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Show new changes starting from 16:53, 24 October 2024
   
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24 October 2024

     16:34  Plasma Activation (EVG 810) diffhist +138 John d talk contribs (note on "no PR") Tag: Visual edit

23 October 2024

     18:22  Ion Beam Deposition (Veeco NEXUS) diffhist +240 John d talk contribs (→‎Schematics/Examples: added example DBR spectrum)
 m   16:54  Stepper 2 (AutoStep 200)‎‎ 2 changes history −58 [John d‎ (2×)]
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16:54 (cur | prev) −59 John d talk contribs (→‎Video Training) Tag: Visual edit
 m   
16:53 (cur | prev) +1 John d talk contribs (→‎Video Training) Tag: Visual edit
     05:28  Processing - How Do I…?‎‎ 2 changes history +4,379 [John d‎ (2×)]
     
05:28 (cur | prev) +3,383 John d talk contribs (→‎Design of Experiments: DOE exmaple, added Trello and gDrive examples and llinks etc.) Tag: Visual edit
     
04:37 (cur | prev) +996 John d talk contribs (→‎Lithography: FEM analysis section) Tag: Visual edit
     05:25  (Upload log) [John d‎ (3×)]
     
05:25 John d talk contribs uploaded File:Google Drive - Example Job Folder.png
     
05:22 John d talk contribs uploaded File:Trello - example job card.png
     
05:21 John d talk contribs uploaded File:Trello - Example Job Cards.png
N    04:35  Lithography Calibration - Analyzing a Focus-Exposure Matrix diffhist +6,971 John d talk contribs (initial version) Tag: Visual edit
     03:37  ASML Stepper 3 Standard Operating Procedure diffhist +180 John d talk contribs (→‎General process:: ASML: keep focus constant for Fine FEM) Tag: Visual edit
     03:30  ASML Stepper 3 Error Recovery, Troubleshooting and Calibration diffhist −8,307 John d talk contribs (deleted info, instead link to google docs (access restricted)) Tags: Replaced Visual edit
     03:23  Mask Making Guidelines for Contact Aligners diffhist +1,061 John d talk contribs (added "general process" section) Tag: Visual edit

22 October 2024

     23:52  ICP Etching Recipes diffhist +468 John d talk contribs (→‎Process Control Data (Oxford ICP Etcher): added GaN etch) Tag: Visual edit
     23:32  MLA150 - Troubleshooting‎‎ 4 changes history +3,506 [John d‎ (4×)]
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23:32 (cur | prev) +46 John d talk contribs (→‎Misalignment) Tag: Visual edit
     
23:31 (cur | prev) +46 John d talk contribs (→‎Aligning to a quarter-wafer/irregular piece: autor) Tag: Visual edit
     
23:29 (cur | prev) +100 John d talk contribs (→‎Misalignment: added typical value for scaling) Tag: Visual edit
     
23:26 (cur | prev) +3,314 John d talk contribs (addded misalignment section) Tag: Visual edit
     23:17 Upload log John d talk contribs uploaded File:MLA150 Alignment versus Wafer Location v1.jpg
     13:21  Template:Announcements‎‎ 3 changes history −362 [Sawyer l‎; John d‎ (2×)]
     
13:21 (cur | prev) −412 Sawyer l talk contribs
     
00:39 (cur | prev) −370 John d talk contribs (deleted eBeam 2)
     
00:39 (cur | prev) +420 John d talk contribs (updated ASML)
     00:41  Dry Etching Recipes diffhist 0 Noahdutra talk contribs (Changed FICP Si to R6 and OXFD GaN to R3) Tag: Visual edit

21 October 2024

     18:46  Services diffhist +109 John d talk contribs (→‎Statement of Work: clarify UCSB staff steps) Tag: Visual edit

18 October 2024

     18:58  Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP) diffhist +65 John d talk contribs (→‎Detailed Specifications: added chuck temp) Tag: Visual edit
     17:08  MLA150 - Troubleshooting diffhist +18 Sawyer l talk contribs (Piezo range values) Tag: Visual edit

17 October 2024

     17:00  Atomic Layer Deposition Recipes‎‎ 2 changes history +48 [Biljana‎ (2×)]
     
17:00 (cur | prev) +13 Biljana talk contribs (→‎SiO{{sub|2}} deposition (ALD CHAMBER 1))
     
16:59 (cur | prev) +35 Biljana talk contribs (→‎SiO{{sub|2}} deposition (ALD CHAMBER 1))
     16:48  Template:Announcements‎‎ 3 changes history +412 [Mehalana v‎ (3×)]
     
16:48 (cur | prev) +412 Mehalana v talk contribs (→‎E- Beam #2 Maint Work Next Week)
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16:47 (cur | prev) −53 Mehalana v talk contribs (Reverted edits by Mehalana v (talk) to last revision by John d) Tag: Rollback
     
16:46 (cur | prev) +53 Mehalana v talk contribs (→‎E- Beam #2 Maint Work Next Week) Tag: Reverted

16 October 2024

     15:44  Template:Announcements diffhist −26 John d talk contribs (→‎E- Beam #2 Maint Work Next Week)

13 October 2024

     23:04  Main Page diffhist −42 Jcrode talk contribs

10 October 2024

     20:35  Frequently Asked Questions diffhist +123 John d talk contribs (→‎How do I get my files from the NanoFab computers?: mentioned midnight folder sync) Tag: Visual edit
     20:23  Template:Announcements‎‎ 2 changes history −134 [Mehalana v‎; John d‎]
     
20:23 (cur | prev) +396 Mehalana v talk contribs (→‎Stepper #3 (ASML DUV) - Tool UP)
     
00:36 (cur | prev) −530 John d talk contribs (asml up, deleted MLA)

9 October 2024

     23:39  ICP Etching Recipes diffhist −30 Noahdutra talk contribs (→‎Process Control Data (DSEiii): took off SiO2/Al2O3 selectivity for dse) Tag: Visual edit

8 October 2024

     22:09  Lithography Recipes diffhist +1,656 John d talk contribs (→‎Available Variations: bolded variables on the table, italics descriptions for section) Tag: Visual edit
     21:29  ICP Etching Recipes‎‎ 10 changes history +178 [John d‎; Noahdutra‎ (9×)]
     
21:29 (cur | prev) −1 Noahdutra talk contribs (→‎Process Control Data (DSEiii): more details for the etch) Tag: Visual edit
     
21:12 (cur | prev) +148 John d talk contribs (→‎High Rate Bosch Etch (DSEIII): added @Noah's new recipe) Tag: Visual edit
     
21:01 (cur | prev) +124 Noahdutra talk contribs (→‎Process Control Data (DSEiii))
     
20:59 (cur | prev) +124 Noahdutra talk contribs (→‎Si Etching (Fluorine ICP Etcher))
     
20:57 (cur | prev) −124 Noahdutra talk contribs (→‎Si Etching (Fluorine ICP Etcher))
     
20:54 (cur | prev) −94 Noahdutra talk contribs (→‎Process Control Data (DSEiii))
     
20:54 (cur | prev) +94 Noahdutra talk contribs (→‎Process Control Data (DSEiii))
     
20:51 (cur | prev) −106 Noahdutra talk contribs (→‎Process Control Data (DSEiii))
     
20:49 (cur | prev) +106 Noahdutra talk contribs (→‎Process Control Data (DSEiii))
     
20:47 (cur | prev) −93 Noahdutra talk contribs (→‎DSEIII_(PlasmaTherm/Deep_Silicon_Etcher): DSE calibration etch information) Tag: Visual edit
     21:03  (Upload log) [Noahdutra‎ (2×)]
     
21:03 Noahdutra talk contribs uploaded File:Cal DSE Ar+ER.png(DSE STD_Bosch_Si etch AR/ER dependence)
     
20:44 Noahdutra talk contribs uploaded File:Copy of 22 013 (1).jpg(STD_Bosch_Si example 8/26/24)