Atomic Layer Deposition Recipes
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Back to Vacuum Deposition Recipes.
Atomic Layer Deposition (Oxford FlexAL)
Al2O3 deposition (ALD)
AlN deposition (ALD)
HfO2 deposition (ALD)
SiO2 deposition (ALD)
ZrO2 deposition (ALD)
TiO2 deposition (ALD)
- TiO2 200 recipe WJM_TDMAT_H2O_r2 water dose 1s (pdf file to be added)gives grow rate 0.11 nm/cy as measured by ellipsometer