Tool List: Difference between revisions

From UCSB Nanofab Wiki
Jump to navigation Jump to search
Content deleted Content added
Zwarburg (talk | contribs)
Zwarburg (talk | contribs)
Line 72: Line 72:


=Wet Processing=
=Wet Processing=
{|
⚫
* [[Wet Benches]]
|-valign="top"
⚫
**[[Photoresist Spin Benches]]
|width=300|
⚫
**[[Lithography Development & Solvent Clean Benches]]
⚫
**[[Wet Etch Benches]]
⚫
* [[Scales]]
⚫
** [[Wet Etch Wafer Scale]]
⚫
** [[Solvent Processing Wafer Scale]]
* [[Gold Plating Bench]]
* [[Gold Plating Bench]]
* [[Critical Point Dryer]]
* [[Critical Point Dryer]]
* [[Spin Rinse Dryer (SemiTool)]]
* [[Spin Rinse Dryer (SemiTool)]]
⚫
* [[Scales]]
⚫
** [[Wet Etch Wafer Scale]]
⚫
** [[Solvent Processing Wafer Scale]]
|width=400|
* [[Chemical-Mechanical Polisher (Logitech)]]
* [[Chemical-Mechanical Polisher (Logitech)]]
⚫
* [[Wet Benches]]
⚫
**[[Photoresist Spin Benches]]
⚫
**[[Lithography Development & Solvent Clean Benches]]
⚫
**[[Wet Etch Benches]]
|-
|}


=Thermal Processing=
=Thermal Processing=

Revision as of 19:55, 28 June 2012

Lithography

Vacuum Deposition

Dry Etch

Wet Processing

Thermal Processing

Packaging

Inspection, Test and Characterization