Lithography Recipes

General Information

This page contains information and links to recipes/datasheets spin-coated materials used in the facility.

Table of Contents

Photoresists Photo Lithography Recipe section Has links to starting recipes (spin, bake, exposure, develop etc.). Substrate, surface materials, pattern size can often affect process parameters. Users may need to run Focus/Exposure Arrays/Matrix (FEA's/FEM's) with these processes to achieve high-resolution. Stocked Lithography Chemical + Datasheets Lists all stocked photolith. chemicals, PRs, strippers, developers, and links to the chemical's application notes/datasheet, which detail the spin curves and nominal processes. E-beam Lithography Resists E-Beam Lithography Recipes Has links to starting recipes. Substrates and patterns play a large role in process parameters. EBL Photoresist Datasheets Provided for reference, also showing starting recipes and usage info. Nanoimprinting Resists Datasheets are provided with starting recipes and usage info. Recipes provided are for use in the Nano-Imprint (Nanonex NX2000) system only. Underlayers These are used beneath resists for both adhesive purposes and to enable bi-layer lift-off profiles for use with photoresist. Datasheets are provided. Lift-Off Techniques Verified Recipes for lift-off using various photolith. tools General educational description of this technique and it's limitations/considerations. Holography For 1-D and 2-D gratings with 220nm nominal period, available on substrates up to 1 inch square. Recipes for silicon substrates are provided, and have been translated to other substrates by users. Anti-Reflection Coatings: The Photoresist Recipes section contains recipes using these materials. Bottom Anti-Reflection Coatings (BARC) are used in the stepper systems, underneath the resists to eliminate substrate reflections that can affect resolution and repeatability for small, near resolution limited, feature sizes. Datasheets are provided for reference on use of the materials. Contrast Enhancement Materials (CEM) The Photoresist Recipes section contains recipes using these materials. Used for resolution enhancement. Not for use in contact aligners, typically used on I-Line Steppers. Datasheets provided with usage info. Adhesion Promoters These are used to improve wetting of photoresists to your substrate. Datasheets are provided on use of these materials. Low-K Spin-on Dielectrics Spin-On Dielectrics Datasheets for BCB, Photo-BCB, and SOG (spin-on-glass) for reference on use. Low-K Spin-On Dielectric Recipes Recipes for usage of some spin-on dielectrics. Developers and Removers Datasheets provided for reference. Remover and Photoresist Strippers are used to dissolve PR during lift-off or after etching.

Photolithography Recipes

• R = Recipe is available. Clicking this link will take you to the recipe.
• A = Material is available for use, but no recipes are provided.

Photolithography Recipes
	Contact Aligner Recipes		Stepper Recipes			Other
Positive Resists	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)	MLA150
AZ4110	R1	R1	A	A
AZ4210	R1	R1	A	A
AZ4330RS	R1	R1	A	A
AZ4620						A
OCG 825-35CS	A	A	A	A
SPR 950-0.8	A	A	A	A
SPR 955 CM-0.9	A	R1	R1	R1
SPR 955 CM-1.8	A	A	R1	R1
SPR 220-3.0	R1	R1	R1	R1
SPR 220-7.0	R1	R1	R1	R1
THMR-IP3600 HP D			A	A		A
UV6-0.8					R1
UV210-0.3					R1
UV26-2.5					A
Negative Resists	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)	MLA150
AZ5214-EIR	R1	R1	R1	R1
AZnLOF 2020	R1	R1	R1	R1
AZnLOF 2035	A	A	A	A
AZnLOF 2070	A	A	A	A
AZnLOF 5510	A	A	R1	R1
UVN30-0.8					R1
SU-8 2005,2010, 2015	A	R1	A	A
SU-8 2075	A	A	A	A
NR9-1000,3000,6000PY	R1	R1	A	R1
Anti-Reflection Coatings	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)	MLA150
DUV42-P					R1
DS-K101-304					R1
	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)	MLA150

E-Beam Lithography Recipes (JEOL JBX-6300FS)

• Under Development.

FIB Lithography Recipes (Raith Velion)

To Be Added

Automated Coat/Develop System Recipes (S-Cubed Flexi)

Recipes pre-loaded on the S-Cubed Flexi automated coat/bake/develop system. Only staff may write new recipes, contact the tool supervisor for more info.

To Be Added

Nanoimprinting Recipes

• Thermal Nanoimprint Process and Tutorial
• UV-Cure Low Temp, Low Pressure, Soft-Stamp Nanoimprint Process

Holography Recipes

• Standard Holography Process - on SiO2 on Si
• Holography Process Variations - Set-up Angle - Etching into SiO2 and Si
• Etch SiO2 Nano-structure - Changing Side-wall Angle - Etching into Si with a different line-width
• Reduce SiO2 Nanowire Diameter - Thermal Oxidation - Vapor HF Etching

Low-K Spin-On Dielectric Recipes

• Photo BCB (4024-40)
• Standard BCB (3022-46)
• SOG (T512B)

Lift-Off Techniques

• Lift-Off Description/Tutorial
  • How it works, process limits and considerations for designing your process
• I-Line Lift-Off: Bi-Layer Process with PMGI Underlayer and Contact Aligner
• DUV Lift-Off: UV6 Imaging Resist + PMGI Underlayer

Chemicals Stocked + Datasheets

The following is a list of the lithography chemicals we stock in the lab, with links to the datasheets for each. The datasheets will often have important processing info such as spin-speed vs. thickness curves, typical process parameters, bake temps/times etc.

Positive Photoresists i-line and broadband AZP4000 (AZ4110, AZ4210, AZ4330) OCG825 SPR220 (SPR220-3, SPR220-7) SPR955CM (SPR955CM-0.9, SPR955CM-1.8) THMR-3600HP (Thin I-Line & Holography) Evaluation Results: THMR-3600HP Spin Curves for THMR-3600HP Safety Datasheet for THMR-3600HP DUV-248nm UV210-0.3 UV6-0.8 UV26-2.5 Negative Photoresists i-line and broadband AZ5214 AZnLOF5510 AZnLOF2000 (AZnLOF2020, AZnLOF2035, AZnLOF2070) Futurrex NR9-1000PY(use AZ300MIF dev) Futurrex NR9-3000PY(use AZ300MIF dev) Futurrex NR9-6000PY(use AZ300MIF dev) SU-8-2005,2010, 2015 SU-8-2075 DUV-248nm UVN-30-0.8 Underlayers PMGI (PMGI SF3,5,8,11,15) Shipley LOL2000 E-beam resists PMMA (PMMA, P(MMA-MAA) copolymer) maN 2403 Nanoimprinting NX1020 MRI-7020 MR-UVCur21 Ormostamp

Contrast Enhancement Materials CEM365iS Anti-Reflection Coatings XHRiC (i-line) DUV42P (DUV) (For AR2 replacement) DS-K101-304 (DUV developable BARC) Adhesion Promoters HMDS AP3000 BCB Adhesion Promoter Omnicoat, SU-8 Adhesion Promoter Ormoprime08-Ormostsmp Adhesion Promoter Spin-On Dielectrics Low-K Spin-On Dielectrics such as Benzocyclobutane and Spin-on Glass BCB, Cyclotene 3022-46(Not Photosensitive) PhotoBCB, Cyclotene 4022-40(Negative Polarity) BCB Adhesion Notes from Vendor BCB rework Notes from Vendor Spin-on-Glass, Honeywell 512B (Not Photosensitive) Honeywell 512B Apps Data Developers AZ400K (AZ400K, AZ400K1:4) AZ300MIF DS2100 BCB Developer SU-8 Developer 101A Developer (for DUV Flood Exposed PMGI) Photoresist Removers AZ NMP This replaces 1165 AZ300T Remover PG, SU-8 stripper AZ EBR ("Edge Bead Remover", PGMEA)