Atomic Layer Deposition Recipes: Difference between revisions
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*{{fl|ALD-HfO2-100-recipe.pdf|HfO{{sub|2}} 100}} |
*{{fl|ALD-HfO2-100-recipe.pdf|HfO{{sub|2}} 100}} |
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*{{fl|ALD-HfO2-300-recipe.pdf|HfO{{sub|2}} 300}} |
*{{fl|ALD-HfO2-300-recipe.pdf|HfO{{sub|2}} 300}} |
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==Pt deposition (ALD)== |
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*Need Data |
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==SiO{{sub|2}} deposition (ALD)== |
==SiO{{sub|2}} deposition (ALD)== |
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*{{fl|ALD-SiO2-100-recipe.pdf|SiO{{sub|2}} 100}} |
*{{fl|ALD-SiO2-100-recipe.pdf|SiO{{sub|2}} 100}} |
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*{{fl|ALD-SiO2-300-recipe.pdf|SiO{{sub|2}} 300}} |
*{{fl|ALD-SiO2-300-recipe.pdf|SiO{{sub|2}} 300}} |
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==ZnO deposition (ALD)== |
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*Need Data Al:ZnO |
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==ZrO{{sub|2}} deposition (ALD)== |
==ZrO{{sub|2}} deposition (ALD)== |
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==TiO{{sub|2}} deposition (ALD)== |
==TiO{{sub|2}} deposition (ALD)== |
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*TiO{{sub|2}} 200 recipe '''WJM_TDMAT_H2O_r2''' water dose 1s (pdf file to be added)gives grow rate 0.9 A/cycle as measured by ellipsometer |
*TiO{{sub|2}} 200 recipe '''WJM_TDMAT_H2O_r2''' water dose 1s (pdf file to be added)gives grow rate 0.9 A/cycle as measured by ellipsometer |
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==TiN deposition (ALD)== |
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*Need Data |
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Revision as of 00:36, 16 December 2015
Back to Vacuum Deposition Recipes.
Atomic Layer Deposition (Oxford FlexAL)
Al2O3 deposition (ALD)
AlN deposition (ALD)
HfO2 deposition (ALD)
Pt deposition (ALD)
- Need Data
SiO2 deposition (ALD)
ZnO deposition (ALD)
- Need Data Al:ZnO
ZrO2 deposition (ALD)
TiO2 deposition (ALD)
- TiO2 200 recipe WJM_TDMAT_H2O_r2 water dose 1s (pdf file to be added)gives grow rate 0.9 A/cycle as measured by ellipsometer
TiN deposition (ALD)
- Need Data