Tool List: Difference between revisions
Jump to navigation
Jump to search
Line 104: | Line 104: | ||
=Inspection, Test and Characterization= |
=Inspection, Test and Characterization= |
||
{| |
|||
⚫ | |||
|-valign="top" |
|||
⚫ | |||
|width=300| |
|||
⚫ | |||
⚫ | |||
⚫ | |||
⚫ | |||
⚫ | |||
⚫ | |||
⚫ | |||
⚫ | |||
* [[Microscopes]] |
* [[Microscopes]] |
||
* [[Probe Station & Curve Tracer]] |
* [[Probe Station & Curve Tracer]] |
||
* [[Optical Film Thickness (Filmetrics)]] |
* [[Optical Film Thickness (Filmetrics)]] |
||
* [[Scanning Probe Microscope]] |
* [[Scanning Probe Microscope (Veeco NanoMan)]] |
||
* [[Tencor Flexus Film Stress]] |
* [[Tencor Flexus Film Stress]] |
||
|width=400| |
|||
* [[Optical Film Thickness (Nanometric)]] |
* [[Optical Film Thickness (Nanometric)]] |
||
* [[SEM Sample Coater]] |
* [[SEM Sample Coater (Hummer)]] |
||
* [[Surface Analysis]] |
* [[Surface Analysis (KLA/Tencor Surfscan)]] |
||
* [[Photo-emission & IR Microscope]] |
* [[Photo-emission & IR Microscope (QFI)]] |
||
* [[Ellipsometer (Woollam)]] |
* [[Ellipsometer (Woollam)]] |
||
* [[Goniometer]] |
* [[Goniometer]] |
||
* [[4-Point Probe Resistivity Mapper]] |
* [[4-Point Probe Resistivity Mapper]] |
||
* [[Laser Scanning Confocal M-scope (Olympus LEXT)]] |
|||
* [[Deep UV Optical Microscope (Olympus)]] |
|||
|- |
|||
|} |
Revision as of 20:00, 28 June 2012
Lithography
Vacuum Deposition
Dry Etch
Wet Processing
Thermal Processing
- Rapid Thermal Processor (AET RX6)
- Strip Annealer
- Tube Furnace (Tystar 8300)
- Tube Furnace Wafer Bonding (Thermco)
- Tube Furnace AlGaAs Oxidation (Linberg)