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The following pages do not link to other pages in UCSB Nanofab Wiki.
Showing below up to 50 results in range #1 to #50.
- ADT 7100 - Initial Setup Before Cutting
- ADT 7100 - Recovering an Old Recipe (2019)
- ADT UV-Tape Table 1042R
- ASML 5500: Choose Marks for Prealignment
- ASML 5500: Recovering from a Typo in Reticle ID
- ASML Stepper 3: Wafer Handler Reset Procedure
- ASML Stepper 3 - Substrates smaller than 100mm/4-inch
- ASML Stepper 3 Error Recovery, Troubleshooting and Calibration
- AUTOSTEP 200-PIECES 1st litho BL and BR orientation.pptx
- AZ5214 - Basic Process
- Adam Abrahamsen
- Autostep 200 Old training manual
- Autostep 200 User Accessible Commands
- CC-PRIME OnBoarding 2022-08
- CDE ResMap Quick-Start instructions
- Chemical List - OLD 2018-09-05
- Claudia Gutierrez
- Comparison of ash rate for different gas mixtures, especially between O2 only vs O2/N2 mixture.
- DS-K101-304 Bake Temp. versus Develop Rate
- Electronics Presentations
- Ellipsometer (Woollam) - Measuring thin metals with oxide pre-measurement
- Errors
- Filmetrics F10-RT-UVX Operating Procedure
- Foong Fatt
- GCA 6300 Reboot Procedures
- GCA 6300 USer Accessible Commands
- GCA 6300 training manual -old instructions
- Glossary
- Gold surface oxidation (darkening) due to O2/N2 plasma; the need for O2 only recipe.
- Goniometer (Rame-Hart A-100) - Operating Procedure
- Gopikrishnan G M
- InP Etch Rate and Selectivity (InP/SiO2)
- InP Etch Test-in details
- InP Etch Test Result in Details
- InP Etch test -details
- InP etch result in details
- Jack Whaley
- KLA Tencor P7 - Basic profile instructions
- KLA Tencor P7 - Saving Profile Data
- Lab Rules OLD 2018
- MA6 Backside Alignment - Allowed Mark Locations
- MLA150 - Focus-Exposure Matrix ("Series" mode)
- Michael Barreraz
- Mike Silva
- Nanofab-IT - Add Device to Network
- Noah Dutra
- Old Training Manual
- Old training manual
- Olympus LEXT OLS4000 Confocal uScope - Quick Start
- Oxford Etcher - Sample Size Effect on Etch Rate