Difference between revisions of "Lithography Recipes"
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Revision as of 21:56, 14 November 2020
Table of Contents |
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Photolithography Processes
Photolithography Chemicals/Materials
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Photolithography Recipes
- R = Recipe is available. Clicking this link will take you to the recipe.
- A = Material is available for use, but no recipes are provided.
Click the tool title to go to recipes for that tool. Click the photoresist title to get the datasheet, also in Stocked Chemicals + Datasheets.
Photolithography Recipes
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---|---|---|---|---|---|---|
Contact Aligner Recipes | Stepper Recipes | Other | ||||
Positive Resists | SUSS MJB-3 | SUSS MA-6 | Stepper 1 (GCA 6300) |
Stepper 2 (AutoStep 200) |
Stepper 3 (ASML DUV) |
MLA150 (Heidelberg) |
AZ4110 | R | R | A | A | R | |
AZ4210 | R | R | A | A | ||
AZ4330RS | R | R | A | A | R | |
AZ4620 | A | A | A | A | A | |
OCG 825-35CS | A | A | A | A | ||
SPR 955 CM-0.9 | A | R | R | R | R | |
SPR 955 CM-1.8 | A | A | R | R | ||
SPR 220-3.0 | R | R | R | R | R | |
SPR 220-7.0 | R | R | R | R | ||
THMR-IP3600 HP D | A | A | R | |||
UV6-0.8 | R | |||||
UV210-0.3 | R | |||||
UV26-2.5 | A | |||||
Negative Resists | SUSS MJB-3 | SUSS MA-6 | Stepper 1 (GCA 6300) |
Stepper 2 (AutoStep 200) |
Stepper 3 (ASML DUV) |
MLA150 (Heidelberg) |
AZ5214-EIR | R | R | R | R | R | |
AZnLOF 2020 | R | R | R | R | R | |
AZnLOF 2035 | A | A | A | A | ||
AZnLOF 2070 | A | A | A | A | ||
AZnLOF 5510 | A | A | R | R | ||
UVN30-0.8 | R | |||||
SU-8 2005,2010,2015 | A | R | A | A | ||
SU-8 2075 | A | A | A | A | R | |
NR9-1000,3000,6000PY | R | R | A | R | ||
Anti-Reflection Coatings | SUSS MJB-3 | SUSS MA-6 | Stepper 1 (GCA 6300) |
Stepper 2 (AutoStep 200) |
Stepper 3 (ASML DUV) |
MLA150 (Heidelberg) |
DUV42-P | R | |||||
DS-K101-304 | R | |||||
SUSS MJB-3 | SUSS MA-6 | Stepper 1 (GCA 6300) |
Stepper 2 (AutoStep 200) |
Stepper 3 (ASML DUV) |
MLA150 (Heidelberg) |
Lift-Off Recipes
- Lift-Off Description/Tutorial
- How it works, process limits and considerations for designing your process
- I-Line Lift-Off: Bi-Layer Process with PMGI Underlayer and Contact Aligner
- DUV Lift-Off: UV6 Imaging Resist + PMGI Underlayer
E-Beam Lithography Recipes (JEOL JBX-6300FS)
- Under Development.
FIB Lithography Recipes (Raith Velion)
To Be Added
Automated Coat/Develop System Recipes (S-Cubed Flexi)
Recipes pre-loaded on the S-Cubed Flexi automated coat/bake/develop system. Only staff may write new recipes, contact the tool supervisor for more info.
To Be Added
Nanoimprinting Recipes
- Thermal Nanoimprint Process and Tutorial
- UV-Cure Low Temp, Low Pressure, Soft-Stamp Nanoimprint Process
Holography Recipes
- Standard Holography Process - on SiO2 on Si
- Holography Process Variations - Set-up Angle - Etching into SiO2 and Si
- Etch SiO2 Nano-structure - Changing Side-wall Angle - Etching into Si with a different line-width
- Reduce SiO2 Nanowire Diameter - Thermal Oxidation - Vapor HF Etching
Low-K Spin-On Dielectric Recipes
Chemicals Stocked + Datasheets
The following is a list of the lithography chemicals we stock in the lab, with links to the datasheets for each. The datasheets will often have important processing info such as spin-speed vs. thickness curves, typical process parameters, bake temps/times etc.