Difference between revisions of "Lithography Recipes"
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(→Chemicals Stocked + Datasheets: added Az 4620) |
(→Photolithography Recipes: linked to all PR datasheets) |
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{{LithRecipe Table}} |
{{LithRecipe Table}} |
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− | | bgcolor="#D0E7FF" align="center" |AZ4110 |
+ | | bgcolor="#D0E7FF" align="center" |[[:File:AXP4000pb-Datasheet.pdf|AZ4110]] |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}} |
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− | | bgcolor="#D0E7FF" align="center" |AZ4210 |
+ | | bgcolor="#D0E7FF" align="center" |[[Media:AXP4000pb-Datasheet.pdf|AZ4210]] |
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+ | | bgcolor="#D0E7FF" align="center" |[[Media:AXP4000pb-Datasheet.pdf|AZ4330RS]] |
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− | | bgcolor="#D0E7FF" align="center" |AZ4620 |
+ | | bgcolor="#D0E7FF" align="center" |[[Media:Az p4620 photoresist data package.pdf|AZ4620]] |
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+ | | bgcolor="#D0E7FF" align="center" |[[Media:OCG825-Positive-Resist-Datasheet.pdf|OCG 825-35CS]] |
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− | | bgcolor="#D0E7FF" align="center" |SPR 955 CM-0.9 |
+ | | bgcolor="#D0E7FF" align="center" |[[Media:SPR955-Positive-Resist-Datasheet.pdf|SPR 955 CM-0.9]] |
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− | | bgcolor="#D0E7FF" align="center" |SPR 955 CM-1.8 |
+ | | bgcolor="#D0E7FF" align="center" |[[Media:SPR955-Positive-Resist-Datasheet.pdf|SPR 955 CM-1.8]] |
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+ | | bgcolor="#D0E7FF" align="center" |[[Media:SPR220-Positive-Resist-Datasheet.pdf|SPR 220-3.0]] |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}} |
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− | | bgcolor="#D0E7FF" align="center" |SPR 220-7.0 |
+ | | bgcolor="#D0E7FF" align="center" |[[Media:SPR220-Positive-Resist-Datasheet.pdf|SPR 220-7.0]] |
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− | | bgcolor="#D0E7FF" align="center" |THMR-IP3600 HP D |
+ | | bgcolor="#D0E7FF" align="center" |[[Media:3600 D, D2v Spin Speed Curve.pdf|THMR-IP3600 HP D]] |
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+ | | bgcolor="#D0E7FF" align="center" |[[Media:UV6-Positive-Resist-Datasheet.pdf|UV6-0.8]] |
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+ | | bgcolor="#D0E7FF" align="center" |[[Media:UV210-Positive-Resist-Datasheet.pdf|UV210-0.3]] |
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− | | bgcolor="#D0E7FF" align="center" |UV26-2.5 |
+ | | bgcolor="#D0E7FF" align="center" |[[Media:UV26-Positive-Resist-Datasheet.pdf|UV26-2.5]] |
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{{LithRecipe Table}} |
{{LithRecipe Table}} |
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− | | bgcolor="#D0E7FF" align="center" |AZ5214-EIR |
+ | | bgcolor="#D0E7FF" align="center" |[[Media:AZ5214-Negative-Resist-Datasheet.pdf|AZ5214-EIR]] |
|{{rl|Contact_Alignment_Recipes|Negative Resist (MJB-3)}} |
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− | | bgcolor="#D0E7FF" align="center" |AZnLOF 2020 |
+ | | bgcolor="#D0E7FF" align="center" |[[Media:AZnLOF2020-Negative-Resist-Datasheet.pdf|AZnLOF 2020]] |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}} |
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− | | bgcolor="#D0E7FF" align="center" |AZnLOF 2035 |
+ | | bgcolor="#D0E7FF" align="center" |[[Media:AZnLOF2020-Negative-Resist-Datasheet.pdf|AZnLOF 2035]] |
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− | | bgcolor="#D0E7FF" align="center" |AZnLOF 2070 |
+ | | bgcolor="#D0E7FF" align="center" |[[Media:AZnLOF2020-Negative-Resist-Datasheet.pdf|AZnLOF 2070]] |
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− | | bgcolor="#D0E7FF" align="center" |AZnLOF 5510 |
+ | | bgcolor="#D0E7FF" align="center" |[[Media:AZnLOF5510-Negative-Resist-Datasheet.pdf|AZnLOF 5510]] |
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− | | bgcolor="#D0E7FF" align="center" |UVN30-0.8 |
+ | | bgcolor="#D0E7FF" align="center" |[[Media:UVN-30 - Negative-Resist-Datasheet - Apr 2004.pdf|UVN30-0.8]] |
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− | | bgcolor="#D0E7FF" align="center" |SU-8 2005,2010, |
+ | | bgcolor="#D0E7FF" align="center" |[[Media:SU-8-2015-revA.pdf|SU-8 2005,2010,2015]] |
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− | | bgcolor="#D0E7FF" align="center" |SU-8 2075 |
+ | | bgcolor="#D0E7FF" align="center" |[[Media:SU-8-2075-revA.pdf|SU-8 2075]] |
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− | | bgcolor="#D0E7FF" align="center" |NR9-1000,3000,6000PY |
+ | | bgcolor="#D0E7FF" align="center" |NR9-[[Media:NR9-1000PY-revA.pdf|1000]],[[Media:NR9-3000PY-revA.pdf|3000]],[[Media:NR9-6000PY-revA.pdf|6000]]PY |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}} |
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{{LithRecipe Table}} |
{{LithRecipe Table}} |
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− | | bgcolor="#D0E7FF" align="center" |DUV42-P |
+ | | bgcolor="#D0E7FF" align="center" |[[Media:DUV42P-Anti-Reflective-Coating.pdf|DUV42-P]] |
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− | | bgcolor="#D0E7FF" align="center" |DS-K101-304 |
+ | | bgcolor="#D0E7FF" align="center" |[[Media:DS-K101-304-Anti-Reflective-Coating.pdf|DS-K101-304]] |
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*{{fl|AXP4000pb-Datasheet.pdf|AZP4000 (AZ4110, AZ4210, AZ4330)}} |
*{{fl|AXP4000pb-Datasheet.pdf|AZP4000 (AZ4110, AZ4210, AZ4330)}} |
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− | *[[Media:Az p4620 photoresist data package.pdf|AZP4620]] |
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*{{fl|OCG825-Positive-Resist-Datasheet.pdf|OCG825}} |
*{{fl|OCG825-Positive-Resist-Datasheet.pdf|OCG825}} |
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*{{fl|SPR220-Positive-Resist-Datasheet.pdf|SPR220 (SPR220-3, SPR220-7)}} |
*{{fl|SPR220-Positive-Resist-Datasheet.pdf|SPR220 (SPR220-3, SPR220-7)}} |
Revision as of 18:03, 18 September 2020
General Information
This page contains information and links to recipes/datasheets spin-coated materials used in the facility.
Table of Contents |
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Photolithography Processes
Photolithography Chemicals/Materials
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Photolithography Recipes
- R = Recipe is available. Clicking this link will take you to the recipe.
- A = Material is available for use, but no recipes are provided.
Photolithography Recipes
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Contact Aligner Recipes | Stepper Recipes | Other | ||||
Positive Resists | SUSS MJB-3 | SUSS MA-6 | Stepper 1 (GCA 6300) |
Stepper 2 (AutoStep 200) |
Stepper 3 (ASML DUV) |
MLA150 (Heidelberg) |
AZ4110 | R | R | A | A | ||
AZ4210 | R | R | A | A | ||
AZ4330RS | R | R | A | A | ||
AZ4620 | A | |||||
OCG 825-35CS | A | A | A | A | ||
SPR 950-0.8 | A | A | A | A | ||
SPR 955 CM-0.9 | A | R | R | R | ||
SPR 955 CM-1.8 | A | A | R | R | ||
SPR 220-3.0 | R | R | R | R | ||
SPR 220-7.0 | R | R | R | R | ||
THMR-IP3600 HP D | A | A | A | |||
UV6-0.8 | R | |||||
UV210-0.3 | R | |||||
UV26-2.5 | A | |||||
Negative Resists | SUSS MJB-3 | SUSS MA-6 | Stepper 1 (GCA 6300) |
Stepper 2 (AutoStep 200) |
Stepper 3 (ASML DUV) |
MLA150 (Heidelberg) |
AZ5214-EIR | R | R | R | R | ||
AZnLOF 2020 | R | R | R | R | ||
AZnLOF 2035 | A | A | A | A | ||
AZnLOF 2070 | A | A | A | A | ||
AZnLOF 5510 | A | A | R | R | ||
UVN30-0.8 | R | |||||
SU-8 2005,2010,2015 | A | R | A | A | ||
SU-8 2075 | A | A | A | A | ||
NR9-1000,3000,6000PY | R | R | A | R | ||
Anti-Reflection Coatings | SUSS MJB-3 | SUSS MA-6 | Stepper 1 (GCA 6300) |
Stepper 2 (AutoStep 200) |
Stepper 3 (ASML DUV) |
MLA150 (Heidelberg) |
DUV42-P | R | |||||
DS-K101-304 | R | |||||
SUSS MJB-3 | SUSS MA-6 | Stepper 1 (GCA 6300) |
Stepper 2 (AutoStep 200) |
Stepper 3 (ASML DUV) |
MLA150 (Heidelberg) |
Lift-Off Recipes
- Lift-Off Description/Tutorial
- How it works, process limits and considerations for designing your process
- I-Line Lift-Off: Bi-Layer Process with PMGI Underlayer and Contact Aligner
- DUV Lift-Off: UV6 Imaging Resist + PMGI Underlayer
E-Beam Lithography Recipes (JEOL JBX-6300FS)
- Under Development.
FIB Lithography Recipes (Raith Velion)
To Be Added
Automated Coat/Develop System Recipes (S-Cubed Flexi)
Recipes pre-loaded on the S-Cubed Flexi automated coat/bake/develop system. Only staff may write new recipes, contact the tool supervisor for more info.
To Be Added
Nanoimprinting Recipes
- Thermal Nanoimprint Process and Tutorial
- UV-Cure Low Temp, Low Pressure, Soft-Stamp Nanoimprint Process
Holography Recipes
- Standard Holography Process - on SiO2 on Si
- Holography Process Variations - Set-up Angle - Etching into SiO2 and Si
- Etch SiO2 Nano-structure - Changing Side-wall Angle - Etching into Si with a different line-width
- Reduce SiO2 Nanowire Diameter - Thermal Oxidation - Vapor HF Etching
Low-K Spin-On Dielectric Recipes
Chemicals Stocked + Datasheets
The following is a list of the lithography chemicals we stock in the lab, with links to the datasheets for each. The datasheets will often have important processing info such as spin-speed vs. thickness curves, typical process parameters, bake temps/times etc.