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Showing below up to 50 results in range #51 to #100.
- (hist) Gold surface oxidation (darkening) due to O2/N2 plasma; the need for O2 only recipe. [223 bytes]
- (hist) Michael Barreraz [234 bytes]
- (hist) Tino Sy [235 bytes]
- (hist) Mike Day [241 bytes]
- (hist) Luis Zuzunaga [252 bytes]
- (hist) SiO2 Etching Test using CF4/CHF3 [259 bytes]
- (hist) Foong Fatt [260 bytes]
- (hist) Test Data of etching SiO2 with CHF3/CF4-Florine [264 bytes]
- (hist) Dan Read [275 bytes]
- (hist) Peder Lenvik [289 bytes]
- (hist) Test Data of etching SiO2 with CHF3/CF4/O2 [293 bytes]
- (hist) Ovens 1, 2 & 3 (Labline) [301 bytes]
- (hist) Mike Silva [309 bytes]
- (hist) Test Data of Etching SiO2 with CHF3/CF4-Florine ICP Etcher [322 bytes]
- (hist) Test Data of etching SiO2 with CHF3/CF4-Florine ICP Etcher [322 bytes]
- (hist) Vraj Mehalana [332 bytes]
- (hist) ASML Stepper 3 Error Recovery, Troubleshooting and Calibration [349 bytes]
- (hist) Thermal Evaporator 2 [357 bytes]
- (hist) Nanofab-IT - Add Device to Network [360 bytes]
- (hist) Vacuum Oven (YES) [378 bytes]
- (hist) Intellemetrics Laser Etch Monitor Procedure for Plasma-Therm Etchers [422 bytes]
- (hist) Critical Point Dryer [430 bytes]
- (hist) Bill Mitchell [436 bytes]
- (hist) YES-150C-Various-Resists [464 bytes]
- (hist) Spin Rinse Dryer (SemiTool) [470 bytes]
- (hist) Older Publications [481 bytes]
- (hist) ADT 7100 - Recovering an Old Recipe (2019) [487 bytes]
- (hist) Claudia Gutierrez [487 bytes]
- (hist) Brian Lingg [503 bytes]
- (hist) MA6 Backside Alignment - Allowed Mark Locations [504 bytes]
- (hist) Electronics Presentations [535 bytes]
- (hist) Don Freeborn [543 bytes]
- (hist) DS-K101-304 Bake Temp. versus Develop Rate [543 bytes]
- (hist) Oven 5 (Labline) [550 bytes]
- (hist) Wire Saw (Takatori) [553 bytes]
- (hist) Lab Rules OLD 2018 [574 bytes]
- (hist) ASML 5500: Recovering from a Typo in Reticle ID [576 bytes]
- (hist) High Temp Oven (Blue M) [647 bytes]
- (hist) YES Recipe Screenshots: STD-O2 [669 bytes]
- (hist) Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer) [707 bytes]
- (hist) Lee Sawyer [716 bytes]
- (hist) YES Recipe Screenshots: STD-N2-O2 [725 bytes]
- (hist) Mechanical Polisher (Allied) [734 bytes]
- (hist) Decomissioned Tools [746 bytes]
- (hist) MVD - Wafer Coating - Process Traveler [775 bytes]
- (hist) ASML Stepper 3 - Substrates smaller than 100mm/4-inch [790 bytes]
- (hist) Gold Plating Bench [803 bytes]
- (hist) Tube Furnace AlGaAs Oxidation (Lindberg) [810 bytes]
- (hist) Logitech WBS7 - Procedure for Wax Mounting with Spin-On Crystalbond [823 bytes]
- (hist) Photonics Presentations [837 bytes]