Tool List: Difference between revisions

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=Wet Processing=
=Wet Processing=
{|
* [[Wet Benches]]
|-valign="top"
**[[Photoresist Spin Benches]]
|width=300|
**[[Lithography Development & Solvent Clean Benches]]
**[[Wet Etch Benches]]
* [[Scales]]
** [[Wet Etch Wafer Scale]]
** [[Solvent Processing Wafer Scale]]
* [[Gold Plating Bench]]
* [[Gold Plating Bench]]
* [[Critical Point Dryer]]
* [[Critical Point Dryer]]
* [[Spin Rinse Dryer (SemiTool)]]
* [[Spin Rinse Dryer (SemiTool)]]
* [[Scales]]
** [[Wet Etch Wafer Scale]]
** [[Solvent Processing Wafer Scale]]
|width=400|
* [[Chemical-Mechanical Polisher (Logitech)]]
* [[Chemical-Mechanical Polisher (Logitech)]]
* [[Wet Benches]]
**[[Photoresist Spin Benches]]
**[[Lithography Development & Solvent Clean Benches]]
**[[Wet Etch Benches]]
|-
|}


=Thermal Processing=
=Thermal Processing=

Revision as of 19:55, 28 June 2012

Lithography

Vacuum Deposition

Dry Etch

Wet Processing

Thermal Processing

Packaging

Inspection, Test and Characterization