Visual edit
- 18:0518:05, 8 February 2025 diff hist −8 m Stepper 3 (ASML DUV) →Optical Proximity Correction (OPC): Going below resolution limit Tag: Visual edit
- 18:0418:04, 8 February 2025 diff hist −3 m Stepper 3 (ASML DUV) →Optical Proximity Correction (OPC): Going below resolution limit Tag: Visual edit
- 17:2217:22, 8 February 2025 diff hist +216 Stepper 3 (ASML DUV) →Optical Proximity Correction (OPC): Going below resolution limit: centered images Tag: Visual edit: Switched
- 01:1401:14, 8 February 2025 diff hist +41 m Stepper 3 (ASML DUV) →Optical Proximity Correction (OPC): Going below resolution limit Tag: Visual edit
- 01:1201:12, 8 February 2025 diff hist +82 m Stepper 3 (ASML DUV) →Optical Proximity Correction (OPC): Going below resolution limit Tag: Visual edit
7 February 2025
- 23:5023:50, 7 February 2025 diff hist +56 m Stepper 3 (ASML DUV) →Optical Proximity Correction: Going below resolution limit: link to skyler's google scholar Tag: Visual edit
- 23:4523:45, 7 February 2025 diff hist +36 m Stepper 3 (ASML DUV) →Optical Proximity Correction: Going below resolution limit
- 23:4323:43, 7 February 2025 diff hist +784 Stepper 3 (ASML DUV) →UCSB Photomasks Available: added Skyler's OPC images. Tag: Visual edit
- 23:3623:36, 7 February 2025 diff hist +98 N File:ASML OPC - Skyler Palatnik 060224 PR vtxHvP 23mJ NO OPC 1.png No edit summary current
- 23:3423:34, 7 February 2025 diff hist +74 N File:ASML OPC - Skyler Palatnik 060224 PR vtxHvP 15mJOPC 3.png No edit summary current
- 21:1421:14, 7 February 2025 diff hist +48 m Template:Announcements No edit summary current
- 21:1321:13, 7 February 2025 diff hist +336 Template:Announcements Lab Closure: Mon Feb 10th, 8a-12n
- 00:5400:54, 7 February 2025 diff hist +34 m Process Group - Process Control Data →Deposition (Process Control Data) current Tag: Visual edit
- 00:5100:51, 7 February 2025 diff hist +475 Process Group - Process Control Data →Deposition (Process Control Data): added screenshots of SPC charts and data Tag: Visual edit: Switched
- 00:5000:50, 7 February 2025 diff hist +61 N File:PECVD1 SiO2 F50 WaferMap example.jpg No edit summary current
- 00:4600:46, 7 February 2025 diff hist +31 N File:PECVD SPC Chart Example.png No edit summary current
- 00:3000:30, 7 February 2025 diff hist +170 m Stepper 3 (ASML DUV) →Optical Proximity Correction: Going below resolution limit Tag: Visual edit
- 00:2700:27, 7 February 2025 diff hist +63 m Stepper 3 (ASML DUV) →Optical Proximity Correction: Going below resolution limit Tag: Visual edit
6 February 2025
- 23:4123:41, 6 February 2025 diff hist +556 Stepper 3 (ASML DUV) →Optical Proximity Correction: Going below resolution limit: added table of images Tag: Visual edit
- 23:3923:39, 6 February 2025 diff hist +21 N File:ASML SEM DBR With OPC .png No edit summary current
- 23:3823:38, 6 February 2025 diff hist +24 N File:ASML SEM DBR without OPC.png No edit summary current
- 23:3723:37, 6 February 2025 diff hist +31 N File:ASML OPC CAD.png No edit summary current
- 22:0922:09, 6 February 2025 diff hist +153 Services →Fabrication Services by NanoFab Staff: added academic rates policy for technical contact current Tag: Visual edit
5 February 2025
- 23:5423:54, 5 February 2025 diff hist +42 m Holographic Lith/PL Setup (Custom) No edit summary current Tag: Visual edit
- 23:5323:53, 5 February 2025 diff hist −20 m Holographic Lith/PL Setup (Custom) No edit summary
- 23:5223:52, 5 February 2025 diff hist +37 Photoluminescence PL Setup (Custom) add briant thiebaeult as 2nd supervisor current
- 23:5123:51, 5 February 2025 diff hist +112 Holographic Lith/PL Setup (Custom) add brian thibeault as 2nd supervisor
- 20:4120:41, 5 February 2025 diff hist +327 Template:Announcements dsx down
- 02:0102:01, 5 February 2025 diff hist +4 Template:Announcements ICP2 maint complete
4 February 2025
- 19:4919:49, 4 February 2025 diff hist −437 Template:Announcements deleted holography
- 19:4819:48, 4 February 2025 diff hist −1,683 Template:Announcements updated ALD, deleted KLA P7, deleted Jan "lab open", deleted YES
- 19:4419:44, 4 February 2025 diff hist +245 Template:Announcements asml Q-PM
- 18:3718:37, 4 February 2025 diff hist −125 Stocked Chemical List deleted MR-I 7020 nanoimprint resist - not stocking anymore current Tag: Visual edit
- 04:1504:15, 4 February 2025 diff hist +15 m ICP Etching Recipes →Photoresist & ARC (Fluorine ICP Etcher) current Tag: Visual edit
30 January 2025
- 23:4523:45, 30 January 2025 diff hist +113 Stepper 3 (ASML DUV) tutorial explanation Tag: Visual edit
- 23:4423:44, 30 January 2025 diff hist +113 Stepper 2 (AutoStep 200) tutorial explanation current Tag: Visual edit
- 23:4423:44, 30 January 2025 diff hist +433 Stepper 1 (GCA 6300) →CAD Files: added Mask Making section and Cell+Layer for the CAD tempalte current Tag: Visual edit
- 23:4023:40, 30 January 2025 diff hist +312 Autostep 200 Mask Making Guidance →CAD Files: added photomask Cell + Layer current Tag: Visual edit
25 January 2025
- 17:1817:18, 25 January 2025 diff hist −6 m Mask Making Guidelines for Contact Aligners →Generic Contact Mask Parameters Tag: Visual edit
- 17:1717:17, 25 January 2025 diff hist +92 Mask Making Guidelines for Contact Aligners →Generic Contact Mask Parameters: added exact mask sizes for each tool, and sub headings Tag: Visual edit
- 17:1517:15, 25 January 2025 diff hist +846 Mask Making Guidelines for Contact Aligners →Generic Contact Mask Parameters: added exact mask plate sizes. Tag: Visual edit
- 17:0617:06, 25 January 2025 diff hist +586 Mask Making Guidelines for Contact Aligners →Definitions for Mask/Reticle Order Form Tag: Visual edit
21 January 2025
- 21:3021:30, 21 January 2025 diff hist +60 Services →Statement of Work Tag: Visual edit
15 January 2025
- 22:3322:33, 15 January 2025 diff hist +327 Microscopes →General-Use Microscopes: added locations current Tag: Visual edit
13 January 2025
- 03:5403:54, 13 January 2025 diff hist −6 m Process Group - Process Control Data →PlasmaTherm DSEIII Deep Silicon Etcher: rmeoved bold Tag: Visual edit
12 January 2025
- 20:4420:44, 12 January 2025 diff hist +123 m MLA150 - Design Guidelines →Limitations & Workarounds current Tag: Visual edit
- 20:4220:42, 12 January 2025 diff hist +128 MLA150 - Design Guidelines →Greyscale DXF Tag: Visual edit
- 20:3820:38, 12 January 2025 diff hist +187 MLA150 - Design Guidelines →Limitations & Workarounds: mentioned software update for GS Alignment Tag: Visual edit
10 January 2025
- 05:4205:42, 10 January 2025 diff hist +484 Template:Announcements →New Gowns in Jan: added link for tool belts